JP2005276720A5 - - Google Patents

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Publication number
JP2005276720A5
JP2005276720A5 JP2004090806A JP2004090806A JP2005276720A5 JP 2005276720 A5 JP2005276720 A5 JP 2005276720A5 JP 2004090806 A JP2004090806 A JP 2004090806A JP 2004090806 A JP2004090806 A JP 2004090806A JP 2005276720 A5 JP2005276720 A5 JP 2005276720A5
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JP
Japan
Prior art keywords
field emission
electron gun
voltage
emission electron
extraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004090806A
Other languages
English (en)
Japanese (ja)
Other versions
JP4317779B2 (ja
JP2005276720A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2004090806A priority Critical patent/JP4317779B2/ja
Priority claimed from JP2004090806A external-priority patent/JP4317779B2/ja
Priority to US11/059,511 priority patent/US7151268B2/en
Publication of JP2005276720A publication Critical patent/JP2005276720A/ja
Publication of JP2005276720A5 publication Critical patent/JP2005276720A5/ja
Application granted granted Critical
Publication of JP4317779B2 publication Critical patent/JP4317779B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004090806A 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置 Expired - Fee Related JP4317779B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004090806A JP4317779B2 (ja) 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置
US11/059,511 US7151268B2 (en) 2004-03-26 2005-02-17 Field emission gun and electron beam instruments

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004090806A JP4317779B2 (ja) 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置

Publications (3)

Publication Number Publication Date
JP2005276720A JP2005276720A (ja) 2005-10-06
JP2005276720A5 true JP2005276720A5 (enExample) 2006-03-02
JP4317779B2 JP4317779B2 (ja) 2009-08-19

Family

ID=34988986

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004090806A Expired - Fee Related JP4317779B2 (ja) 2004-03-26 2004-03-26 電界放出型電子銃およびそれを用いた電子ビーム応用装置

Country Status (2)

Country Link
US (1) US7151268B2 (enExample)
JP (1) JP4317779B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006059513A (ja) * 2004-07-22 2006-03-02 Kuresutetsuku:Kk 電子ビーム照射装置および描画装置
JP5102968B2 (ja) 2006-04-14 2012-12-19 株式会社日立ハイテクノロジーズ 導電性針およびその製造方法
JP5002190B2 (ja) * 2006-05-18 2012-08-15 日本電子株式会社 電子ビーム発生装置
DE102006040308A1 (de) * 2006-07-06 2008-01-31 Carl Zeiss Nts Gmbh Verfahren und Vorrichtung zur Erzeugung eines Bildes
JP2008041289A (ja) * 2006-08-02 2008-02-21 Hitachi High-Technologies Corp 電界放出型電子銃およびそれを用いた電子線応用装置
JP2008047309A (ja) * 2006-08-11 2008-02-28 Hitachi High-Technologies Corp 電界放出型電子銃、およびその運転方法
US8507785B2 (en) * 2007-11-06 2013-08-13 Pacific Integrated Energy, Inc. Photo induced enhanced field electron emission collector
JP5455700B2 (ja) * 2010-02-18 2014-03-26 株式会社日立ハイテクノロジーズ 電界放出電子銃及びその制御方法
KR20130129886A (ko) 2010-06-08 2013-11-29 퍼시픽 인테그레이티드 에너지, 인크. 강화된 필드들 및 전자 방출을 갖는 광학 안테나들
US9793089B2 (en) * 2013-09-16 2017-10-17 Kla-Tencor Corporation Electron emitter device with integrated multi-pole electrode structure

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52127060A (en) * 1976-04-16 1977-10-25 Hitachi Ltd Feald emission type electron gun
JPH0766772B2 (ja) * 1983-11-30 1995-07-19 株式会社日立製作所 多段加速方式電界放射形電子顕微鏡
US5196707A (en) * 1991-03-04 1993-03-23 Etec Systems, Inc. Low aberration field emission electron gun
JPH06162978A (ja) 1992-11-26 1994-06-10 Hitachi Ltd 電界放出形電子顕微鏡
JPH08167396A (ja) * 1994-12-14 1996-06-25 Jeol Ltd 電界放射型電子銃を備えた電子ビーム装置
DE69605053T2 (de) * 1996-12-24 2000-02-24 Advantest Corp., Saitama Kanonenlinse zur Partikelstrahlerzeugung
JPH11144663A (ja) 1997-11-10 1999-05-28 Hitachi Ltd 電界放出形電子顕微鏡
JP4008123B2 (ja) * 1998-06-04 2007-11-14 株式会社アルバック 炭素系超微細冷陰極及びその作製方法
JP2000251751A (ja) * 1999-02-26 2000-09-14 Seiko Instruments Inc 液体金属イオン源、および、液体金属イオン源のフローインピーダンス測定方法
JP2002208368A (ja) * 2001-01-09 2002-07-26 Jeol Ltd 電子放射型電子銃
JP2002334663A (ja) * 2001-03-09 2002-11-22 Vacuum Products Kk 荷電粒子発生装置及びその発生方法
JP3832402B2 (ja) * 2002-08-12 2006-10-11 株式会社日立製作所 カーボンナノチューブを有する電子源とそれを用いた電子顕微鏡および電子線描画装置

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