JP4366163B2 - 照明装置及び露光装置 - Google Patents

照明装置及び露光装置 Download PDF

Info

Publication number
JP4366163B2
JP4366163B2 JP2003333627A JP2003333627A JP4366163B2 JP 4366163 B2 JP4366163 B2 JP 4366163B2 JP 2003333627 A JP2003333627 A JP 2003333627A JP 2003333627 A JP2003333627 A JP 2003333627A JP 4366163 B2 JP4366163 B2 JP 4366163B2
Authority
JP
Japan
Prior art keywords
light
cylindrical lens
optical
lens group
illumination
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003333627A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005101314A (ja
JP2005101314A5 (enExample
Inventor
友晴 長谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2003333627A priority Critical patent/JP4366163B2/ja
Priority to US10/948,700 priority patent/US7236239B2/en
Publication of JP2005101314A publication Critical patent/JP2005101314A/ja
Publication of JP2005101314A5 publication Critical patent/JP2005101314A5/ja
Application granted granted Critical
Publication of JP4366163B2 publication Critical patent/JP4366163B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
JP2003333627A 2003-09-25 2003-09-25 照明装置及び露光装置 Expired - Fee Related JP4366163B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003333627A JP4366163B2 (ja) 2003-09-25 2003-09-25 照明装置及び露光装置
US10/948,700 US7236239B2 (en) 2003-09-25 2004-09-23 Illumination system and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003333627A JP4366163B2 (ja) 2003-09-25 2003-09-25 照明装置及び露光装置

Publications (3)

Publication Number Publication Date
JP2005101314A JP2005101314A (ja) 2005-04-14
JP2005101314A5 JP2005101314A5 (enExample) 2006-10-26
JP4366163B2 true JP4366163B2 (ja) 2009-11-18

Family

ID=34461583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003333627A Expired - Fee Related JP4366163B2 (ja) 2003-09-25 2003-09-25 照明装置及び露光装置

Country Status (2)

Country Link
US (1) US7236239B2 (enExample)
JP (1) JP4366163B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7773070B2 (en) 2004-05-21 2010-08-10 Cypress Semiconductor Corporation Optical positioning device using telecentric imaging
EP1837895B1 (en) * 2004-12-27 2016-02-24 Nikon Corporation Optical integrator, illumination optical apparatus, exposure apparatus, exposure method, and device manufacturing method
US7765251B2 (en) * 2005-12-16 2010-07-27 Cypress Semiconductor Corporation Signal averaging circuit and method for sample averaging
US8587764B2 (en) * 2007-03-13 2013-11-19 Nikon Corporation Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
DE102008007449A1 (de) * 2008-02-01 2009-08-13 Carl Zeiss Smt Ag Beleuchtungsoptik zur Beleuchtung eines Objektfeldes einer Projektionsbelichtungsanlage für die Mikrolithographie
KR100993539B1 (ko) * 2008-09-19 2010-11-10 오에프티 주식회사 노광기용 광원장치
US8541727B1 (en) 2008-09-30 2013-09-24 Cypress Semiconductor Corporation Signal monitoring and control system for an optical navigation sensor
US8711096B1 (en) 2009-03-27 2014-04-29 Cypress Semiconductor Corporation Dual protocol input device
WO2010123484A1 (en) 2009-04-20 2010-10-28 Hewlett-Packard Development Company, L.P. Collection optics for a color sensor
JP2011216863A (ja) * 2010-03-17 2011-10-27 Hitachi Via Mechanics Ltd ビームサイズ可変照明光学装置及びビームサイズ変更方法
US8937770B2 (en) * 2012-07-24 2015-01-20 Coherent Gmbh Excimer laser apparatus projecting a beam with a selectively variable short-axis beam profile
JP6980443B2 (ja) * 2017-07-28 2021-12-15 キヤノン株式会社 露光装置及び物品製造方法

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60232552A (ja) * 1984-05-02 1985-11-19 Canon Inc 照明光学系
US4733944A (en) * 1986-01-24 1988-03-29 Xmr, Inc. Optical beam integration system
JPS6461716A (en) * 1987-08-31 1989-03-08 Canon Kk Illuminator
JP3428055B2 (ja) * 1992-11-05 2003-07-22 株式会社ニコン 照明光学装置、露光装置、半導体製造方法および露光方法
JP3254680B2 (ja) * 1993-03-16 2002-02-12 セイコーエプソン株式会社 投写型表示装置
JPH08179237A (ja) * 1994-12-26 1996-07-12 Nikon Corp 照明光学装置
JPH08293461A (ja) 1995-04-21 1996-11-05 Nikon Corp 照明装置および該装置を備えた投影露光装置
KR960042227A (ko) 1995-05-19 1996-12-21 오노 시게오 투영노광장치
JP3743576B2 (ja) * 1995-07-11 2006-02-08 株式会社ニコン 投影露光装置、及びそれを用いた半導体素子又は液晶表示素子の製造方法
DE29510514U1 (de) * 1995-06-29 1995-10-26 Alpirsbacher Maschinenbau GmbH & Co.KG, 72275 Alpirsbach Sammelbehälter mit Transportpumpe
US5786939A (en) * 1996-02-26 1998-07-28 Fuji Photo Optical Co., Ltd. Illumination optical system
JP3563888B2 (ja) * 1996-09-12 2004-09-08 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JPH1092729A (ja) * 1996-09-12 1998-04-10 Canon Inc 照明装置及びそれを用いた走査型投影露光装置
JPH10275771A (ja) * 1997-02-03 1998-10-13 Nikon Corp 照明光学装置
JP3005203B2 (ja) * 1997-03-24 2000-01-31 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
JP3262039B2 (ja) 1997-07-18 2002-03-04 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US6333777B1 (en) 1997-07-18 2001-12-25 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method
JP3264224B2 (ja) * 1997-08-04 2002-03-11 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP4238390B2 (ja) * 1998-02-27 2009-03-18 株式会社ニコン 照明装置、該照明装置を備えた露光装置および該露光装置を用いて半導体デバイスを製造する方法
US6563567B1 (en) * 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
DE60035710T2 (de) * 2000-02-16 2007-12-06 Asml Holding, N.V. Zoom-beleuchtungssystem zur verwendung in der photolithographie
JP3599629B2 (ja) * 2000-03-06 2004-12-08 キヤノン株式会社 照明光学系及び前記照明光学系を用いた露光装置
JP3599648B2 (ja) 2000-08-03 2004-12-08 キヤノン株式会社 照明装置、投影露光装置並びにそれを用いたデバイス製造方法
JP3634782B2 (ja) * 2001-09-14 2005-03-30 キヤノン株式会社 照明装置、それを用いた露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2005101314A (ja) 2005-04-14
US20050117137A1 (en) 2005-06-02
US7236239B2 (en) 2007-06-26

Similar Documents

Publication Publication Date Title
JP3057998B2 (ja) 照明装置及びそれを用いた投影露光装置
JP2006019702A (ja) 照明光学系及び露光装置
JP4392879B2 (ja) 投影露光装置及びデバイスの製造方法
US7154581B2 (en) Scanning exposure apparatus, manufacturing method thereof, and device manufacturing method
JP4366163B2 (ja) 照明装置及び露光装置
JP2001358057A (ja) 照明装置及びそれを用いた走査型露光装置
US8085384B2 (en) Exposure apparatus
JP2009141154A (ja) 走査露光装置及びデバイス製造方法
JP4659223B2 (ja) 照明装置及びこれに用いる投影露光装置並びにデバイスの製造方法
US6614597B2 (en) Illumination apparatus and projection exposure apparatus
JP2006173305A (ja) 露光装置及び方法、並びに、デバイス製造方法
JP3796294B2 (ja) 照明光学系及び露光装置
JP3392034B2 (ja) 照明装置及びそれを用いた投影露光装置
JP4838430B2 (ja) 露光装置及びデバイス製造方法
JP3571935B2 (ja) 投影露光装置及びそれを用いたデバイスの製造方法
JP4235410B2 (ja) 露光方法
JP2005209769A (ja) 露光装置
JP2007242775A (ja) 露光装置及びデバイス製造方法
JP3673731B2 (ja) 露光装置及び方法
JP4764161B2 (ja) 露光装置、露光方法及びデバイス製造方法
JP2005310942A (ja) 露光装置、露光方法、及びそれを用いたデバイス製造方法
JP3618944B2 (ja) 照明光学系及びそれを用いた露光装置
JP2003318095A (ja) フレア計測方法及びフレア計測装置、露光方法及び露光装置、露光装置の調整方法
JPH1131652A (ja) 残存収差補正板及びそれを用いた投影露光装置
JP3554243B2 (ja) 投影露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060911

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060911

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090313

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090512

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090818

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090824

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120828

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees