DE102006022957A1 - Optische Vorrichtung mit einem optischen Bauelement und mit einer Verstelleinrichtung und Verfahren zur Beeinflussung eines Polarisationszustands des optischen Bauelements - Google Patents
Optische Vorrichtung mit einem optischen Bauelement und mit einer Verstelleinrichtung und Verfahren zur Beeinflussung eines Polarisationszustands des optischen Bauelements Download PDFInfo
- Publication number
- DE102006022957A1 DE102006022957A1 DE102006022957A DE102006022957A DE102006022957A1 DE 102006022957 A1 DE102006022957 A1 DE 102006022957A1 DE 102006022957 A DE102006022957 A DE 102006022957A DE 102006022957 A DE102006022957 A DE 102006022957A DE 102006022957 A1 DE102006022957 A1 DE 102006022957A1
- Authority
- DE
- Germany
- Prior art keywords
- component
- lens
- moments
- forces
- manipulators
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 71
- 238000005286 illumination Methods 0.000 title claims abstract description 9
- 238000001393 microlithography Methods 0.000 title claims description 3
- 238000000034 method Methods 0.000 claims abstract description 22
- 230000002093 peripheral effect Effects 0.000 claims abstract description 20
- 230000010287 polarization Effects 0.000 claims abstract description 16
- 238000003384 imaging method Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 230000000694 effects Effects 0.000 claims description 11
- 238000013507 mapping Methods 0.000 description 6
- 230000004075 alteration Effects 0.000 description 5
- 230000001419 dependent effect Effects 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US68182905P | 2005-05-16 | 2005-05-16 | |
| US60/681,829 | 2005-05-16 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102006022957A1 true DE102006022957A1 (de) | 2006-11-23 |
| DE102006022957A8 DE102006022957A8 (de) | 2008-01-17 |
Family
ID=37311306
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102006022957A Withdrawn DE102006022957A1 (de) | 2005-05-16 | 2006-05-11 | Optische Vorrichtung mit einem optischen Bauelement und mit einer Verstelleinrichtung und Verfahren zur Beeinflussung eines Polarisationszustands des optischen Bauelements |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US7580207B2 (enExample) |
| JP (1) | JP4457085B2 (enExample) |
| DE (1) | DE102006022957A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007045975A1 (de) * | 2007-09-25 | 2009-04-09 | Carl Zeiss Smt Ag | Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul |
| DE102008032853A1 (de) * | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006038455A1 (de) * | 2006-08-16 | 2008-02-21 | Carl Zeiss Smt Ag | Optisches System für die Halbleiterlithographie |
| US8416386B2 (en) * | 2007-03-13 | 2013-04-09 | Nikon Corporation | Conforming seats for clamps used in mounting an optical element, and optical systems comprising same |
| US8797660B1 (en) * | 2013-01-23 | 2014-08-05 | Hinds Instruments, Inc. | Alignment mechanism for photoelastic modulators |
| JP2017211409A (ja) * | 2016-05-23 | 2017-11-30 | キヤノン株式会社 | 保持装置、リソグラフィ装置、および物品の製造方法 |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1269422A (en) | 1917-11-24 | 1918-06-11 | American Optical Corp | Lens. |
| US4007471A (en) * | 1972-10-25 | 1977-02-08 | Polaroid Corporation | System for mounting photographic accessories on a camera |
| CH626785A5 (enExample) | 1978-02-06 | 1981-12-15 | Nestle Sa | |
| US5680262A (en) | 1993-02-12 | 1997-10-21 | Cummins Power Generation, Inc. | Stretched membrane mirror and method of making same |
| US5774274A (en) | 1995-05-12 | 1998-06-30 | Schachar; Ronald A. | Variable focus lens by small changes of the equatorial lens diameter |
| JP2000162542A (ja) * | 1998-11-30 | 2000-06-16 | Canon Inc | 光照射装置および画像投射装置 |
| DE19859634A1 (de) | 1998-12-23 | 2000-06-29 | Zeiss Carl Fa | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie |
| JP2001284226A (ja) | 2000-03-31 | 2001-10-12 | Nikon Corp | 光学部材保持装置及び露光装置並びにマイクロデバイスの製造方法。 |
| JP2003156668A (ja) | 2001-11-20 | 2003-05-30 | Canon Inc | 光学ユニット、露光装置および光学機器 |
| JP4643994B2 (ja) * | 2005-01-19 | 2011-03-02 | 浜松ホトニクス株式会社 | 固浸レンズホルダ |
| US7312921B2 (en) * | 2004-02-27 | 2007-12-25 | Hamamatsu Photonics K.K. | Microscope and sample observation method |
-
2006
- 2006-05-11 DE DE102006022957A patent/DE102006022957A1/de not_active Withdrawn
- 2006-05-12 US US11/383,012 patent/US7580207B2/en active Active
- 2006-05-15 JP JP2006135338A patent/JP4457085B2/ja not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007045975A1 (de) * | 2007-09-25 | 2009-04-09 | Carl Zeiss Smt Ag | Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul |
| DE102008032853A1 (de) * | 2008-07-14 | 2010-01-21 | Carl Zeiss Smt Ag | Optische Einrichtung mit einem deformierbaren optischen Element |
| US9217936B2 (en) | 2008-07-14 | 2015-12-22 | Carl Zeiss Smt Gmbh | Optical device having a deformable optical element |
| US9798243B2 (en) | 2008-07-14 | 2017-10-24 | Carl Zeiss Smt Gmbh | Optical device having a deformable optical element |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4457085B2 (ja) | 2010-04-28 |
| JP2007005772A (ja) | 2007-01-11 |
| US20060279856A1 (en) | 2006-12-14 |
| US7580207B2 (en) | 2009-08-25 |
| DE102006022957A8 (de) | 2008-01-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1014139B1 (de) | Optisches System, insbesondere Projektionsbelichtungsanlage der Mikrolithographie, mit einer optischen Halterung mit Aktuatoren | |
| DE19827603A1 (de) | Optisches System, insbesondere Projektions-Belichtungsanlage der Mikrolithographie | |
| DE19837135B4 (de) | Afokales Zoomsystem | |
| DE10143385C2 (de) | Projektionsbelichtungsanlage | |
| DE102008041436A1 (de) | Optisches Membranelement | |
| DE102013206981A1 (de) | Facettenspiegel mit im Krümmungsradius einstellbaren Spiegel-Facetten und Verfahren hierzu | |
| WO2005085955A2 (de) | Transmissionsfiltervorrichtung | |
| DE102011055777B4 (de) | Optisches Gerät, optisches Element und Verfahren zu seiner Herstellung | |
| DE102018216964A1 (de) | Aktuatoreinrichtung zur Ausrichtung eines Elements, Projektionsbelichtungsanlage für die Halbleiterlithografie und Verfahren zur Ausrichtung eines Elements | |
| DE102006022957A1 (de) | Optische Vorrichtung mit einem optischen Bauelement und mit einer Verstelleinrichtung und Verfahren zur Beeinflussung eines Polarisationszustands des optischen Bauelements | |
| EP2606390B1 (de) | Mehrstufig justierbare fassungsbaugruppe für zwei optische bauteile | |
| DE102013223017A1 (de) | Optisches Modul | |
| DE102007058158A1 (de) | Optisches System mit einer austauschbaren, manipulierbaren Korrekturanordnung zur Reduzierung von Bildfehlern | |
| WO2021170417A1 (de) | Kompaktes teleobjektiv mit diffraktivem optischen element | |
| DE102017117468B3 (de) | Vorrichtung zur variierbaren Beeinflussung der Wellenfront eines Strahlenbündels mit einer über ihre Umfangsfläche deformierbaren Planoptik | |
| DE102007039851A1 (de) | Optisches System | |
| EP0843190A2 (de) | Modulares Infrarot-Kepler-Fernrohr | |
| DE102012214232A1 (de) | Spiegellagerung für spiegel einer projektionsbelichtungsanlage | |
| DE102012205045A1 (de) | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage | |
| DE102007011561A1 (de) | Einrichtung zur Korrektur der Wellenlängenabhängigkeit in beugungsbasierten optischen Systemen | |
| WO2007096250A1 (de) | Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage | |
| DE102008043243A1 (de) | Projektionsobjektiv für die Mikrolithographie sowie Verfahren zum Verbessern der Abbildungseigenschaften eines Projektionsobjektivs | |
| DE102012214052A1 (de) | Mikrolithographisches Belichtungsverfahren, sowie mikrolithographische Projektionsbelichtungsanlage | |
| DE102018200524A1 (de) | Projektionsbelichtungsanlage für die Halbleiterlithographie mit verbesserter Komponentenjustage und Justageverfahren | |
| DE10312003B4 (de) | Verfahren zur Herstellung eines transmissiven doppelbrechend wirkenden optischen Elements sowie transmissives doppelbrechend wirkendes optisches Element |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8196 | Reprint of faulty title page (publication) german patentblatt: part 1a6 | ||
| 8127 | New person/name/address of the applicant |
Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE |
|
| R005 | Application deemed withdrawn due to failure to request examination |
Effective date: 20130514 |