EP1442330A1 - Tilting mirror - Google Patents
Tilting mirrorInfo
- Publication number
- EP1442330A1 EP1442330A1 EP02785265A EP02785265A EP1442330A1 EP 1442330 A1 EP1442330 A1 EP 1442330A1 EP 02785265 A EP02785265 A EP 02785265A EP 02785265 A EP02785265 A EP 02785265A EP 1442330 A1 EP1442330 A1 EP 1442330A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- mirror
- tilting
- spherical member
- tilting mirror
- facet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1821—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors for rotating or oscillating mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
- G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
- G02B7/1824—Manual alignment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
Definitions
- the invention relates to a tilting mirror, in particular as mirror facet for a facet mirror comprising a plurality of these tilting mirrors, having a mirror surface and a bearing device, a method for adjusting such a tilting mirror, and the use of such a tilting mirror.
- Tilting mirrors in particular as mirror facet for facet mirrors comprising a plurality of these mirror facets, are known from the prior art.
- GB 2 255 195 A describes such facet mir- rors having individual tilting mirrors and appropriate bearing elements for the facet mirrors, whose intended use is to be looked for, in particular, in the field of solar energy technology.
- Each individual one of the tilting mirrors is constructed in this case such that it comprises a mirror surface which is connected via a rod to a sphere which is fastened in appropriate bearing devices.
- the accuracy of such arrangements with regard to the possibility of adjusting them or the like is extremely limited in this case, since the individual tilting mirrors are held in a comparatively loose fashion and maladjustment can come about very easily and quickly.
- EP 0 72 ⁇ 479 A2 describes a tilting mirror ar- rangement which has at least one tilting mirror, a basic body and at least one mirror bearing with an at least virtually fixed fulcrum between the tilting mirror and the base.
- the overall size of the total arrangement of tilting mirror bearing and tilting mirror housing is arranged below the mirror surface in such a way that, when projected onto the mirror plane, it does not project beyond it, or does so only slightly when the tilting mirror is deflected.
- Such tilting mirrors are used, for ex- ample, in the field of laser technology.
- Such mirrors can also be adjusted when illuminated, owing to the possibility of mounting the basic body correspondingly via the mirror bearing and readjusting it, if appropriate.
- the design is very complicated, and so a very high outlay on overall space, adjusting elements, costs and the like is to be expected in the case of facet mirrors which could be formed from these tilting mirrors.
- the mirror surface is constructed as the surface of a recess in a spherical member, the spherical member being mounted in the bearing device.
- the mirror surface is introduced into the spherical member, which simultaneously serves as bearing member for mounting the tilting mirror in a bearing device.
- This provides a design which permits the tilting mirror to be adjusted freely and, in the case where it is used as a unipartite mirror facet in a facet mirror, independently of the other mirror facets.
- the design from one sphere as mirror member and bearing member is very simple and cost-effective here.
- An alternative embodiment is to arrange the mirror surface in a recess in a spherical member, the spherical member being mounted in the bearing device.
- the bearing device is constructed as a conical bore in a plate, the spherical member being arranged in the bore.
- a method for adjusting such a tilting mirror follows from the characterizing part of Claim 13, the spherical member then being introduced, in accordance with some advantageous developments of the invention, between two plates which in each case have a conical bore for the spherical members. Moreover, for the adjustment the spherical member has a lever element which is located on the side of the spherical member averted from the mirror surface.
- the adjustment of the mirror surface of the tilting mirror can be carried out via force actions on the lever element, after which the position of the tilting mirror is fixed by pressing the first and the second plates against one another.
- the adjustment can be performed with illumination, such that the conditions, for example, of a thermal type, actually obtaining are present for the mirror facets as early as during adjustment. Owing to the possibility of adjustment from the side of the mirror facets averted from the mirror surface, in this case there is no disturbance of the illumination and thus of the conditions by the operation of adjustment. Moreover, the adjustment can be performed with the aid of the result of the illumination itself, and so the accuracy to be achieved can be improved in the real later conditions of use .
- Such a tilting mirror can be used particularly favourably as a mirror facet for a facet mirror in a lens for semiconductor lithography, and here, in particular, for lithography operating with the extreme ultraviolet (E ⁇ V) as radiation.
- E ⁇ V extreme ultraviolet
- Facet mirrors which use a multiplicity of individually freely adjustable facets to guide the EUV radiation in the lens have proved to be particularly favourable in the case of such lenses, and so this must surely be seen as one of the preferred fields of use of the tilting mirror according to the invention.
- a facet mirror 1 which has three tilting mirrors or three mirror facets 2 in the exemplary embodiment illustrated here.
- Each of the mirror facets 2 is constructed in this case as a spherical member 3.
- a recess 4 which is provided here with a reference numeral only at one of the spherical members 3, which has been supplemented by a dashed line to form the cross-sectional shape of a sphere.
- the remaining surface of the spherical member 3 in the region of this recess 4 then forms the mir- ror surface 5 which is additionally symbolized in each case by its surface normal n in the sole figure attached.
- each of the mirror facets 2 is mounted in a bearing device.
- the bearing device comprises a conical bore 6 which is introduced into a plate 7 which is denoted below as lower carrier plate 7.
- the spherical member 3 lies in this conical bore 6, whose larger opening diameter is arranged in this case such that the spherical member 3 lies in the coni- cal bore 6 but cannot fall through the latter.
- the bearing device has devices for reliably retaining the spherical member 3.
- these devices are con- structed as a further conical bore 8 which is provided in a second plate 9.
- This second plate 9 is denoted in this case below as upper carrier plate 9, for the sake of better understanding.
- the larger opening angle of the further conical bore 8 is arranged such that it faces the lower carrier plate 7.
- This adjusting device can be constructed, for example, as a lever element 10 connected to the spherical member 3. Via such a lever element 10, which projects through the conical bore 6 in the lower carrier plate 7, the facet mirror 1 can thus be adjusted, under illumination, from behind, that is to say from its side averted from the illumination, that is to say under the conditions provided for correct operation.
- the transmission ratio between the movement of the mirror surface 5 or its surface normal n and the deflection of the lever element 10 can be set in this case by the length of the lever element 10. It is particularly rational in this case when the lever element 10 is constructed to be aligned with the surface normal n of the mirror surface 5.
- actuators which are indicated in principle here by the arrows A.
- Conceivable here as actuators are all known forms of actuators which, for example, use pneumatic, hydraulic, piezoelectric, magnetic or mechanical forces.
- the lower carrier plate 7 is constructed from a material which is much softer than the material of the spherical members 3.
- the upper carrier plate 9 should be constructed from a material which is somewhat harder than the material of the lower carrier plate 7 but which is also much softer than the material of the spherical members 3. This ensures that upon the two plates 7 and 9 being pressed together, the spherical members 3 are easily pressed into the lower carrier plate 7, and that their position is ensured by friction forces (even in the case of vibrations, shock or the like) .
- the latter can also still be bonded or soldered to at least one of the plates 7, 9 as well.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
- Mounting And Adjusting Of Optical Elements (AREA)
Abstract
Description
Claims
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10155261 | 2001-11-09 | ||
DE10155261 | 2001-11-09 | ||
PCT/EP2002/011773 WO2003040796A1 (en) | 2001-11-09 | 2002-10-22 | Tilting mirror |
Publications (1)
Publication Number | Publication Date |
---|---|
EP1442330A1 true EP1442330A1 (en) | 2004-08-04 |
Family
ID=7705312
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02785265A Withdrawn EP1442330A1 (en) | 2001-11-09 | 2002-10-22 | Tilting mirror |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1442330A1 (en) |
JP (1) | JP2005508520A (en) |
WO (1) | WO2003040796A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007008448A1 (en) * | 2007-02-19 | 2008-08-21 | Carl Zeiss Smt Ag | Method of producing mirror facets for a facet mirror |
WO2008116886A1 (en) | 2007-03-27 | 2008-10-02 | Carl Zeiss Smt Ag | Correction of optical elements by means of correction light emitted in a flat manner |
JP5345132B2 (en) | 2007-04-25 | 2013-11-20 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Illumination system for illuminating a mask in a microlithographic exposure apparatus |
EP2243047B1 (en) | 2008-02-15 | 2021-03-31 | Carl Zeiss SMT GmbH | Facet mirror for use in a projection exposure apparatus for microlithography |
WO2010008993A1 (en) * | 2008-07-17 | 2010-01-21 | Nikon Corporation | Adaptive fly-eye and other mirrors for extreme ultraviolet and other optical systems |
DE102008049585A1 (en) * | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Field facet mirror for use in illumination optics of a projection exposure apparatus for EUV microlithography |
DE102008049586A1 (en) * | 2008-09-30 | 2010-04-08 | Carl Zeiss Smt Ag | Field facet mirror for use in illumination optics of a projection exposure apparatus for EUV microlithography |
DE102009054888A1 (en) * | 2009-12-17 | 2011-06-22 | Carl Zeiss SMT GmbH, 73447 | Optical element with a plurality of reflective facet elements |
WO2012000528A1 (en) * | 2010-07-01 | 2012-01-05 | Carl Zeiss Smt Gmbh | Optical system and multi facet mirror |
JP5960806B2 (en) * | 2011-06-21 | 2016-08-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Facet mirror device |
DE102012209412A1 (en) | 2012-06-04 | 2013-12-05 | Carl Zeiss Smt Gmbh | Optical method for measuring angular position of facet of facet mirror for extreme UV (EUV) lithography, involves detecting actual angular positions of facets in preset spectrum of angular positions with respect to reference axis |
JP6357505B2 (en) * | 2016-06-23 | 2018-07-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Facet mirror device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2363765A1 (en) * | 1973-12-21 | 1975-06-26 | Agfa Gevaert Ag | Pivotable mirror bearing arrangement for optical systems - facilitates mirror adjustment for any two dimensional coordinate system |
RO101091B1 (en) * | 1989-04-17 | 1992-12-10 | Alignement device for laser resonator mirrors | |
DE29617111U1 (en) * | 1996-10-01 | 1996-12-05 | O'Hara-Smith, Stephen C., Celbridge, Co. Kildare | Adjustable reflector |
US6154302A (en) * | 1997-11-15 | 2000-11-28 | Canon Kabushiki Kaisha | Light deflection device and array thereof |
JP2000167683A (en) * | 1998-12-03 | 2000-06-20 | Mitsubishi Electric Corp | Device for adjusting optical path by reflection mirror |
-
2002
- 2002-10-22 JP JP2003542376A patent/JP2005508520A/en active Pending
- 2002-10-22 EP EP02785265A patent/EP1442330A1/en not_active Withdrawn
- 2002-10-22 WO PCT/EP2002/011773 patent/WO2003040796A1/en not_active Application Discontinuation
Non-Patent Citations (1)
Title |
---|
See references of WO03040796A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2003040796A1 (en) | 2003-05-15 |
JP2005508520A (en) | 2005-03-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20040525 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
17Q | First examination report despatched |
Effective date: 20040715 |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20070320 |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: CARL ZEISS SMT AG |