JP4487783B2 - ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材 - Google Patents

ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材 Download PDF

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Publication number
JP4487783B2
JP4487783B2 JP2005016880A JP2005016880A JP4487783B2 JP 4487783 B2 JP4487783 B2 JP 4487783B2 JP 2005016880 A JP2005016880 A JP 2005016880A JP 2005016880 A JP2005016880 A JP 2005016880A JP 4487783 B2 JP4487783 B2 JP 4487783B2
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JP
Japan
Prior art keywords
tio
glass
sio
temperature
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2005016880A
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English (en)
Japanese (ja)
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JP2006210404A5 (enExample
JP2006210404A (ja
Inventor
章夫 小池
康臣 岩橋
憲昭 下平
信也 菊川
直樹 杉本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP2005016880A priority Critical patent/JP4487783B2/ja
Priority to EP06700922A priority patent/EP1841702A2/en
Priority to PCT/JP2006/300777 priority patent/WO2006080241A2/en
Publication of JP2006210404A publication Critical patent/JP2006210404A/ja
Priority to US11/747,698 priority patent/US20070207911A1/en
Publication of JP2006210404A5 publication Critical patent/JP2006210404A5/ja
Priority to US12/466,032 priority patent/US20090242387A1/en
Application granted granted Critical
Publication of JP4487783B2 publication Critical patent/JP4487783B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/40—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal all coatings being metal coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
    • C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Thermal Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Glass Compositions (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005016880A 2005-01-25 2005-01-25 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材 Expired - Lifetime JP4487783B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005016880A JP4487783B2 (ja) 2005-01-25 2005-01-25 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材
EP06700922A EP1841702A2 (en) 2005-01-25 2006-01-13 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TiO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TiO2
PCT/JP2006/300777 WO2006080241A2 (en) 2005-01-25 2006-01-13 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TiO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TiO2
US11/747,698 US20070207911A1 (en) 2005-01-25 2007-05-11 Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2
US12/466,032 US20090242387A1 (en) 2005-01-25 2009-05-14 Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005016880A JP4487783B2 (ja) 2005-01-25 2005-01-25 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材

Publications (3)

Publication Number Publication Date
JP2006210404A JP2006210404A (ja) 2006-08-10
JP2006210404A5 JP2006210404A5 (enExample) 2007-11-22
JP4487783B2 true JP4487783B2 (ja) 2010-06-23

Family

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Family Applications (1)

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JP2005016880A Expired - Lifetime JP4487783B2 (ja) 2005-01-25 2005-01-25 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材

Country Status (4)

Country Link
US (2) US20070207911A1 (enExample)
EP (1) EP1841702A2 (enExample)
JP (1) JP4487783B2 (enExample)
WO (1) WO2006080241A2 (enExample)

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5035516B2 (ja) * 2005-12-08 2012-09-26 信越化学工業株式会社 フォトマスク用チタニアドープ石英ガラスの製造方法
US20070293388A1 (en) * 2006-06-20 2007-12-20 General Electric Company Glass articles and method for making thereof
JP2008100891A (ja) * 2006-10-20 2008-05-01 Covalent Materials Corp チタニア−シリカガラス
JP5042714B2 (ja) * 2007-06-06 2012-10-03 信越化学工業株式会社 ナノインプリントモールド用チタニアドープ石英ガラス
JP2009013048A (ja) * 2007-06-06 2009-01-22 Shin Etsu Chem Co Ltd ナノインプリントモールド用チタニアドープ石英ガラス
WO2009034954A1 (ja) * 2007-09-13 2009-03-19 Asahi Glass Co., Ltd. ＴｉＯ2含有石英ガラス基板
JP5470703B2 (ja) * 2007-12-27 2014-04-16 旭硝子株式会社 Ｅｕｖｌ用光学部材およびその表面処理方法
TW200940472A (en) * 2007-12-27 2009-10-01 Asahi Glass Co Ltd TiO2-containing silica glass
JP5314901B2 (ja) * 2008-02-13 2013-10-16 国立大学法人東北大学 シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法
JP5365247B2 (ja) * 2008-02-25 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
KR20100116639A (ko) 2008-02-26 2010-11-01 아사히 가라스 가부시키가이샤 ＴｉＯ₂ 함유 실리카 유리, 고에너지 밀도를 사용한 ＥＵＶ 리소그래피용 광학 부재 및 특수 온도 제어된 ＴｉＯ₂ 함유 실리카 유리의 제조 방법
JP5417884B2 (ja) * 2008-02-27 2014-02-19 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP5417889B2 (ja) * 2008-02-29 2014-02-19 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP5644058B2 (ja) * 2008-03-21 2014-12-24 旭硝子株式会社 ＴｉＯ２を含有するシリカガラス
JP2009274947A (ja) 2008-04-16 2009-11-26 Asahi Glass Co Ltd ＴｉＯ２を含有するＥＵＶリソグラフィ光学部材用シリカガラス
JP2011162359A (ja) * 2008-05-29 2011-08-25 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
JP5202141B2 (ja) * 2008-07-07 2013-06-05 信越化学工業株式会社 チタニアドープ石英ガラス部材及びその製造方法
US20100107696A1 (en) * 2008-10-30 2010-05-06 John Edward Maxon Method for reducing inclusions in silica-titania glass
KR101740067B1 (ko) * 2009-01-13 2017-05-25 아사히 가라스 가부시키가이샤 ＴｉＯ₂를 함유하는 실리카 유리를 포함하는 광학 부재
US8735308B2 (en) 2009-01-13 2014-05-27 Asahi Glass Company, Limited Optical member comprising TiO2-containing silica glass
JP5578167B2 (ja) 2009-02-24 2014-08-27 旭硝子株式会社 多孔質石英ガラス体の製造方法およびｅｕｖリソグラフィ用光学部材
WO2010131662A1 (ja) * 2009-05-13 2010-11-18 旭硝子株式会社 ＴｉＯ２－ＳｉＯ２ガラス体の製造方法及び熱処理方法、ＴｉＯ２－ＳｉＯ２ガラス体、ＥＵＶＬ用光学基材
EP2441736A4 (en) * 2009-05-18 2013-07-17 Asahi Glass Co Ltd METHOD FOR PRODUCING A TIO2-SIO2 GLASS BODY, METHOD FOR HEAT TREATMENT OF A TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY AND OPTICAL BASE FOR EUVL
JP2012181220A (ja) * 2009-07-02 2012-09-20 Asahi Glass Co Ltd ＡｒＦリソグラフィ用ミラー、およびＡｒＦリソグラフィ用光学部材
DE102010039779A1 (de) * 2009-08-28 2011-03-24 Corning Inc. Glas mit geringer wärmeausdehnung für euvl-anwendungen
WO2011096368A1 (ja) * 2010-02-03 2011-08-11 旭硝子株式会社 微細凹凸構造を表面に有する物品の製造方法
US8541325B2 (en) * 2010-02-25 2013-09-24 Corning Incorporated Low expansivity, high transmission titania doped silica glass
DE102010009589B4 (de) * 2010-02-26 2011-12-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung eines Rohlings aus Titan-dotiertem, hochkieselsäurehaltigem Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie
KR20130124279A (ko) * 2010-07-08 2013-11-13 아사히 가라스 가부시키가이샤 ＴｉＯ₂ 함유 석영 유리 기재 및 그의 제조 방법
US20120026473A1 (en) * 2010-07-29 2012-02-02 Michael Lucien Genier Highly reflective, hardened silica titania article and method of making
JP2011051893A (ja) * 2010-11-29 2011-03-17 Shin-Etsu Chemical Co Ltd ナノインプリントモールド用チタニアドープ石英ガラス
DE102011085358B3 (de) 2011-10-28 2012-07-12 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Konfigurieren einer solchen optischen Anordnung
JP6039207B2 (ja) * 2012-03-23 2016-12-07 Hoya株式会社 Ｅｕｖリソグラフィー用多層反射膜付き基板の製造方法及びｅｕｖリソグラフィー用反射型マスクブランクの製造方法、ｅｕｖリソグラフィー用反射型マスクの製造方法、及び半導体装置の製造方法
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6263051B2 (ja) * 2013-03-13 2018-01-17 Hoya株式会社 ハーフトーン型位相シフトマスクブランクの製造方法
JP6066802B2 (ja) * 2013-03-29 2017-01-25 Hoya株式会社 マスクブランクの製造方法及び転写用マスクの製造方法
EP3224213B1 (en) 2014-11-26 2022-03-23 Corning Incorporated Doped silica-titania glass having low expansivity and methods of making the same
JP2016113356A (ja) * 2014-12-12 2016-06-23 旭硝子株式会社 予備研磨されたガラス基板表面を仕上げ加工する方法
JP6931729B1 (ja) * 2020-03-27 2021-09-08 Hoya株式会社 多層反射膜付き基板、反射型マスクブランク、反射型マスク、及び半導体デバイスの製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE438752A (enExample) * 1939-04-22
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
EP0546196B1 (en) * 1991-06-29 1997-05-02 Shin-Etsu Quartz Products Co., Ltd. Synthetic quartz glass optical member for excimer laser and production thereof
JP2879500B2 (ja) * 1992-06-29 1999-04-05 信越石英株式会社 エキシマレーザー用合成石英ガラス光学部材及びその製造方法
JPH11302025A (ja) * 1998-04-23 1999-11-02 Asahi Glass Co Ltd 合成石英ガラス光学部材およびその製造方法
JP4493060B2 (ja) * 1999-03-17 2010-06-30 信越石英株式会社 エキシマレーザー用光学石英ガラスの製造方法
JP3608654B2 (ja) * 2000-09-12 2005-01-12 Ｈｏｙａ株式会社 位相シフトマスクブランク、位相シフトマスク
US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
US7053017B2 (en) * 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP5367204B2 (ja) * 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
DE102004015766B4 (de) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat
EP1761469B1 (en) * 2004-07-01 2013-05-22 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production

Also Published As

Publication number Publication date
WO2006080241A3 (en) 2006-09-21
WO2006080241A2 (en) 2006-08-03
EP1841702A2 (en) 2007-10-10
JP2006210404A (ja) 2006-08-10
US20090242387A1 (en) 2009-10-01
US20070207911A1 (en) 2007-09-06

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