JP4295490B2 - 処理装置並びに処理装置用のチラー制御方法及びチラー制御装置 - Google Patents

処理装置並びに処理装置用のチラー制御方法及びチラー制御装置 Download PDF

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Publication number
JP4295490B2
JP4295490B2 JP2002332800A JP2002332800A JP4295490B2 JP 4295490 B2 JP4295490 B2 JP 4295490B2 JP 2002332800 A JP2002332800 A JP 2002332800A JP 2002332800 A JP2002332800 A JP 2002332800A JP 4295490 B2 JP4295490 B2 JP 4295490B2
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Japan
Prior art keywords
flow rate
chiller
refrigerant
idle state
time
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2002332800A
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Japanese (ja)
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JP2004169933A (ja
JP2004169933A5 (enExample
Inventor
則和 佐々木
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Priority to JP2002332800A priority Critical patent/JP4295490B2/ja
Priority to US10/712,043 priority patent/US6986261B2/en
Publication of JP2004169933A publication Critical patent/JP2004169933A/ja
Publication of JP2004169933A5 publication Critical patent/JP2004169933A5/ja
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
    • F28D21/00—Heat-exchange apparatus not covered by any of the groups F28D1/00 - F28D20/00
    • F28D2021/0019—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for
    • F28D2021/0077—Other heat exchangers for particular applications; Heat exchange systems not otherwise provided for for tempering, e.g. with cooling or heating circuits for temperature control of elements

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  • Drying Of Semiconductors (AREA)
JP2002332800A 2002-11-15 2002-11-15 処理装置並びに処理装置用のチラー制御方法及びチラー制御装置 Expired - Lifetime JP4295490B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002332800A JP4295490B2 (ja) 2002-11-15 2002-11-15 処理装置並びに処理装置用のチラー制御方法及びチラー制御装置
US10/712,043 US6986261B2 (en) 2002-11-15 2003-11-14 Method and system for controlling chiller and semiconductor processing system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002332800A JP4295490B2 (ja) 2002-11-15 2002-11-15 処理装置並びに処理装置用のチラー制御方法及びチラー制御装置

Publications (3)

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JP2004169933A JP2004169933A (ja) 2004-06-17
JP2004169933A5 JP2004169933A5 (enExample) 2005-09-22
JP4295490B2 true JP4295490B2 (ja) 2009-07-15

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JP2002332800A Expired - Lifetime JP4295490B2 (ja) 2002-11-15 2002-11-15 処理装置並びに処理装置用のチラー制御方法及びチラー制御装置

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JP (1) JP4295490B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4693034B2 (ja) * 2005-01-28 2011-06-01 株式会社Kelk プロセスチャンバ判別装置
JP2006236095A (ja) * 2005-02-25 2006-09-07 Yokogawa Electric Corp 流量制御装置
JP4566052B2 (ja) * 2005-04-07 2010-10-20 Ａｔｓジャパン株式会社 恒温維持装置。
JP5091413B2 (ja) 2006-03-08 2012-12-05 東京エレクトロン株式会社 基板処理装置および基板処理装置の制御方法
JP2008292026A (ja) 2007-05-23 2008-12-04 Ats Japan Corp 恒温維持装置。
US9338871B2 (en) 2010-01-29 2016-05-10 Applied Materials, Inc. Feedforward temperature control for plasma processing apparatus
US8916793B2 (en) 2010-06-08 2014-12-23 Applied Materials, Inc. Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow
US10274270B2 (en) 2011-10-27 2019-04-30 Applied Materials, Inc. Dual zone common catch heat exchanger/chiller
JP6408903B2 (ja) * 2014-12-25 2018-10-17 東京エレクトロン株式会社 エッチング処理方法及びエッチング処理装置
JP7027057B2 (ja) * 2017-07-18 2022-03-01 株式会社アルバック 基板搬送装置
CN118776951B (zh) * 2024-09-06 2024-11-22 常州博瑞电力自动化设备有限公司 一种构网型冷却系统流量延时测试方法
CN119175598B (zh) * 2024-11-26 2025-03-28 四川埃姆克伺服科技有限公司 一种立式电主轴冷却方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2512783B2 (ja) * 1988-04-20 1996-07-03 株式会社日立製作所 プラズマエッチング方法及び装置
JP3050710B2 (ja) * 1992-12-22 2000-06-12 東京エレクトロン株式会社 サセプタ温度制御方法
JPH09172001A (ja) * 1995-12-15 1997-06-30 Sony Corp 半導体製造装置の温度制御方法および装置
JPH11175142A (ja) * 1997-12-10 1999-07-02 Hitachi Ltd 製造装置の運転支援システム
JP2000012412A (ja) * 1998-06-18 2000-01-14 Kokusai Electric Co Ltd 半導体製造装置の性能監視方法および装置
JP4256031B2 (ja) * 1999-07-27 2009-04-22 東京エレクトロン株式会社 処理装置およびその温度制御方法
JP4585702B2 (ja) * 2001-02-14 2010-11-24 キヤノン株式会社 露光装置

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