CN100585444C - Laser oscillator - Google Patents

Abstract

To obtain a laser oscillator which can carry out attachment of a mirror such that the deformation amount of the mirror is settled in an allowable range, without requiring high processing accuracy of a contact surface with the mirror in a mirror holding part. The laser oscillator comprises: a circular mirror 1 for reflecting laser beam; a holder 2 for holding the mirror; and a coil spring 16 which is elastic member for fixing it by pressing the mirror 1 to the holder 2 from the reflecting surface side. The coil spring 16 forces the mirror 1 to be fixed by pressing force F which is derived from a formula on the basis of the mass of the mirror 1, thickness, radius, modulus of longitudinal elasticity as well as friction coefficient between the mirror 1 and the holder 2, wavelength and gravitational acceleration of laser beam.

Description

Laser oscillator

Technical field

The present invention relates to the installation constitution of catoptron in the laser oscillator, reflector laser.

Background technology

In the laser oscillator before,, have the catoptron of reflector laser in the inside of laser oscillator.The reflecting surface of this catoptron is controlled in the scope of allowing for the wave aberration with laser, requires to have the high flatness below 1/20 or 1/20 that is equivalent to optical maser wavelength.In addition, because catoptron absorbs the part of laser, so, in order to dispel the heat, must cool off catoptron.For the laser oscillator of processing usefulness, the laser of laser oscillator inside is high output, the light intensity height.Therefore, the catoptron that keeps catoptron is kept seat, demanding cooling performance.

For this reason, reflecting surface one side that makes catoptron is when ground connection is installed catoptron mutually with ventilation piece (catoptron maintaining part), and to the surface of contact of the ventilation piece that contact with catoptron, the plane that implement superhigh precision processes.Like this, the pushing force that can prevent to install catoptron causes the profiling distortion of catoptron, and the reflecting surface of catoptron can keep high flatness.Catoptron keeps seat to be cooled by catoptron.Because catoptron and catoptron keep the contact area of seat little, push catoptron with bolt powerfully, so the heat transmitting of the surface of contact of catoptron and catoptron maintenance seat is good, cooling performance height (for example seeing patent documentation 1).Another prior art is, reflecting surface one side and the pressing plate of catoptron are joined, and with the elastomeric element of leaf spring etc., from the reflecting surface opposition side pushing catoptron of catoptron, catoptron (for example seeing patent documentation 2) is installed.

Patent documentation 1: Japanese kokai publication hei 8-257782 communique (the 2nd～3 page, Fig. 1)

Patent documentation 2: Japanese kokai publication hei 9-61684 communique (the 3rd page, Fig. 1).

In the laser oscillator before, owing to push catoptron with bolt powerfully, so, must guarantee that the reflecting surface of catoptron has high flatness.For this reason, must implement superhigh precision plane processing (for example flatness is that 0.5 μ m or 0.5 μ m are following) to the catoptron maintaining part, thus, the processing of catoptron maintaining part is difficult.In addition, reflecting surface one side that makes catoptron is when ground connection is installed catoptron mutually with pressing plate, because reflecting surface one side has occupied the optics effective coverage that is used for laser-bounce, so the contact area of catoptron and pressing plate reduces.Like this, the heat transfer performance between catoptron and the pressing plate is poor, and cooling performance reduces.In order to improve heat transfer performance, when adding large plate to the pushing force of catoptron, because pressing plate is implemented high precision plane processing, so, during pushing, produce the profiling distortion on the pushing face of catoptron, the flatness variation of the reflecting surface of catoptron.

Summary of the invention

The present invention makes in order to address the above problem, its objective is provides a kind of laser oscillator, this laser oscillator, even the machining precision of the surface of contact of the catoptron maintaining part that contacts with catoptron is not high, also can under the state that the deflection of the reflecting surface of catoptron is controlled in the permissible range, catoptron be installed.

Laser oscillator of the present invention has: the circular reflector of reflector laser; The catoptron maintaining part that keeps catoptron; From reflecting surface one side catoptron is pushed the elastomeric element that is fixed on the catoptron maintaining part, elastomeric element pushes catoptron with predetermined pushing force F.

According to laser oscillator of the present invention, have the circular reflector of reflector laser; The catoptron maintaining part that keeps catoptron pushes catoptron the elastomeric element that is fixed on the catoptron maintaining part from reflecting surface one side; Elastomeric element pushes catoptron with predetermined pushing force F.So,, also can obtain can installing the laser oscillator of catoptron at state in the permissible range that the deflection of the reflecting surface of catoptron is controlled at even the surface of contact machining precision of the catoptron maintaining part that contacts with catoptron is not high.In addition, can improve the cooling performance of catoptron.

Description of drawings

Fig. 1 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 1.

Fig. 2 is the A-A sectional drawing of catoptron installation portion shown in Figure 1.

Fig. 3 is the synoptic diagram of the distorted reflector amount of the catoptron in the estimation embodiment 1.

Fig. 4 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 2.

Fig. 5 is the B-B sectional drawing of catoptron installation portion shown in Figure 4.

Fig. 6 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 3.

Fig. 7 is the C-C sectional drawing of catoptron installation portion shown in Figure 6.

Fig. 8 is the synoptic diagram of the distorted reflector amount of the catoptron in the estimation embodiment 3.

Fig. 9 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 4.

Figure 10 is the D-D sectional drawing of catoptron installation portion shown in Figure 9.

Embodiment

Embodiment 1

Fig. 1 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 1.Fig. 2 is the A-A sectional drawing of catoptron installation portion shown in Figure 1.Not shown maintenance seat 2 among Fig. 1.Among Fig. 1 and Fig. 2, catoptron 1 is circular, is reflected in the laser of laser oscillator internal oscillator.Reflecting surface by accommodation reflex mirror 1 towards, can regulate the optical axis of laser.Catoptron 1 is inserted in the recess as the maintenance seat 2 of catoptron maintaining part and is keeping.Face in 2 planes of catoptron 1, laser-bounce is reflecting surface (face that contacts with leaf spring 3).The thickness of catoptron 1 is bigger than the concave depth that keeps seat 2, like this, the reflecting surface of catoptron 1 with keep having formed step between 2 the leaf spring installed surface.This step is equivalent to the deflection L of leaf spring 3.

The face of the reflecting surface opposition side of catoptron 1 contacts with keeping seat 2.Catoptron 1 is fixed on by the pushing of the pushing force of leaf spring 3 and keeps on the seat 2.Leaf spring 3 is from reflecting surface one side catoptron 1 pushing to be fixed on the elastomeric element that keeps on the seat 2.Leaf spring 3 is fixed on by screw 4 and keeps on the seat 2.In the present embodiment, the material of catoptron 1 is a silicon.Surface at the reflecting surface of catoptron 1 has applied reflectance coating.Keeping the material of seat 2, is the good aluminium of heat conductivity.

To face that catoptron 1 is installed, promptly keep the catoptron installed surface of seat 2, do not implement superhigh precision processing, only having implemented flatness is the general machining of 3～5 μ m.In keeping seat 2,, be provided with the cooling tube 5 that flows through chilled water for catoptron 1 cooling.Catoptron 1 is cooled by keeping seat 2 faces from the reflecting surface opposition side.Because the face of the reflecting surface opposition side of catoptron 1 connects airtight with keeping seat 2 all sidedly, so, cooling performance can be improved.

Usually, for the wave aberration with laser is controlled in the permissible range, the flatness of the reflecting surface of catoptron must be in below 1/20 or 1/20 of laser wavelength lambda.When laser oscillator is carbonic acid gas laser, because Wavelength of Laser λ is 10.6 μ m, so the flatness of the reflecting surface of catoptron must be at 0.53 μ m or below the 0.53 μ m.With the pushing force of catoptron when keeping seat to install when strong, the reflecting surface of catoptron, the surface configuration of imitating the catoptron installed surface that keeps seat, the flatness of the reflecting surface of catoptron, it is identical with the flatness of a catoptron installed surface that keeps that distortion becomes.At this moment, because the catoptron distortion, so the light shaft offset of laser can not transmit laser beam exactly.

Below, distorted reflector amount catoptron 1 is described, is bending deformation quantity, be controlled at the mounting condition of the catoptron 1 in the permissible range.Fig. 3 is the synoptic diagram of reflecting surface bending deformation quantity that is used for estimating the catoptron 1 of present embodiment 1.Fig. 3 (a) is the back view of the catoptron 1 seen from the reflecting surface opposition side of catoptron 1.Can think that catoptron 1 is at 3 with maintenance seat 2 and contacts.Catoptron 1 and the contact position that keeps seat 2 change according to the machining state of the catoptron installed surface that keeps seat 2.Shown in Fig. 3 (a), catoptron 1 with keep seat 2 in contact point 6a, 6b, when 3 of 6c contacts, on catoptron 1, acting on the moment of flexure of maximum.But,, do not contact the counter-force effect at contact point 6b place according to the equilibrium condition of moment.Therefore, it doesn't matter with the position of contact point 6b, when the center that contact point 6a and contact point 6c clip catoptron 1 is in opposite directions position, and the flexural deformation maximum of the reflecting surface of catoptron 1.The sectional schematic diagram flexural deformation maximum, catoptron 1 of the reflecting surface of Fig. 3 (b) expression catoptron 1.

The pushing force of 3 pairs of catoptrons 1 of leaf spring, the poorest state such as when having considered between catoptron 1 and leaf spring 3, to clip small foreign matter.At this moment, 1/2 the power of total pushing force F of 3 pairs of catoptrons 1 of leaf spring acts on 2 of pushing force load point 7a, the 7b shown in Fig. 3 (a) the flexural deformation maximum of the reflecting surface of catoptron 1.Catoptron 1 regard as with external 3 edge lengths of catoptron 1 be the rectangular parallelepiped of 2r, 2r, t, according to bending theory of beam, calculate the bending deformation quantity y of the reflecting surface of catoptron 1.The bending deformation quantity y[m of the reflecting surface of catoptron 1], available formula (1) expression.

Formula 1

$y=\frac{F\&times;r^2}{E\&times;{\mathrm{<figure-callout\; id="3"\; label="t"\; filenames="C2006101631490016H1.png"\; state="\{\{state\}\}">t</figure-callout>}}^3}...\left(1\right)$

In the formula, F is total pushing force (N) of 3 pairs of catoptrons 1 of leaf spring.E is the vertical spring rate (Pa) of catoptron 1.T is the thickness (m) of catoptron 1.R is the radius (m) of catoptron 1.In laser oscillator, the reflecting surface bending deformation quantity y that allows of catoptron 1 must satisfy y≤λ/20.Relational expression substitution formula (1) the bending deformation quantity y of this reflecting surface obtains formula (2).

Formula 2

$F\&le;\frac{E\&times;{\mathrm{<figure-callout\; id="3"\; label="t"\; filenames="C2006101631490016H1.png"\; state="\{\{state\}\}">t</figure-callout>}}^3\&times;\mathrm{\&lambda;}}{20\&times;{\mathrm{<figure-callout\; id="2"\; label="r"\; filenames="C2006101631490018H1.png,C2006101631490019H1.png"\; state="\{\{state\}\}">r</figure-callout>}}^2}...\left(2\right)$

In the formula, λ is Wavelength of Laser (m).Satisfy formula and set total pushing force F (N) (2), like this, the flatness of the reflecting surface of catoptron 1 is controlled in the scope of allowing, so, can transmit laser beam exactly.But, for vibration, not departing from respect to the position that keeps seat 2 in order to make catoptron 1 to laser oscillator from the outside, total pushing force F (N) must satisfy formula (3).

Formula 3

$\frac{M\&times;a}{\mathrm{\&mu;}}\&le;F...\left(3\right)$

In the formula, M is mirror quality (Kg).A is acceleration (m/s ²).μ is catoptron 1 and the friction factor that keeps seat 2.Acceleration a represents that laser oscillator bears the resistance to impact of external impact.In the general machine, the above resistance to impact of 10G must be arranged, similarly, a is 98 (m/s in the present embodiment ²) (=10 * 9.8 (m/s ²)).According to formula (2) and formula (3), total pushing force F (N) must satisfy formula (4).

Formula 4

$\frac{M\&times;a}{\mathrm{\&mu;}}\&le;F\&le;\frac{E\&times;{\mathrm{<figure-callout\; id="3"\; label="t"\; filenames="C2006101631490016H1.png"\; state="\{\{state\}\}">t</figure-callout>}}^3\&times;\mathrm{\&lambda;}}{20\&times;{\mathrm{<figure-callout\; id="2"\; label="r"\; filenames="C2006101631490018H1.png,C2006101631490019H1.png"\; state="\{\{state\}\}">r</figure-callout>}}^2}...\left(4\right)$

When catoptron 1 is installed, make the face of the reflecting surface opposition side of catoptron 1, join with the catoptron installed surface that keeps seat 2.Then, the elastomeric element that is disposing with the mode that applies impartial pushing force is a leaf spring 3, and from reflecting surface one side of catoptron 1, catoptron 1 is installed in pushing.Satisfy formula (4), with total pushing force F of the pushing force of leaf spring 3, pushing catoptron 1.Satisfy formula and with total pushing force F of leaf spring 3 catoptron 1 is pressed to (4) and keeps on the seat 2, like this, the bending deformation quantity of the reflecting surface of catoptron 1 can be controlled in the permissible range.Therefore, because the wave aberration of laser is controlled in the permissible range,, can transmit laser beam exactly so the skew of optical axis is little.

Method with total pushing force F pushing catoptron 1 is as follows.When the fixing spring constant k was known leaf spring 3, the deflection L that makes leaf spring 3 was predetermined value ground, set catoptron 1 and keep the size of seat 2.The counter-force Fs (N) of the leaf spring 3 suitable with total pushing force F can obtain from formula (5), so, make this counter-force Fs satisfy formula (4), setting spring constant k (N/m) and deflection L (m).

Formula 5

Fs＝k×L ...(5)

As mentioned above, by regulating total pushing force F of leaf spring 3, even the machining precision of the catoptron installed surface of maintenance seat 2 is not high, also can obtain under the state that the deflection of the reflecting surface of catoptron 1 is controlled at permissible range, to install the laser oscillator of catoptron 1.In addition, because the face of the reflecting surface opposition side of catoptron 1 is installed contiguously with the catoptron installed surface that keeps seat 2, so catoptron 1 increases the cooling performance height of catoptron 1 with the contact area that keeps seat 2.

Embodiment 2

Fig. 4 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 2.Fig. 5 is the B-B sectional drawing of catoptron installation portion shown in Figure 4.Not shown maintenance seat 2 among Fig. 4.Be that the catoptron installation portion presses against catoptron 1 on the maintenance seat 2 with volute spring 12 by catoptron pressing plate 11 among Fig. 4 and Fig. 5 with embodiment 1 difference.Among Fig. 4 and Fig. 5, with mark identical among Fig. 1 and Fig. 2, represent identical or suitable parts, this point all is common in instructions full text, and in addition, the form of the inscape described in the instructions only exemplifies, and the present invention is not limited to these records.

Catoptron 1 by catoptron pressing plate 11, is installed on the maintenance seat 2 by the pushing force of volute spring 12.That is, volute spring 12 is by catoptron pressing plate 11 pushing catoptrons 1.Volute spring 12 is reflecting surface one sides from catoptron 1, and catoptron 1 pushing is fixed to the elastomeric element that keeps on the seat 2.Catoptron pressing plate 11 is fixed on constituting towards the side-prominent part of external diameter of 3 positions keeping on the seat 2 by the annular section of pushing catoptron 1 with by volute spring 12 and screw 13.The position of catoptron pressing plate 11 with respect to the parallel direction of the reflecting surface of catoptron 1, has big position deviation ground fixing by screw 13.Volute spring 12 is pushed and is fixed on the catoptron pressing plate 11 by screw 13.Screw 13 is stepped appearance screws, keeps seat 2 tighten the screws relatively, the elastic deformation amount of volute spring 12 can be adjusted to required value.In keeping seat 2, in order to cool off catoptron 1, be provided with the cooling tube 5 that flows through chilled water.

With embodiment 1 similarly, make the deflection of the reflecting surface of catoptron 1 be controlled at ground in the permissible range, set total pushing force F of volute spring 12.Fixing of catoptron 1 as carry out followingly.Adopting spring constant k is known volute spring 12, and the length S of each volute spring 12 when making by catoptron pressing plate 11 stationary mirrors 1 is predetermined value ground, catoptron pressing plate 11 and screw 13 are set.In the present embodiment, because volute spring 12 is arranged on 3 positions, so, make the point of resultant force of each volute spring 12 be arranged in catoptron 1 heart, obtain the counter-force Fsi (N) (i=1,2,3) of volute spring 12 respectively.And, make total pushing force F (=∑ Fsi (i=1,2,3)) satisfy formula (4), set the spring constant k (N/m) and the decrement Li (m) (i=1,2,3) of volute spring 12.The decrement Li of each volute spring 12 is the values that deduct the length S of catoptron 1 stationary state from the normal condition length S0 of each volute spring 12.In addition, the relation of the counter-force Fsi of volute spring 12 and spring constant k and decrement Li replaces with Fs Fsi, L is replaced with Li in formula (5), just can obtain.In addition, among Fig. 4,3 volute springs 12, be to be configured in the position that concentric circles 3 five equilibriums that are the center of circle are cut apart with the reflecting surface center of catoptron 1, but the point of resultant force that needs only each volute spring 12 is at the center of catoptron 1, and volute spring 12 also can be configured in the optional position.

Volute spring 12 is to utilize to reverse counter-force.Because the elastic part of volute spring 12 is long, so can obtain little spring constant, when volute spring 12 has been out of shape, evenly distribute at the volute spring 12 inner stress that produce, so volute spring 12 is not damaged, can obtain enough pushing forces.In addition, because the size of parts such as the catoptron 1 of catoptron installation portion, maintenance seat 2, catoptron pressing plate 11 exists foozle, so the elastic deformation amount of the volute spring 12 that is installed with also produces deviation.Like this, the pushing force to catoptron 1 also has deviation.But other elastomeric element such as volute spring 12 and leaf spring is compared, because its spring constant is little, so, adopt volute spring 12 can reduce deviation, selectable range that can spread reflection mirror pushing force to the pushing force of catoptron 1.

In addition, because by catoptron pressing plate 11 pushing catoptrons 1, so, the volute spring 12 configurable outsides at catoptron 1.Therefore, when reflector laser, the reflecting surface of catoptron 1 can be effectively utilized, the diameter of large reflective mirror 1 needn't be added for stationary mirror 1.

As mentioned above, total pushing force F by catoptron pressing plate 11 adjustable screw springs 12, even the machining precision of the catoptron installed surface of maintenance seat 2 is not high, also can obtain under the state that the deflection of the reflecting surface of catoptron 1 is controlled at permissible range, to install the laser oscillator of catoptron 1.In addition, the face of the reflecting surface opposition side of catoptron 1 and the catoptron installed surface that keeps seat 2 are installed contiguously, like this, catoptron 1 increases with the contact area that keeps seat 2, and the cooling performance of catoptron 1 improves.

Embodiment 3

Fig. 6 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 3.Fig. 7 is the C-C sectional drawing of catoptron installation portion shown in Figure 6.Not shown maintenance seat 14 among Fig. 6.Be to keep being provided with protuberance on seat 14 and the catoptron pressing plate 15 among Fig. 6 and Fig. 7 with embodiment 2 differences.

Catoptron 1 is installed in by the pushing force of volute spring 16 by catoptron pressing plate 15 and keeps on the seat 14, is provided with the projection 15a that protrudes towards catoptron 1 one sides at catoptron pressing plate 15.Volute spring 16 is from the reflecting surface side catoptron 1 pushing to be fixed on the elastomeric element that keeps on the seat 14.Catoptron pressing plate 15 is fixed on constituting towards the side-prominent part of external diameter of 3 positions keeping on the seat 14 by the annular section of pushing catoptron 1 with by volute spring 16 and screw 17.The position of catoptron pressing plate 15 has big position deviation ground fixing by screw 17 with respect to the parallel direction of the reflecting surface of catoptron 1.In addition, catoptron pressing plate 15 and roughly has 3 projection 15a to the concentric circles that with the reflecting surface center of catoptron 1 is the center of circle by catoptron 1 one sides in the position cut apart of 3 five equilibriums accordingly.Projection 15a and volute spring 16 that the position is set is corresponding, be located at the central side of the reflecting surface of catoptron 1.

Volute spring 16 is pushed and is fixed on the catoptron pressing plate 15 by screw 17.Screw 17 is stepped appearance screws, to keeping seat 14 tighten the screws, the elastic deformation amount of volute spring 16 can be adjusted to required value.Keeping on the seat 14, on the face that joins with catoptron 1, being provided with platform ladder portion is embossed portion 14a.This embossed portion 14a is located at 3 positions corresponding with the projection 15a of catoptron pressing plate 15.This embossed portion 14a is the concentric circles position of 3 five equilibriums roughly that is the center of circle, the wedge shape stage portion of expansion angle of release degree less than 60 degree of setting with the reflecting surface center of catoptron 1.In addition, in keeping seat 14, in order to cool off catoptron 1, be provided with the cooling tube 5 that flows through chilled water.

Below, distorted reflector amount catoptron 1 is described, is bending deformation quantity, be controlled at the mounting condition of the catoptron 1 in the permissible range.Fig. 8 is the synoptic diagram of reflecting surface bending deformation quantity that is used for estimating the catoptron 1 of present embodiment 3.Fig. 8 (a) is the back view of the catoptron 1 seen from the reflecting surface opposition side of catoptron 1.Among Fig. 8 (a), the pushing force of volute spring 16 acts on reflecting surface side corresponding with each projection 15a, catoptron 1 at interval on pushing force load point 20a, 20b, the 20c of 120 degree at 3.Acting on the pushing force on pushing force load point 20a, 20b, the 20c, is respectively 1/3 of the total pushing force F of spring.Can regard catoptron 1 as 3 contacts with keeping contacting of seat 14.Catoptron 1 and the contact position that keeps seat 14, machining state according to the catoptron installed surface that keeps seat 14 changes, shown in Fig. 8 (a), at contact point 19a, 19b, 3 such points of 19c, when catoptron 1 contacts with maintenance seat 14, on catoptron 1, acting on maximum bending moment.In addition, according to the equilibrium condition of moment, do not contact the counter-force effect at contact point 19b place.Therefore, it doesn't matter with the position of contact point 19b, when the center that contact point 19a and contact point 19c clip catoptron 1 is in opposite directions position, and the flexural deformation maximum of the reflecting surface of catoptron 1.

The sectional schematic diagram flexural deformation maximum, catoptron 1 of the reflecting surface of Fig. 8 (b) expression catoptron 1.Among Fig. 8 (b), the application point x of power is x=-r * cos (120 °)=r/2.At pushing force load point 20a and such two places of pushing force load point 20c, the power of F/3 in the pushing force effect, thus to make a concerted effort be F/3 * 2=2 * F/3.Catoptron 1 is regarded as 3 edge lengths are the semi-girder of the uniform section of 2r, 2r, t, when calculating the bending deformation quantity y (m) of reflecting surface of catoptron 1 according to bending theory of beam, the bending deformation quantity y (m) of the reflecting surface of catoptron 1, available formula (6) expression.

Formula 6

$y=\frac{5\&times;F\&times;{\mathrm{<figure-callout\; id="2"\; label="r"\; filenames="C2006101631490018H1.png,C2006101631490019H1.png"\; state="\{\{state\}\}">r</figure-callout>}}^2}{12\&times;E\&times;{\mathrm{<figure-callout\; id="3"\; label="t"\; filenames="C2006101631490016H1.png"\; state="\{\{state\}\}">t</figure-callout>}}^3}...\left(6\right)$

In the formula, F is total pushing force (N) of 16 pairs of catoptrons 1 of volute spring.E is the vertical spring rate (Pa) of catoptron 1.T is the thickness (m) of catoptron 1.R is the radius (m) of catoptron 1.In laser oscillator, in order to transmit laser beam exactly, the bending deformation quantity y that allows of catoptron 1 must satisfy y≤λ/20.For this reason, formula (6) and formula (1) relatively, can be from the formula (7) of the permissible range of the total pushing force F (N) formula (4) the induced representation present embodiment.

Formula 7

$\frac{M\&times;a}{\mathrm{\&mu;}}\&le;F\&le;\frac{6\&times;E\&times;{\mathrm{<figure-callout\; id="3"\; label="t"\; filenames="C2006101631490016H1.png"\; state="\{\{state\}\}">t</figure-callout>}}^3\&times;\mathrm{\&lambda;}}{50\&times;{\mathrm{<figure-callout\; id="2"\; label="r"\; filenames="C2006101631490018H1.png,C2006101631490019H1.png"\; state="\{\{state\}\}">r</figure-callout>}}^2}...\left(7\right)$

In the formula, λ is Wavelength of Laser (m).M is mirror quality (Kg).A is acceleration (m/s ²).μ is catoptron 1 and the friction factor that keeps seat 14.

Because on catoptron pressing plate 15, be provided with pushing force with volute spring 16 and affact projection 15a on the catoptron 1, so, can be elastomeric element the upper limit of total pushing force F of volute spring 16, increase to the value shown in the formula (7) from the value shown in the formula (4).In addition,, projection 15a is set on catoptron pressing plate 15 then, can reduces the bending deformation quantity y of the reflecting surface of catoptron 1 if total pushing force F of volute spring 16 is constant.

In addition, keeping on the seat 14 embossed portion 14a being set, can obtain following effect.When not having the angulation of embossed portion 14a and contact point 19a and contact point 19c just to be 180 °, according to the equilibrium condition of moment, the contact counter-force of contact point 19b is 0.Therefore, when the vibration because of the outside acted on inertial force on catoptron 1, contact point 19b come-up was so catoptron 1 may tilt.And in the present embodiment, because with the concentric circles position cut apart of 3 five equilibriums roughly, be provided with and have the wedge shape embossed portion 14a that expands angle of release degree less than 60 degree, so, the catoptron installed surface of catoptron 1 and maintenance seat 14, at each embossed portion 14a is some contact, 180 ° of contact point 19a and contact point 19b angulation maximal value less thaies.Therefore, according to moment equilibrium condition, the contact counter-force of contact point 19b is greater than 0, and catoptron 1 can be because of external vibration tilt, and being provided with of catoptron 1 is in stable condition.

Fixing of catoptron 1 as carry out followingly.Adopting spring constant k is known volute spring 16, and the length S of the volute spring 16 when making by catoptron pressing plate 15 stationary mirrors 1 is predetermined value ground, catoptron pressing plate 15 and screw 17 are set.In the present embodiment, because volute spring 16 is arranged on 3 positions, so, obtain the counter-force Fs (N) of 1/3 the volute spring 16 that is equivalent to total pushing force F of each volute spring 16 respectively.And, make total pushing force F (=Fs * 3) satisfy formula (7), set the spring constant k (N/m) of volute spring 16 and the decrement Li (m) (i=1,2,3) of volute spring 16.The decrement Li of each volute spring 16 is the values that deduct the length S of catoptron 1 stationary state from the normal condition length S0 of each volute spring 16.

As mentioned above, by having the catoptron pressing plate 15 of projection 15a, total pushing force F of adjustable screw spring 16, even the machining precision of the catoptron installed surface of maintenance seat 14 is not high, also can obtain under the state that the deflection of the reflecting surface of catoptron 1 is controlled at permissible range, to install the laser oscillator of catoptron 1.In addition, the face of the reflecting surface opposition side of catoptron 1 and the catoptron installed surface that keeps seat 14 are installed contiguously, like this, catoptron 1 increases with the contact area that keeps seat 14, and the cooling performance of catoptron 1 improves.

Embodiment 4

Fig. 9 is the structural map of catoptron installation portion of the laser oscillator of embodiment of the present invention 4.Figure 10 is the D-D sectional drawing of catoptron installation portion shown in Figure 9.Not shown maintenance seat 2 among Fig. 9.Among Fig. 9 and Figure 10 be, with volute spring 23 pushing stationary mirrors 1 with embodiment 3 differences.

Catoptron 1 is installed in by the pushing force of volute spring 23 and keeps on the seat 2.Volute spring 23 is a volute spring pressing plate 24 by the elastomeric element maintaining part that keeps volute spring 23, the reflecting surface of pushing catoptron 1.Volute spring pressing plate 24 is shapes that volute spring is wrapped into, and the position of volute spring 23 can not be offset like this.Volute spring pressing plate 24 usefulness screws 25 are fixed on and keep on the seat 2.The volute spring 23 at volute spring pressing plate 24 and 3 positions is being provided with respectively accordingly.Volute spring 23 is from reflecting surface one side catoptron 1 pushing to be fixed on the elastomeric element that keeps on the seat 2.In addition, volute spring 23 is located between volute spring pressing plate 24 and the catoptron 1.In keeping seat 2, in order to cool off catoptron 1, be provided with the cooling tube 5 that flows through chilled water.

In the present embodiment,, disposed 3 volute springs 23, like this, can similarly push catoptron 1 with embodiment 3 the concentric circles position cut apart of 3 five equilibriums roughly that with the reflecting surface center of catoptron 1 is the center of circle.Therefore, for the bending deformation quantity y of the reflecting surface that makes catoptron 1 is controlled in the permissible range, total pushing force F of volute spring 23 should satisfy formula (7).

Because the size of parts such as the catoptron 1 of catoptron installation portion, maintenance seat 2, volute spring pressing plate 24 exists foozle, so the elastic deformation amount of volute spring 23 also produces deviation, the deflection of the reflecting surface of catoptron 1 also produces deviation.When employing utilizes the leaf spring of crooked counter-force, because stress concentrates on the root of leaf spring, so, can not reduce spring constant.And in the present embodiment, because the elastic part of volute spring 23 is long, so can obtain little spring constant.When even volute spring 23 has been out of shape, also be even distribution at the volute spring 23 inner stress that produce, so volute spring 23 is not damaged, can obtain enough pushing forces.Therefore, when adopting volute spring 23, even keep seat 2 during fabrication size error is arranged, also can remain necessarily the pushing force of catoptron 1, the flatness of the reflecting surface of catoptron 1 can be remained in the permissible range.In addition, also can adopt maintenance seat such shown in the embodiment 3 with embossed portion.

Fixing of catoptron 1 as carry out followingly.Adopting spring constant k is known volute spring 23, and the length S of the volute spring 23 when making stationary mirror 1 is predetermined value ground, screw 25 is set.In the present embodiment, because volute spring 23 is arranged on 3 positions, so, obtain the counter-force Fs (N) of 1/3 the volute spring 23 that is equivalent to total pushing force F of volute spring 23 respectively.And, make total pushing force F (=Fs * 3) satisfy formula (7), set the spring constant k (N/m) of volute spring 23 and the decrement Li (m) (i=1,2,3) of volute spring 23.The decrement Li of each volute spring 23 is the values that deduct the length S of catoptron 1 stationary state from the normal condition length S0 of each volute spring 23.

As mentioned above, with volute spring 23 pushing stationary mirrors 1, total pushing force F by adjustable screw spring 23, even the machining precision of the catoptron installed surface of maintenance seat 2 is not high, also can obtain under the state that the deflection of the reflecting surface of catoptron 1 is controlled at permissible range, to install the laser oscillator of catoptron 1.In addition, the face of the reflecting surface opposition side of catoptron 1 and the catoptron installed surface that keeps seat 2 are installed contiguously, like this, catoptron 1 increases with the contact area that keeps seat 2, and the cooling performance of catoptron 1 improves.

In addition, in the respective embodiments described above, can replace volute spring, leaf spring with other the elastomeric element of spring, rubber etc.

Claims (8)

1. laser oscillator is characterized in that, has:

The circular reflector of reflector laser;

The catoptron maintaining part that keeps above-mentioned catoptron; And

Above-mentioned catoptron is pushed the elastomeric element that is fixed on the above-mentioned catoptron maintaining part from reflecting surface one side; Above-mentioned elastomeric element with satisfying the pushing force F of formula (1), pushes above-mentioned catoptron,

Formula (1)

$\frac{M\&times;a}{\mathrm{\&mu;}}\&le;F\&le;\frac{E\&times;t^3\&times;\mathrm{\&lambda;}}{20\&times;r^2}$

In the formula, F: pushing force, its unit is N

M: the quality of catoptron, its unit is Kg

A: the acceleration of laser oscillator, its unit are m/s ²

μ: the friction factor of catoptron and catoptron maintaining part

E: the vertical spring rate of catoptron, its unit are Pa

T: the thickness of catoptron, its unit are m

R: the radius of catoptron, its unit are m

λ: Wavelength of Laser, its unit is m.

2. laser oscillator as claimed in claim 1 is characterized in that, elastomeric element is by catoptron pressing plate pushing catoptron.

3. laser oscillator as claimed in claim 2 is characterized in that, the catoptron pressing plate is an annular.

4. laser oscillator as claimed in claim 2 is characterized in that, the catoptron pressing plate with the concentric circles that with the reflecting surface center of catoptron is the center of circle is roughly had 3 projections by above-mentioned catoptron one side in the position cut apart of 3 five equilibriums accordingly.

5. laser oscillator as claimed in claim 4 is characterized in that, the catoptron maintaining part has stage portion in the position corresponding with the projection of catoptron pressing plate.

6. laser oscillator as claimed in claim 1 is characterized in that, elastomeric element is located between the elastomeric element maintaining part and catoptron that keeps above-mentioned elastomeric element.

7. as each described laser oscillator in the claim 1 to 6, it is characterized in that elastomeric element adopts volute spring.

8. laser oscillator as claimed in claim 1 is characterized in that, elastomeric element adopts leaf spring.

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