JP4457085B2 - 光学部品と調整装置とを備えた光学装置、および光学部品の偏光状態に影響を及ぼすための方法 - Google Patents

光学部品と調整装置とを備えた光学装置、および光学部品の偏光状態に影響を及ぼすための方法 Download PDF

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Publication number
JP4457085B2
JP4457085B2 JP2006135338A JP2006135338A JP4457085B2 JP 4457085 B2 JP4457085 B2 JP 4457085B2 JP 2006135338 A JP2006135338 A JP 2006135338A JP 2006135338 A JP2006135338 A JP 2006135338A JP 4457085 B2 JP4457085 B2 JP 4457085B2
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Japan
Prior art keywords
optical component
optical
lens
force
component
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2006135338A
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English (en)
Japanese (ja)
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JP2007005772A5 (enExample
JP2007005772A (ja
Inventor
メルツァー フランク
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Publication of JP2007005772A5 publication Critical patent/JP2007005772A5/ja
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
JP2006135338A 2005-05-16 2006-05-15 光学部品と調整装置とを備えた光学装置、および光学部品の偏光状態に影響を及ぼすための方法 Expired - Fee Related JP4457085B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US68182905P 2005-05-16 2005-05-16

Publications (3)

Publication Number Publication Date
JP2007005772A JP2007005772A (ja) 2007-01-11
JP2007005772A5 JP2007005772A5 (enExample) 2009-07-02
JP4457085B2 true JP4457085B2 (ja) 2010-04-28

Family

ID=37311306

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006135338A Expired - Fee Related JP4457085B2 (ja) 2005-05-16 2006-05-15 光学部品と調整装置とを備えた光学装置、および光学部品の偏光状態に影響を及ぼすための方法

Country Status (3)

Country Link
US (1) US7580207B2 (enExample)
JP (1) JP4457085B2 (enExample)
DE (1) DE102006022957A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006038455A1 (de) * 2006-08-16 2008-02-21 Carl Zeiss Smt Ag Optisches System für die Halbleiterlithographie
US8416386B2 (en) * 2007-03-13 2013-04-09 Nikon Corporation Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
DE102007045975A1 (de) * 2007-09-25 2009-04-09 Carl Zeiss Smt Ag Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul
DE102008032853A1 (de) 2008-07-14 2010-01-21 Carl Zeiss Smt Ag Optische Einrichtung mit einem deformierbaren optischen Element
US8797660B1 (en) * 2013-01-23 2014-08-05 Hinds Instruments, Inc. Alignment mechanism for photoelastic modulators
JP2017211409A (ja) * 2016-05-23 2017-11-30 キヤノン株式会社 保持装置、リソグラフィ装置、および物品の製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1269422A (en) * 1917-11-24 1918-06-11 American Optical Corp Lens.
US4007471A (en) * 1972-10-25 1977-02-08 Polaroid Corporation System for mounting photographic accessories on a camera
CH626785A5 (enExample) * 1978-02-06 1981-12-15 Nestle Sa
US5680262A (en) * 1993-02-12 1997-10-21 Cummins Power Generation, Inc. Stretched membrane mirror and method of making same
US5774274A (en) 1995-05-12 1998-06-30 Schachar; Ronald A. Variable focus lens by small changes of the equatorial lens diameter
JP2000162542A (ja) * 1998-11-30 2000-06-16 Canon Inc 光照射装置および画像投射装置
DE19859634A1 (de) * 1998-12-23 2000-06-29 Zeiss Carl Fa Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie
JP2001284226A (ja) 2000-03-31 2001-10-12 Nikon Corp 光学部材保持装置及び露光装置並びにマイクロデバイスの製造方法。
JP2003156668A (ja) * 2001-11-20 2003-05-30 Canon Inc 光学ユニット、露光装置および光学機器
JP4643994B2 (ja) * 2005-01-19 2011-03-02 浜松ホトニクス株式会社 固浸レンズホルダ
US7312921B2 (en) * 2004-02-27 2007-12-25 Hamamatsu Photonics K.K. Microscope and sample observation method

Also Published As

Publication number Publication date
DE102006022957A1 (de) 2006-11-23
DE102006022957A8 (de) 2008-01-17
US7580207B2 (en) 2009-08-25
US20060279856A1 (en) 2006-12-14
JP2007005772A (ja) 2007-01-11

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