JP4393150B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4393150B2
JP4393150B2 JP2003343230A JP2003343230A JP4393150B2 JP 4393150 B2 JP4393150 B2 JP 4393150B2 JP 2003343230 A JP2003343230 A JP 2003343230A JP 2003343230 A JP2003343230 A JP 2003343230A JP 4393150 B2 JP4393150 B2 JP 4393150B2
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JP
Japan
Prior art keywords
reticle
original
alignment
electrostatic chuck
chuck
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003343230A
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English (en)
Japanese (ja)
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JP2005109332A5 (enrdf_load_stackoverflow
JP2005109332A (ja
Inventor
義一 宮島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003343230A priority Critical patent/JP4393150B2/ja
Publication of JP2005109332A publication Critical patent/JP2005109332A/ja
Publication of JP2005109332A5 publication Critical patent/JP2005109332A5/ja
Application granted granted Critical
Publication of JP4393150B2 publication Critical patent/JP4393150B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003343230A 2003-10-01 2003-10-01 露光装置 Expired - Fee Related JP4393150B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003343230A JP4393150B2 (ja) 2003-10-01 2003-10-01 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003343230A JP4393150B2 (ja) 2003-10-01 2003-10-01 露光装置

Publications (3)

Publication Number Publication Date
JP2005109332A JP2005109332A (ja) 2005-04-21
JP2005109332A5 JP2005109332A5 (enrdf_load_stackoverflow) 2006-11-16
JP4393150B2 true JP4393150B2 (ja) 2010-01-06

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ID=34537272

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003343230A Expired - Fee Related JP4393150B2 (ja) 2003-10-01 2003-10-01 露光装置

Country Status (1)

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JP (1) JP4393150B2 (enrdf_load_stackoverflow)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4962779B2 (ja) * 2007-07-06 2012-06-27 株式会社安川電機 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置
JP2009016679A (ja) * 2007-07-06 2009-01-22 Yaskawa Electric Corp ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置
JP4962780B2 (ja) * 2007-07-06 2012-06-27 株式会社安川電機 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置
JP4985392B2 (ja) * 2007-12-28 2012-07-25 株式会社ニコン 基板保持装置、露光装置およびデバイスの製造方法
JP2009194204A (ja) * 2008-02-15 2009-08-27 Nikon Corp 露光装置、露光システムおよびデバイス製造方法
JP5462028B2 (ja) * 2010-02-23 2014-04-02 Ｎｓｋテクノロジー株式会社 露光装置、露光方法及び基板の製造方法
JP5609663B2 (ja) * 2011-01-18 2014-10-22 旭硝子株式会社 ガラス基板保持手段、およびそれを用いたｅｕｖマスクブランクスの製造方法
JP5724657B2 (ja) 2011-06-14 2015-05-27 旭硝子株式会社 ガラス基板保持手段、およびそれを用いたｅｕｖマスクブランクスの製造方法

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Publication number Publication date
JP2005109332A (ja) 2005-04-21

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