JP4426127B2 - 金属箔電解製造装置 - Google Patents

金属箔電解製造装置 Download PDF

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Publication number
JP4426127B2
JP4426127B2 JP2001095612A JP2001095612A JP4426127B2 JP 4426127 B2 JP4426127 B2 JP 4426127B2 JP 2001095612 A JP2001095612 A JP 2001095612A JP 2001095612 A JP2001095612 A JP 2001095612A JP 4426127 B2 JP4426127 B2 JP 4426127B2
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JP
Japan
Prior art keywords
metal foil
rotating cathode
plate
supply port
width direction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001095612A
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English (en)
Japanese (ja)
Other versions
JP2002294481A (ja
Inventor
文彰 細越
尚光 井上
悟 藤田
龍義 坂田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Mining and Smelting Co Ltd
Original Assignee
Mitsui Mining and Smelting Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Mining and Smelting Co Ltd filed Critical Mitsui Mining and Smelting Co Ltd
Priority to JP2001095612A priority Critical patent/JP4426127B2/ja
Priority to TW091104071A priority patent/TW567249B/zh
Priority to PCT/JP2002/002650 priority patent/WO2002079547A1/fr
Priority to CNB028008383A priority patent/CN1272473C/zh
Priority to KR1020027014971A priority patent/KR100864753B1/ko
Priority to US10/275,289 priority patent/US20030102209A1/en
Publication of JP2002294481A publication Critical patent/JP2002294481A/ja
Application granted granted Critical
Publication of JP4426127B2 publication Critical patent/JP4426127B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
    • C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
    • C25C1/12—Electrolytic production, recovery or refining of metals by electrolysis of solutions of copper
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/04—Wires; Strips; Foils

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Electroplating Methods And Accessories (AREA)
JP2001095612A 2001-03-29 2001-03-29 金属箔電解製造装置 Expired - Fee Related JP4426127B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001095612A JP4426127B2 (ja) 2001-03-29 2001-03-29 金属箔電解製造装置
TW091104071A TW567249B (en) 2001-03-29 2002-03-05 Apparatus for electrolytically manufacturing metal foil
PCT/JP2002/002650 WO2002079547A1 (fr) 2001-03-29 2002-03-20 Dispositif de fabrication electrolytique de feuilles metalliques
CNB028008383A CN1272473C (zh) 2001-03-29 2002-03-20 电解制造金属箔的装置
KR1020027014971A KR100864753B1 (ko) 2001-03-29 2002-03-20 금속박 전해 제조장치
US10/275,289 US20030102209A1 (en) 2001-03-29 2002-03-20 Metal foil electrolytic manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001095612A JP4426127B2 (ja) 2001-03-29 2001-03-29 金属箔電解製造装置

Publications (2)

Publication Number Publication Date
JP2002294481A JP2002294481A (ja) 2002-10-09
JP4426127B2 true JP4426127B2 (ja) 2010-03-03

Family

ID=18949632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001095612A Expired - Fee Related JP4426127B2 (ja) 2001-03-29 2001-03-29 金属箔電解製造装置

Country Status (6)

Country Link
US (1) US20030102209A1 (fr)
JP (1) JP4426127B2 (fr)
KR (1) KR100864753B1 (fr)
CN (1) CN1272473C (fr)
TW (1) TW567249B (fr)
WO (1) WO2002079547A1 (fr)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100554527C (zh) * 2003-04-03 2009-10-28 福田金属箔粉工业株式会社 低粗糙面电解铜箔及其制造方法
KR100813353B1 (ko) * 2006-03-14 2008-03-12 엘에스전선 주식회사 광폭 방향의 중량편차 저감을 위한 금속박막 제박기
KR100700799B1 (ko) * 2006-03-20 2007-03-28 엘에스전선 주식회사 동박의 연속적인 권취방법
JP4866706B2 (ja) * 2006-11-08 2012-02-01 赤星工業株式会社 金属箔電解製造装置
JP4642120B2 (ja) * 2009-04-01 2011-03-02 三井金属鉱業株式会社 電解金属箔製造装置並びに電解金属箔製造装置に用いる薄板状不溶性金属電極の製造方法及びその電解金属箔製造装置を用いて得られた電解金属箔
KR101037245B1 (ko) * 2010-11-16 2011-05-26 경북대학교 산학협력단 신발 살균 처리 장치
KR20130117865A (ko) * 2011-03-04 2013-10-28 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 강도가 높고, 이상 전착에 의한 돌기 형상이 적은 전해 구리박 및 그 제조 방법
KR101343951B1 (ko) * 2011-06-23 2013-12-24 코닉이앤씨 주식회사 금속박의 제조 방법 및 제조 장치
JP5175992B1 (ja) * 2012-07-06 2013-04-03 Ｊｘ日鉱日石金属株式会社 極薄銅箔及びその製造方法、並びに極薄銅層
CN103233249A (zh) * 2013-05-09 2013-08-07 南京顺捷机械设备有限公司 一种上进液式铜箔一体机设备
CN104087977B (zh) * 2014-07-06 2016-05-11 湖北中一科技有限公司 一种带有混匀供料一体结构的电解铜箔进料装置及方法
KR102045630B1 (ko) * 2017-11-28 2019-11-15 주식회사 포스코 전주 도금 장치
KR102209616B1 (ko) * 2018-12-05 2021-01-28 주식회사 포스코 전주 도금장치
CN109652826A (zh) * 2019-02-22 2019-04-19 圣达电气有限公司 阴极辊的电解铜箔厚度均匀性控制方法
JP7005558B2 (ja) * 2019-06-10 2022-01-21 日鉄工材株式会社 金属箔製造装置
CN114657607B (zh) * 2022-03-01 2022-12-20 广东嘉元科技股份有限公司 一种电子铜箔制造装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4318794A (en) * 1980-11-17 1982-03-09 Edward Adler Anode for production of electrodeposited foil
US4529486A (en) * 1984-01-06 1985-07-16 Olin Corporation Anode for continuous electroforming of metal foil
US4647345A (en) * 1986-06-05 1987-03-03 Olin Corporation Metallurgical structure control of electrodeposits using ultrasonic agitation
US5228965A (en) 1990-10-30 1993-07-20 Gould Inc. Method and apparatus for applying surface treatment to metal foil

Also Published As

Publication number Publication date
WO2002079547A1 (fr) 2002-10-10
JP2002294481A (ja) 2002-10-09
TW567249B (en) 2003-12-21
CN1460133A (zh) 2003-12-03
KR100864753B1 (ko) 2008-10-22
US20030102209A1 (en) 2003-06-05
KR20030007594A (ko) 2003-01-23
CN1272473C (zh) 2006-08-30

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