JP2005510860A5 - - Google Patents

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Publication number
JP2005510860A5
JP2005510860A5 JP2003548035A JP2003548035A JP2005510860A5 JP 2005510860 A5 JP2005510860 A5 JP 2005510860A5 JP 2003548035 A JP2003548035 A JP 2003548035A JP 2003548035 A JP2003548035 A JP 2003548035A JP 2005510860 A5 JP2005510860 A5 JP 2005510860A5
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JP
Japan
Prior art keywords
radiation
detection means
image
projection
image detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2003548035A
Other languages
English (en)
Japanese (ja)
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JP2005510860A (ja
JP4290553B2 (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/EP2002/013399 external-priority patent/WO2003046662A1/en
Publication of JP2005510860A publication Critical patent/JP2005510860A/ja
Publication of JP2005510860A5 publication Critical patent/JP2005510860A5/ja
Application granted granted Critical
Publication of JP4290553B2 publication Critical patent/JP4290553B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003548035A 2001-11-27 2002-11-27 画像化装置 Expired - Fee Related JP4290553B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01204567 2001-11-27
PCT/EP2002/013399 WO2003046662A1 (en) 2001-11-27 2002-11-27 Imaging apparatus

Publications (3)

Publication Number Publication Date
JP2005510860A JP2005510860A (ja) 2005-04-21
JP2005510860A5 true JP2005510860A5 (enExample) 2006-01-05
JP4290553B2 JP4290553B2 (ja) 2009-07-08

Family

ID=8181314

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003548035A Expired - Fee Related JP4290553B2 (ja) 2001-11-27 2002-11-27 画像化装置

Country Status (7)

Country Link
US (1) US7379579B2 (enExample)
EP (1) EP1449032B1 (enExample)
JP (1) JP4290553B2 (enExample)
KR (1) KR100674245B1 (enExample)
CN (1) CN1294455C (enExample)
DE (1) DE60230663D1 (enExample)
WO (1) WO2003046662A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1324138A3 (en) * 2001-12-28 2007-12-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4929444B2 (ja) * 2004-09-27 2012-05-09 国立大学法人東北大学 パターン描画装置および方法
US7177012B2 (en) 2004-10-18 2007-02-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7403865B2 (en) * 2004-12-28 2008-07-22 Asml Netherlands B.V. System and method for fault indication on a substrate in maskless applications
US7233384B2 (en) * 2005-06-13 2007-06-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor
EP1986224A4 (en) * 2006-02-16 2012-01-25 Nikon Corp EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
NL2008426A (en) 2011-04-08 2012-10-09 Asml Netherlands Bv Lithographic apparatus, programmable patterning device and lithographic method.
DE102011076083A1 (de) 2011-05-18 2012-11-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Projektionsdisplay und Verfahren zum Anzeigen eines Gesamtbildes für Projektionsfreiformflächen oder verkippte Projektionsflächen
JP6676942B2 (ja) * 2015-12-01 2020-04-08 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
TWI724642B (zh) * 2019-11-20 2021-04-11 墨子光電有限公司 微製像設備及其加工方法

Family Cites Families (22)

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Publication number Priority date Publication date Assignee Title
GB2049964A (en) 1979-05-01 1980-12-31 Agfa Gevaert Nv Simultaneously projecting two images of a subject in register
DE3406677A1 (de) * 1984-02-24 1985-09-05 Fa. Carl Zeiss, 7920 Heidenheim Einrichtung zur kompensation der auswanderung eines laserstrahls
JP2501436B2 (ja) * 1986-10-31 1996-05-29 富士通株式会社 パタ−ンデ−タ検査装置
JP2796316B2 (ja) * 1988-10-24 1998-09-10 株式会社日立製作所 欠陥または異物の検査方法およびその装置
JPH03265815A (ja) * 1990-03-16 1991-11-26 Kobe Steel Ltd レーザビームによる描画装置
US5142132A (en) * 1990-11-05 1992-08-25 Litel Instruments Adaptive optic wafer stepper illumination system
WO1992011567A1 (en) * 1990-12-21 1992-07-09 Eastman Kodak Company Method and apparatus for selectively varying the exposure of a photosensitive medium
US5229889A (en) * 1991-12-10 1993-07-20 Hughes Aircraft Company Simple adaptive optical system
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP2710527B2 (ja) * 1992-10-21 1998-02-10 大日本スクリーン製造株式会社 周期性パターンの検査装置
JPH06250108A (ja) * 1993-02-22 1994-09-09 Hitachi Ltd 補償光学装置とこれを用いた天体望遠鏡，光データリンク，レーザ加工機
JPH088161A (ja) * 1994-06-20 1996-01-12 Mitsubishi Electric Corp 転写シミュレータ装置
EP0991959B1 (en) * 1996-02-28 2004-06-23 Kenneth C. Johnson Microlens scanner for microlithography and wide-field confocal microscopy
JPH10177589A (ja) * 1996-12-18 1998-06-30 Mitsubishi Electric Corp パターン比較検証装置、パターン比較検証方法およびパターン比較検証プログラムを記録した媒体
JP4159139B2 (ja) * 1998-05-14 2008-10-01 リコーマイクロエレクトロニクス株式会社 光像形成装置、光加工装置並びに露光装置
SE519397C2 (sv) * 1998-12-16 2003-02-25 Micronic Laser Systems Ab System och metod för mikrolitografiskt ritande av högprecisionsmönster
JP3315658B2 (ja) * 1998-12-28 2002-08-19 キヤノン株式会社 投影装置および露光装置
TWI282909B (en) * 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
JP2001255664A (ja) * 2000-03-14 2001-09-21 Fuji Photo Film Co Ltd 画像露光方法
JP4364459B2 (ja) * 2000-12-07 2009-11-18 富士通株式会社 光信号交換器の制御装置および制御方法
JP2002367900A (ja) * 2001-06-12 2002-12-20 Yaskawa Electric Corp 露光装置および露光方法
DE10297208T5 (de) * 2001-09-12 2005-01-05 Micronic Laser Systems Ab Verbessertes Verfahren und verbesserte Vorrichtung unter Verwendung eines SLM

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