JP4317779B2 - 電界放出型電子銃およびそれを用いた電子ビーム応用装置 - Google Patents

電界放出型電子銃およびそれを用いた電子ビーム応用装置 Download PDF

Info

Publication number
JP4317779B2
JP4317779B2 JP2004090806A JP2004090806A JP4317779B2 JP 4317779 B2 JP4317779 B2 JP 4317779B2 JP 2004090806 A JP2004090806 A JP 2004090806A JP 2004090806 A JP2004090806 A JP 2004090806A JP 4317779 B2 JP4317779 B2 JP 4317779B2
Authority
JP
Japan
Prior art keywords
field emission
electron gun
voltage
emission current
extraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004090806A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005276720A5 (enExample
JP2005276720A (ja
Inventor
正 藤枝
貴志夫 日高
光男 林原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2004090806A priority Critical patent/JP4317779B2/ja
Priority to US11/059,511 priority patent/US7151268B2/en
Publication of JP2005276720A publication Critical patent/JP2005276720A/ja
Publication of JP2005276720A5 publication Critical patent/JP2005276720A5/ja
Application granted granted Critical
Publication of JP4317779B2 publication Critical patent/JP4317779B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/065—Source emittance characteristics
    • H01J2237/0653—Intensity
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30455—Correction during exposure
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2004090806A 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置 Expired - Fee Related JP4317779B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004090806A JP4317779B2 (ja) 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置
US11/059,511 US7151268B2 (en) 2004-03-26 2005-02-17 Field emission gun and electron beam instruments

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004090806A JP4317779B2 (ja) 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置

Publications (3)

Publication Number Publication Date
JP2005276720A JP2005276720A (ja) 2005-10-06
JP2005276720A5 JP2005276720A5 (enExample) 2006-03-02
JP4317779B2 true JP4317779B2 (ja) 2009-08-19

Family

ID=34988986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004090806A Expired - Fee Related JP4317779B2 (ja) 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置

Country Status (2)

Country Link
US (1) US7151268B2 (enExample)
JP (1) JP4317779B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006059513A (ja) * 2004-07-22 2006-03-02 Kuresutetsuku:Kk 電子ビーム照射装置および描画装置
JP5102968B2 (ja) 2006-04-14 2012-12-19 株式会社日立ハイテクノロジーズ 導電性針およびその製造方法
JP5002190B2 (ja) * 2006-05-18 2012-08-15 日本電子株式会社 電子ビーム発生装置
DE102006040308A1 (de) * 2006-07-06 2008-01-31 Carl Zeiss Nts Gmbh Verfahren und Vorrichtung zur Erzeugung eines Bildes
JP2008041289A (ja) * 2006-08-02 2008-02-21 Hitachi High-Technologies Corp 電界放出型電子銃およびそれを用いた電子線応用装置
JP2008047309A (ja) * 2006-08-11 2008-02-28 Hitachi High-Technologies Corp 電界放出型電子銃、およびその運転方法
US8507785B2 (en) * 2007-11-06 2013-08-13 Pacific Integrated Energy, Inc. Photo induced enhanced field electron emission collector
JP5455700B2 (ja) * 2010-02-18 2014-03-26 株式会社日立ハイテクノロジーズ 電界放出電子銃及びその制御方法
KR20130129886A (ko) 2010-06-08 2013-11-29 퍼시픽 인테그레이티드 에너지, 인크. 강화된 필드들 및 전자 방출을 갖는 광학 안테나들
US9793089B2 (en) * 2013-09-16 2017-10-17 Kla-Tencor Corporation Electron emitter device with integrated multi-pole electrode structure

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127060A (en) * 1976-04-16 1977-10-25 Hitachi Ltd Feald emission type electron gun
JPH0766772B2 (ja) * 1983-11-30 1995-07-19 株式会社日立製作所 多段加速方式電界放射形電子顕微鏡
US5196707A (en) * 1991-03-04 1993-03-23 Etec Systems, Inc. Low aberration field emission electron gun
JPH06162978A (ja) 1992-11-26 1994-06-10 Hitachi Ltd 電界放出形電子顕微鏡
JPH08167396A (ja) * 1994-12-14 1996-06-25 Jeol Ltd 電界放射型電子銃を備えた電子ビーム装置
DE69605053T2 (de) * 1996-12-24 2000-02-24 Advantest Corp., Saitama Kanonenlinse zur Partikelstrahlerzeugung
JPH11144663A (ja) 1997-11-10 1999-05-28 Hitachi Ltd 電界放出形電子顕微鏡
JP4008123B2 (ja) * 1998-06-04 2007-11-14 株式会社アルバック 炭素系超微細冷陰極及びその作製方法
JP2000251751A (ja) * 1999-02-26 2000-09-14 Seiko Instruments Inc 液体金属イオン源、および、液体金属イオン源のフローインピーダンス測定方法
JP2002208368A (ja) * 2001-01-09 2002-07-26 Jeol Ltd 電子放射型電子銃
JP2002334663A (ja) * 2001-03-09 2002-11-22 Vacuum Products Kk 荷電粒子発生装置及びその発生方法
JP3832402B2 (ja) * 2002-08-12 2006-10-11 株式会社日立製作所 カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置

Also Published As

Publication number Publication date
US20050212440A1 (en) 2005-09-29
US7151268B2 (en) 2006-12-19
JP2005276720A (ja) 2005-10-06

Similar Documents

Publication Publication Date Title
JP3832402B2 (ja) カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置
US7888654B2 (en) Cold field emitter
EP2068343B1 (en) Charged particle source with automated tip formation
JP4317779B2 (ja) 電界放出型電子銃およびそれを用いた電子ビーム応用装置
US7732764B2 (en) Field emission electron gun and electron beam applied device using the same
US7777404B1 (en) Field emission type electron gun comprising single fibrous carbon electron emitter and operating method for the same
JP5559431B2 (ja) 粒子源及びその製造方法
JP4029289B2 (ja) 導電性針の製造方法及びその方法により製造された導電性針
JP2021524650A (ja) 拡散障壁を有する電子エミッタ向けの金属保護層
US20080067407A1 (en) Conductive probe and method for producing the same
JP4210131B2 (ja) 電子源及び電子源の使用方法
JP2009301920A (ja) ナノチップエミッタ作製方法
JP4895938B2 (ja) 電界放出型電子銃およびそれを用いた電子線応用装置
US20080169743A1 (en) Field emission electron gun and method of operating the same
JP3982558B2 (ja) カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置
US7722425B2 (en) Electron source manufacturing method
JP5114168B2 (ja) 電界放出型電子源およびそれを用いた電子線応用装置
JP2010015966A (ja) 電子放出素子，電子銃、それを用いた電子顕微鏡装置及び電子線描画装置
EP1596418B1 (en) Electron gun
JP2005032500A (ja) 冷陰極とそれを用いた電子源及び電子線装置
JP2006049293A (ja) 電界放出型電子銃およびそれを用いた電子ビーム応用装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051205

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051205

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051205

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20060509

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080714

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080722

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080917

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081111

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090113

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090512

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090525

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120529

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130529

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130529

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees