JP4290553B2 - 画像化装置 - Google Patents

画像化装置 Download PDF

Info

Publication number
JP4290553B2
JP4290553B2 JP2003548035A JP2003548035A JP4290553B2 JP 4290553 B2 JP4290553 B2 JP 4290553B2 JP 2003548035 A JP2003548035 A JP 2003548035A JP 2003548035 A JP2003548035 A JP 2003548035A JP 4290553 B2 JP4290553 B2 JP 4290553B2
Authority
JP
Japan
Prior art keywords
substrate
image
radiation
pattern
patterning means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003548035A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005510860A (ja
JP2005510860A5 (enExample
Inventor
デル マスト、カレル、ディーデリック ファン
ブレーカー、アルノ、ヤン
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by エーエスエムエル ネザーランズ ビー．ブイ． filed Critical エーエスエムエル ネザーランズ ビー．ブイ．
Publication of JP2005510860A publication Critical patent/JP2005510860A/ja
Publication of JP2005510860A5 publication Critical patent/JP2005510860A5/ja
Application granted granted Critical
Publication of JP4290553B2 publication Critical patent/JP4290553B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70516—Calibration of components of the microlithographic apparatus, e.g. light sources, addressable masks or detectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2003548035A 2001-11-27 2002-11-27 画像化装置 Expired - Fee Related JP4290553B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01204567 2001-11-27
PCT/EP2002/013399 WO2003046662A1 (en) 2001-11-27 2002-11-27 Imaging apparatus

Publications (3)

Publication Number Publication Date
JP2005510860A JP2005510860A (ja) 2005-04-21
JP2005510860A5 JP2005510860A5 (enExample) 2006-01-05
JP4290553B2 true JP4290553B2 (ja) 2009-07-08

Family

ID=8181314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003548035A Expired - Fee Related JP4290553B2 (ja) 2001-11-27 2002-11-27 画像化装置

Country Status (7)

Country Link
US (1) US7379579B2 (enExample)
EP (1) EP1449032B1 (enExample)
JP (1) JP4290553B2 (enExample)
KR (1) KR100674245B1 (enExample)
CN (1) CN1294455C (enExample)
DE (1) DE60230663D1 (enExample)
WO (1) WO2003046662A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1324138A3 (en) * 2001-12-28 2007-12-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4929444B2 (ja) * 2004-09-27 2012-05-09 国立大学法人東北大学 パターン描画装置および方法
US7177012B2 (en) * 2004-10-18 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7403865B2 (en) * 2004-12-28 2008-07-22 Asml Netherlands B.V. System and method for fault indication on a substrate in maskless applications
US7233384B2 (en) * 2005-06-13 2007-06-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
WO2007094431A1 (ja) * 2006-02-16 2007-08-23 Nikon Corporation 露光装置、露光方法及びデバイス製造方法
KR101538414B1 (ko) * 2011-04-08 2015-07-22 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치, 프로그래밍 가능한 패터닝 디바이스 및 리소그래피 방법
DE102011076083A1 (de) 2011-05-18 2012-11-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Projektionsdisplay und Verfahren zum Anzeigen eines Gesamtbildes für Projektionsfreiformflächen oder verkippte Projektionsflächen
JP6676942B2 (ja) * 2015-12-01 2020-04-08 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
TWI724642B (zh) * 2019-11-20 2021-04-11 墨子光電有限公司 微製像設備及其加工方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2049964A (en) * 1979-05-01 1980-12-31 Agfa Gevaert Nv Simultaneously projecting two images of a subject in register
DE3406677A1 (de) * 1984-02-24 1985-09-05 Fa. Carl Zeiss, 7920 Heidenheim Einrichtung zur kompensation der auswanderung eines laserstrahls
JP2501436B2 (ja) * 1986-10-31 1996-05-29 富士通株式会社 パタ−ンデ−タ検査装置
JP2796316B2 (ja) * 1988-10-24 1998-09-10 株式会社日立製作所 欠陥または異物の検査方法およびその装置
JPH03265815A (ja) * 1990-03-16 1991-11-26 Kobe Steel Ltd レーザビームによる描画装置
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
WO1992011567A1 (en) * 1990-12-21 1992-07-09 Eastman Kodak Company Method and apparatus for selectively varying the exposure of a photosensitive medium
US5229889A (en) * 1991-12-10 1993-07-20 Hughes Aircraft Company Simple adaptive optical system
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP2710527B2 (ja) * 1992-10-21 1998-02-10 大日本スクリーン製造株式会社 周期性パターンの検査装置
JPH06250108A (ja) * 1993-02-22 1994-09-09 Hitachi Ltd 補償光学装置とこれを用いた天体望遠鏡，光データリンク，レーザ加工機
JPH088161A (ja) * 1994-06-20 1996-01-12 Mitsubishi Electric Corp 転写シミュレータ装置
US6133986A (en) * 1996-02-28 2000-10-17 Johnson; Kenneth C. Microlens scanner for microlithography and wide-field confocal microscopy
JPH10177589A (ja) * 1996-12-18 1998-06-30 Mitsubishi Electric Corp パターン比較検証装置、パターン比較検証方法およびパターン比較検証プログラムを記録した媒体
JP4159139B2 (ja) * 1998-05-14 2008-10-01 リコーマイクロエレクトロニクス株式会社 光像形成装置、光加工装置並びに露光装置
SE519397C2 (sv) * 1998-12-16 2003-02-25 Micronic Laser Systems Ab System och metod för mikrolitografiskt ritande av högprecisionsmönster
JP3315658B2 (ja) * 1998-12-28 2002-08-19 キヤノン株式会社 投影装置および露光装置
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
JP4364459B2 (ja) * 2000-12-07 2009-11-18 富士通株式会社 光信号交換器の制御装置および制御方法
JP2002367900A (ja) * 2001-06-12 2002-12-20 Yaskawa Electric Corp 露光装置および露光方法
KR20040047816A (ko) * 2001-09-12 2004-06-05 마이크로닉 레이저 시스템즈 에이비 공간광변조기를 이용한 개선된 방법 및 장치

Also Published As

Publication number Publication date
US7379579B2 (en) 2008-05-27
WO2003046662A1 (en) 2003-06-05
US20050062948A1 (en) 2005-03-24
EP1449032B1 (en) 2008-12-31
DE60230663D1 (de) 2009-02-12
KR100674245B1 (ko) 2007-01-25
CN1596387A (zh) 2005-03-16
CN1294455C (zh) 2007-01-10
JP2005510860A (ja) 2005-04-21
KR20040054804A (ko) 2004-06-25
EP1449032A1 (en) 2004-08-25

Similar Documents

Publication Publication Date Title
JP4342155B2 (ja) 位置決めマークを備えた基板、マスクを設計する方法、コンピュータ・プログラム、位置決めマークを露光するマスク、およびデバイス製造方法
TW529172B (en) Imaging apparatus
JP4058405B2 (ja) デバイス製造方法およびこの方法により製造したデバイス
JP4048151B2 (ja) リソグラフ装置およびデバイス製造方法
JP4141984B2 (ja) リソグラフィック装置較正方法、整列方法、コンピュータ・プログラム、リソグラフィック装置及びデバイス製造方法
JP2004343106A (ja) リソグラフィ装置、デバイス製造方法およびそれにより製造したデバイス
JP4290553B2 (ja) 画像化装置
US20050012916A1 (en) Lithographic apparatus and device manufacturing method
JP4304169B2 (ja) リソグラフィ装置およびデバイス製造方法
JP2023536576A (ja) 粒子検査システムのスループットを改善するためのダブルスキャン・オプトメカニカル構成
US7081945B2 (en) Device manufacturing method, device manufactured thereby and lithographic apparatus therefor
EP1698940B1 (en) Exposure method and apparatus
JP3583774B2 (ja) リソグラフィ装置およびデバイス製造方法
JP3913701B2 (ja) デバイス製造法、その方法により製造されるデバイスおよびコンピュータ・プログラム
JP4658004B2 (ja) デバイス製造方法
JP2004279403A (ja) 基板位置合せ方法、コンピュータ・プログラム、デバイス製造方法、およびそれにより製造されたデバイス
JP2005311378A (ja) デバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050527

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050527

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20060919

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061124

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081118

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090209

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090324

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090401

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120410

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130410

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140410

Year of fee payment: 5

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees