JP4387198B2 - 多数の鏡面を有する面鏡 - Google Patents
多数の鏡面を有する面鏡 Download PDFInfo
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- JP4387198B2 JP4387198B2 JP2003566598A JP2003566598A JP4387198B2 JP 4387198 B2 JP4387198 B2 JP 4387198B2 JP 2003566598 A JP2003566598 A JP 2003566598A JP 2003566598 A JP2003566598 A JP 2003566598A JP 4387198 B2 JP4387198 B2 JP 4387198B2
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- mirror
- spherical body
- lever element
- control means
- reflective surface
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1824—Manual alignment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/198—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the mirror relative to its support
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
- Optical Elements Other Than Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Description
Claims (20)
- マイクロリソグラフィの投影露光機(1)用の照明装置(3)に使用される多数の鏡面(11)を有する面鏡(10)であって、前記鏡面(11)の少なくとも一部は、球形本体(17)を有し、反射表面(12)が前記球形本体(17)の窪み(18)に配列され、前記反射表面(12)からそらされた前記球形本体(17)の側部は軸受装置(15)内に装着され、前記軸受装置(15)は、キャリアプレート(16)内に設けられた前記反射表面(12)の方向に開口を有する円錐内腔(19)、および、保持プレート(22)内に設けられた前記円錐内腔(19)と対向する方向に開口を有する他の円錐内腔(21)を備え、前記球形本体(17)が前記軸受装置(15)とともに、少なくともほぼ環状の座表面(20)を前記円錐内腔(19)上に形成するように構成されることを特徴とする面鏡。
- レバー要素(23)が、前記反射表面(12)からそらされた前記球形本体(17)の側部で前記鏡面(11)の少なくとも一部に配列されている。ことを特徴とする請求項1記載の面鏡。
- 前記レバー要素(23)と前記球形本体(17)とは、一体的に構成されることを特徴とする請求項2に記載の面鏡。
- 前記レバー要素(23)は、前記反射表面(12)の表面法線(n)に整列配置して構成されることを特徴とする請求項2または3に記載の面鏡。
- 前記反射表面(12)は、前記球形本体(17)の前記窪み内に直接固定されることを特徴とする請求項1ないし4のいずれか1項に記載の面鏡。
- 前記反射表面(12)は、基板から、中間要素(13)に加えられ、前記球形本体(17)の前記窪み(18)内に挿入されそれに接続されることを特徴とする請求項1ないし4のいずれか1項に記載の面鏡。
- 前記球形本体(17)の前記窪み(18)内の前記中間要素(13)は、前記球形本体(17)にねじられることを特徴とする請求項6記載の面鏡。
- 前記軸受装置(15)は、直径が前記球形本体(17)の直径に対応する球形キャップ(26)として構成されることを特徴とする請求項1ないし7のいずれか1項に記載の面鏡。
- ばね手段を介して前記軸受装置の方向に前記球形本体(17)の各々に力が加えられることを特徴とする請求項1ないし8のいずれか1項に記載の面鏡。
- マイクロリソグラフィの投影露光機(1)用の照明装置(3)に使用される、面鏡(10)の鏡面(11)を調整するための装置(15)であって、前記鏡面(11)の各々は球形本体(17)を具備し、反射表面(12)が前記球形本体(17)の窪み(18)に配列され、前記反射表面(12)からそらされた前記球形本体(17)の側部は軸受装置(15)に装着され、前記軸受装置(15)は、キャリアプレート(16)内に設けられた前記反射表面(12)の方向に開口を有する円錐内腔(19)および保持プレート(22)内に設けられた前記円錐内腔(19)と対向する方向に開口を有する他の円錐内腔(21)を備え、前記球形本体(17)が前記軸受装置(15)とともに、少なくともほぼ環状の封止座面(20)を前記円錐内腔(19)上に形成するように構成され、レバー要素(23)が、前記反射表面(12)からそらされた前記球形本体(17)の側部で前記鏡面(11)の少なくとも一部に配列され、制御手段(A、27)が、前記球形本体(17)からそらされた領域で前記レバー要素(23)に作用し前記球形本体(17)がこの中心点を中心にして動くのを達成するのを可能にする装置。
- 前記制御手段(27)は、伝達手段を介して前記レバー要素(23)に作用することを特徴とする請求項10記載の装置。
- 前記伝達手段は、レバー(28)として構成されることを特徴とする請求項11記載の装置。
- 前記制御手段(27)は、ばね手段(29)を介して前記レバー要素(23)に作用することを特徴とする請求項10、11または12に記載の装置。
- 3つの制御手段(27)が、これらの力(F1、F2、F3)の作用が、互いに各120度の角度であり、前記レバー要素(23)の長手方向軸に対して少なくともほぼ垂直である(中立位置である)ように、前記レバー要素(23)に作用することを特徴とする請求項13記載の装置。
- 2つの制御手段(27)が、これらの力(Fx、Fy)の作用が、互いに90度の角度であり、前記レバー要素(23)の長手方向軸に対して少なくともほぼ垂直である(中立位置である)ように、前記レバー要素(23)に作用し、前記レバー要素(23)は、この作用の点の方向における力(Fx、Fy)の作用に対して各場合に135度の角度でばね手段(31)によって押圧されることを特徴とする請求項10ないし13のいずれか1項に記載の装置。
- 前記制御手段(A、27)は、止めねじとして構成されることを特徴とする請求項10ないし15のいずれか1項に記載の装置。
- 前記制御手段(A、27)は、アクチュエータとして構成されることを特徴とする請求項10ないし15のいずれか1項に記載の装置。
- 前記制御手段は、基本位置に整列配置した前記レバー要素(23)に少なくともほぼ平行な方向に動くことができ、球形本体と円錐表面との間の接触を介して前記レバー要素(23)に作用することを特徴とする請求項10ないし15のいずれか1項に記載の装置。
- 前記制御手段は、前記レバー要素(23)に接触する領域で球形構造である止めねじ(33)として構成され、前記レバー要素(23)は、前記接触領域で、鏡の方向にテーパする円錐(32)を有することを特徴とする請求項18に記載の装置。
- 前記制御手段は、前記レバー要素(23)に接触する領域で、鏡の方向にそれぞれテーパする円錐(34’)を有する止めねじ(33)として構成され、前記レバー要素(23)は、前記接触領域で球形構造である請求項18記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10205425A DE10205425A1 (de) | 2001-11-09 | 2002-02-09 | Facettenspiegel mit mehreren Spiegelfacetten |
PCT/EP2002/014748 WO2003067304A1 (de) | 2002-02-09 | 2002-12-23 | Facettenspiegel mit mehreren spiegelfacetten |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005517291A JP2005517291A (ja) | 2005-06-09 |
JP4387198B2 true JP4387198B2 (ja) | 2009-12-16 |
Family
ID=27674595
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003566598A Expired - Fee Related JP4387198B2 (ja) | 2002-02-09 | 2002-12-23 | 多数の鏡面を有する面鏡 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7354168B2 (ja) |
EP (1) | EP1472562B1 (ja) |
JP (1) | JP4387198B2 (ja) |
AT (1) | ATE464585T1 (ja) |
AU (1) | AU2002364975A1 (ja) |
DE (1) | DE50214375D1 (ja) |
WO (1) | WO2003067304A1 (ja) |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10302664A1 (de) * | 2003-01-24 | 2004-07-29 | Carl Zeiss Smt Ag | Verfahren zur Herstellung eines Facettenspiegels |
US7246909B2 (en) * | 2003-01-24 | 2007-07-24 | Carl Zeiss Smt Ag | Method for the production of a facetted mirror |
US7753937B2 (en) | 2003-12-10 | 2010-07-13 | Facet Solutions Inc. | Linked bilateral spinal facet implants and methods of use |
US8333789B2 (en) | 2007-01-10 | 2012-12-18 | Gmedelaware 2 Llc | Facet joint replacement |
US8562649B2 (en) | 2004-02-17 | 2013-10-22 | Gmedelaware 2 Llc | System and method for multiple level facet joint arthroplasty and fusion |
US7588578B2 (en) | 2004-06-02 | 2009-09-15 | Facet Solutions, Inc | Surgical measurement systems and methods |
DE102004030803A1 (de) * | 2004-06-25 | 2006-01-19 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hochreflektiv beschichteter mikromechanischer Spiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
DE102004054755B4 (de) * | 2004-07-08 | 2013-12-24 | Fachhochschule Aachen | Vorrichtung zur Konzentration von Licht, insbesondere von Sonnenlicht |
US20070222556A1 (en) * | 2005-05-17 | 2007-09-27 | Robbins Gene A | Tracking system for distributable objects which are marked in single laser shot events with dynamically variable images |
US7667723B2 (en) * | 2006-04-13 | 2010-02-23 | Lexmark International, Inc. | Angular adjustment of MEMS torsion oscillator scanner |
DE102007008448A1 (de) * | 2007-02-19 | 2008-08-21 | Carl Zeiss Smt Ag | Verfahren zur Herstellung von Spiegelfacetten für einen Facettenspiegel |
WO2008101664A1 (en) * | 2007-02-20 | 2008-08-28 | Carl Zeiss Smt Ag | Optical element with multiple primary light sources |
US7878667B2 (en) * | 2007-11-09 | 2011-02-01 | Mario Rabinowitz | Latching solar concentrator pivoted mirrors during off-power period |
EP2243047B1 (en) * | 2008-02-15 | 2021-03-31 | Carl Zeiss SMT GmbH | Facet mirror for use in a projection exposure apparatus for microlithography |
DE102009000099A1 (de) * | 2009-01-09 | 2010-07-22 | Carl Zeiss Smt Ag | Mikrospiegelarray mit Doppelbiegebalken Anordnung und elektronischer Aktorik |
DE102008000788A1 (de) * | 2008-03-20 | 2009-09-24 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
US8016438B2 (en) * | 2008-09-23 | 2011-09-13 | Raytheon Company | Spherical mirror mount |
DE102008049556B4 (de) * | 2008-09-30 | 2011-07-07 | Carl Zeiss SMT GmbH, 73447 | Mikrolithographische Projektionsbelichtungsanlage |
JP5428375B2 (ja) * | 2009-02-18 | 2014-02-26 | 株式会社ニコン | 保持装置、光学系、露光装置及びデバイスの製造方法 |
DE102009014701A1 (de) * | 2009-03-27 | 2010-09-30 | Carl Zeiss Smt Ag | Optische Baugruppe |
JP5688410B2 (ja) * | 2009-06-30 | 2015-03-25 | エーエスエムエル ネザーランズ ビー.ブイ. | 反射要素のアレイの回転マウンティングおよびそれを組み入れたリソグラフィ装置 |
DE102009054888A1 (de) | 2009-12-17 | 2011-06-22 | Carl Zeiss SMT GmbH, 73447 | Optisches Element mit einer Mehrzahl von refletiven Facettenelementen |
DE102010003226A1 (de) * | 2010-03-24 | 2011-09-29 | Cube Optics Ag | Multiplexer/Demultiplexer mit Justierspiegel |
EP2390598B1 (en) * | 2010-05-31 | 2015-04-22 | Rioglass Solar, S.A. | System and method for the articulated attachment of solar reflector elements to supporting structures |
JP5727005B2 (ja) | 2010-07-01 | 2015-06-03 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学系及びマルチファセットミラー |
JP5738410B2 (ja) * | 2010-07-28 | 2015-06-24 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ファセットミラーデバイス |
WO2012025132A1 (en) | 2010-08-25 | 2012-03-01 | Carl Zeiss Smt Gmbh | Multi facet mirror of a microlithographic projection exposure apparatus |
EP2697688B1 (en) | 2011-04-14 | 2018-12-19 | Carl Zeiss SMT GmbH | Facet mirror device |
JP5960806B2 (ja) * | 2011-06-21 | 2016-08-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ファセットミラーデバイス |
JP5892363B2 (ja) * | 2011-09-06 | 2016-03-23 | カシオ計算機株式会社 | 光学素子固定装置、光学素子固定装置を含むプロジェクタ、及び、光学素子固定装置による光学素子の角度調整方法 |
DE102011086345A1 (de) | 2011-11-15 | 2013-05-16 | Carl Zeiss Smt Gmbh | Spiegel |
DE102012200736A1 (de) * | 2012-01-19 | 2013-07-25 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere zum Einsatz in einer mikrolithographischen Projektionsbelichtungsanlage |
DE102012200732A1 (de) * | 2012-01-19 | 2013-02-28 | Carl Zeiss Smt Gmbh | Spiegelanordnung, insbesondere zum Einsatz in einer mikrolithographischen Projektionsbelichtungsanlage |
WO2013142083A2 (en) * | 2012-03-22 | 2013-09-26 | Nikon Corporation | Mirror assembly with heat transfer mechanism |
US20130270461A1 (en) * | 2012-04-13 | 2013-10-17 | Kla-Tencor Corporation | Smart memory alloys for an extreme ultra-violet (euv) reticle inspection tool |
DE102012010093A1 (de) * | 2012-05-23 | 2013-11-28 | Carl Zeiss Smt Gmbh | Facettenspiegel |
US9494878B2 (en) | 2012-10-15 | 2016-11-15 | Asml Netherlands B.V. | Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices |
NL2011457A (en) | 2012-10-15 | 2014-04-16 | Asml Netherlands Bv | Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices. |
DE102012223034A1 (de) * | 2012-12-13 | 2013-12-12 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer Mikrolithographischen Projektionsbelichtungsanlage |
DE102013203035A1 (de) * | 2013-02-25 | 2014-08-28 | Carl Zeiss Smt Gmbh | Optisches modul |
DE102013209012A1 (de) * | 2013-05-15 | 2014-05-28 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsanlage für die Halbleiterlithographie mit einem Formgedächtniselement |
DE102015225537B4 (de) * | 2015-12-17 | 2019-11-14 | Carl Zeiss Smt Gmbh | Vorrichtung zur Ausrichtung eines Bauteils, Betätigungseinrichtung und Projektionsbelichtungsanlage |
JP6357505B2 (ja) * | 2016-06-23 | 2018-07-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ファセットミラーデバイス |
DE102016213561A1 (de) * | 2016-07-25 | 2018-01-25 | Trumpf Laser Gmbh | Optische Anordnung mit scheibenförmigem laseraktiven Medium |
DE102019214269A1 (de) * | 2019-09-19 | 2021-03-25 | Carl Zeiss Smt Gmbh | Facettenspiegel für eine Beleuchtungsoptik einer Projektionsbelichtungsanlage |
CN116560071B (zh) * | 2023-07-11 | 2023-10-20 | 北京瑞控信科技股份有限公司 | 一种基于记忆合金锁止结构的快反镜 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1093498A (en) * | 1913-09-19 | 1914-04-14 | Alfred C Thring | Sun-power water-heater. |
US3515464A (en) * | 1967-07-20 | 1970-06-02 | Hughes Aircraft Co | Monochromatic prism assembly for laser application |
DE2363765A1 (de) * | 1973-12-21 | 1975-06-26 | Agfa Gevaert Ag | Lager fuer einen schwenkbaren spiegel |
US4110009A (en) * | 1975-12-19 | 1978-08-29 | Bunch Jesse C | Heliostat apparatus |
US4087682A (en) * | 1976-03-15 | 1978-05-02 | Kolodziej Henry W | Illuminating device |
US4130109A (en) * | 1977-11-25 | 1978-12-19 | Brueck Chris M | Solar energy concentrator |
US4195193A (en) | 1979-02-23 | 1980-03-25 | Amp Incorporated | Lead frame and chip carrier housing |
US4511250A (en) * | 1981-07-20 | 1985-04-16 | Ball Corporation | Apparatus for measuring scalar irradiance |
JPS6254210A (ja) | 1985-09-03 | 1987-03-09 | Canon Inc | 角度調整装置 |
US4740276A (en) | 1987-05-08 | 1988-04-26 | The United States Of America As Represented By The Secretary Of The Air Force | Fabrication of cooled faceplate segmented aperture mirrors (SAM) by electroforming |
RO101091B1 (en) | 1989-04-17 | 1992-12-10 | Alignement device for laser resonator mirrors | |
GB2255195A (en) | 1991-04-17 | 1992-10-28 | Martin Farnell | Ball-backed mirror mounted in a conical depression in a wall building compound |
JPH0777191B2 (ja) * | 1993-04-06 | 1995-08-16 | 日本電気株式会社 | 露光光投射装置 |
JPH07199038A (ja) * | 1994-01-10 | 1995-08-04 | Sumitomo Heavy Ind Ltd | 凹面鏡のあおり調整装置 |
DE19504568A1 (de) | 1995-02-11 | 1996-08-14 | Zeiss Carl Fa | Kippspiegelanordnung |
JPH0996757A (ja) | 1995-10-02 | 1997-04-08 | Olympus Optical Co Ltd | 光路偏向装置 |
DE29617111U1 (de) * | 1996-10-01 | 1996-12-05 | Hara Smith Stephen C O | Justierbarer Reflektor |
DE19735760A1 (de) | 1997-08-18 | 1999-02-25 | Zeiss Carl Fa | Lötverfahren für optische Materialien an Metallfassungen und gefaßte Baugruppen |
US6154302A (en) * | 1997-11-15 | 2000-11-28 | Canon Kabushiki Kaisha | Light deflection device and array thereof |
JP2000167683A (ja) * | 1998-12-03 | 2000-06-20 | Mitsubishi Electric Corp | 反射鏡による光路調整装置 |
US6563569B2 (en) * | 2000-09-25 | 2003-05-13 | Agency Of Industrial Science & Technology, Ministry Of International Trade & Industry | Laser tracking interferometric length measuring instrument and method of measuring length and coordinates using the same |
US7090362B2 (en) * | 2001-11-09 | 2006-08-15 | Carl Zeiss Smt Ag | Facet mirror having a number of mirror facets |
US7246909B2 (en) * | 2003-01-24 | 2007-07-24 | Carl Zeiss Smt Ag | Method for the production of a facetted mirror |
-
2002
- 2002-12-23 AU AU2002364975A patent/AU2002364975A1/en not_active Abandoned
- 2002-12-23 JP JP2003566598A patent/JP4387198B2/ja not_active Expired - Fee Related
- 2002-12-23 DE DE50214375T patent/DE50214375D1/de not_active Expired - Lifetime
- 2002-12-23 EP EP02806742A patent/EP1472562B1/de not_active Expired - Lifetime
- 2002-12-23 WO PCT/EP2002/014748 patent/WO2003067304A1/de active Application Filing
- 2002-12-23 AT AT02806742T patent/ATE464585T1/de not_active IP Right Cessation
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2004
- 2004-05-18 US US10/848,210 patent/US7354168B2/en not_active Expired - Fee Related
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ATE464585T1 (de) | 2010-04-15 |
JP2005517291A (ja) | 2005-06-09 |
US7354168B2 (en) | 2008-04-08 |
DE50214375D1 (de) | 2010-05-27 |
EP1472562A1 (de) | 2004-11-03 |
US20050030653A1 (en) | 2005-02-10 |
AU2002364975A1 (en) | 2003-09-02 |
WO2003067304A1 (de) | 2003-08-14 |
EP1472562B1 (de) | 2010-04-14 |
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