JP4237175B2 - 白色光干渉計を用いた透明薄膜の厚さ及び形状の測定装置及び方法 - Google Patents

白色光干渉計を用いた透明薄膜の厚さ及び形状の測定装置及び方法 Download PDF

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Publication number
JP4237175B2
JP4237175B2 JP2005326722A JP2005326722A JP4237175B2 JP 4237175 B2 JP4237175 B2 JP 4237175B2 JP 2005326722 A JP2005326722 A JP 2005326722A JP 2005326722 A JP2005326722 A JP 2005326722A JP 4237175 B2 JP4237175 B2 JP 4237175B2
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thin film
light
thickness
interference
information
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Japanese (ja)
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JP2006138854A5 (enExample
JP2006138854A (ja
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セウン ウー キム
ヨウン シク ジム
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Korea Advanced Institute of Science and Technology KAIST
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Korea Advanced Institute of Science and Technology KAIST
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Publication of JP2006138854A5 publication Critical patent/JP2006138854A5/ja
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0675—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating using interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G01B11/2441—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures using interferometry

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2005326722A 2004-11-10 2005-11-10 白色光干渉計を用いた透明薄膜の厚さ及び形状の測定装置及び方法 Expired - Fee Related JP4237175B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20040091655 2004-11-10
KR1020050092978A KR100631060B1 (ko) 2004-11-10 2005-10-04 백색광 간섭계를 이용한 투명박막의 두께 및 형상을측정하는 장치 및 방법

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JP2006138854A JP2006138854A (ja) 2006-06-01
JP2006138854A5 JP2006138854A5 (enExample) 2007-03-01
JP4237175B2 true JP4237175B2 (ja) 2009-03-11

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JP2005326722A Expired - Fee Related JP4237175B2 (ja) 2004-11-10 2005-11-10 白色光干渉計を用いた透明薄膜の厚さ及び形状の測定装置及び方法

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US (1) US7483147B2 (enExample)
JP (1) JP4237175B2 (enExample)

Cited By (1)

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KR20160037993A (ko) * 2013-07-26 2016-04-06 마포스 쏘시에타 페르 아지오니 기계가공되는 대상물의 두께를 간섭계에 의해 광학적으로 검사하는 방법 및 장치

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US7116429B1 (en) * 2003-01-18 2006-10-03 Walecki Wojciech J Determining thickness of slabs of materials by inventors
US20060023217A1 (en) * 2004-05-28 2006-02-02 Chemimage Corporation Method and apparatus for producing a mosaic image
JP4762702B2 (ja) * 2005-12-08 2011-08-31 富士フイルム株式会社 メッキ厚モニタ装置およびメッキ停止装置
JP2009178627A (ja) * 2008-01-29 2009-08-13 Seiko Epson Corp 薄膜形成方法、カラーフィルタの製造方法
KR100988454B1 (ko) * 2008-01-31 2010-10-18 에스엔유 프리시젼 주식회사 두께 측정방법
DE102008044375A1 (de) * 2008-12-05 2010-06-10 Robert Bosch Gmbh Optisches Messgerät
KR20110061287A (ko) * 2009-12-01 2011-06-09 삼성모바일디스플레이주식회사 표면 검사장치, 이를 이용한 표면 검사방법 및 이를 구비하는 슬릿 코터
US8334986B2 (en) * 2010-02-25 2012-12-18 Corning Incorporated Methods and apparatus for the measurement of film thickness
CN102554709A (zh) * 2010-12-10 2012-07-11 通用电气公司 距离测量系统和方法
EP2678634A1 (en) 2011-02-24 2014-01-01 Corning Incorporated Methods and apparatus for the measurement of film thickness
IT1404208B1 (it) 2011-02-28 2013-11-15 Gerresheimer Pisa Spa Metodo e dispositivo di misura dello spessore di un oggetto trasparente su linee di produzione automatica
US9714825B2 (en) * 2011-04-08 2017-07-25 Rudolph Technologies, Inc. Wafer shape thickness and trench measurement
CN102305601B (zh) * 2011-05-18 2012-10-10 天津大学 光学自由曲面三维形貌高精度非接触测量方法及装置
JP6434965B2 (ja) 2013-10-03 2018-12-05 インフィコン インコーポレイティッド 薄膜堆積監視
JP6196119B2 (ja) * 2013-10-11 2017-09-13 大塚電子株式会社 形状測定装置及び形状測定方法
US9581433B2 (en) 2013-12-11 2017-02-28 Honeywell Asca Inc. Caliper sensor and method using mid-infrared interferometry
CN103900639A (zh) * 2014-04-09 2014-07-02 福州大学 高速多尺度振动和形变检测装置及方法
JP6389081B2 (ja) * 2014-08-07 2018-09-12 Ntn株式会社 形状測定装置、塗布装置および形状測定方法
KR102214716B1 (ko) 2014-08-28 2021-02-10 삼성전자주식회사 박막 두께 측정 장치, 이를 포함하는 시스템 및 박막 두께 측정 방법
US10322028B2 (en) * 2014-09-11 2019-06-18 Orbit Biomedical Limited Method and apparatus for sensing position between layers of an eye
CN104729425B (zh) * 2015-03-17 2017-10-10 中国科学院物理研究所 多晶薄膜形貌的测量方法及测量装置
KR101655096B1 (ko) * 2015-04-23 2016-09-08 에스엔유 프리시젼 주식회사 박막의 두께 측정방법
KR101886919B1 (ko) * 2016-06-16 2018-09-11 한국표준과학연구원 영상분광광학계를 이용한 다층막 구조물의 두께와 형상 측정장치 및 측정방법
CN106225679A (zh) * 2016-07-06 2016-12-14 南京理工大学 一种基于白光干涉标定pzt位移量的方法
KR20190052885A (ko) * 2017-11-09 2019-05-17 삼성전자주식회사 다중층 구조 검사 장치와 방법, 및 그 방법을 구비한 반도체 소자 제조방법
CN108981606B (zh) * 2018-09-17 2020-10-09 苏州大学 一种快照式全场白光干涉显微测量方法及其装置
GB2579832B (en) * 2018-12-17 2022-03-09 Compass Optics Ltd A system and method for inspecting an optical surface
JP7210367B2 (ja) * 2019-04-23 2023-01-23 株式会社ディスコ 厚み計測装置、及び厚み計測装置を備えた加工装置
JP7358185B2 (ja) 2019-10-15 2023-10-10 株式会社ディスコ 厚み計測装置、及び厚み計測装置を備えた加工装置
JP7560974B2 (ja) * 2020-08-07 2024-10-03 株式会社キーエンス レーザ共焦点顕微鏡
JPWO2024009454A1 (enExample) * 2022-07-07 2024-01-11

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AU2003234256A1 (en) * 2002-04-26 2003-11-10 Massachussetts Institute Of Technology Adjustable focusing composite for use in an optical profilometer system and method
US6985232B2 (en) * 2003-03-13 2006-01-10 Tokyo Electron Limited Scatterometry by phase sensitive reflectometer
US7050173B2 (en) * 2003-04-01 2006-05-23 Seagate Technology Llc Method and arrangement for removing noise and measurements of head-media spacing modulation for digital recording
US20050122529A1 (en) * 2003-12-05 2005-06-09 Korea Advanced Institute Of Science And Technology Measurement system of three-dimensional shape of transparent thin film using acousto-optic tunable filter
US7177030B2 (en) * 2004-04-22 2007-02-13 Technion Research And Development Foundation Ltd. Determination of thin film topography
KR100602915B1 (ko) 2004-07-03 2006-07-19 한국과학기술원 공초점 원리를 이용한 현미경 자동초점장치 및 방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160037993A (ko) * 2013-07-26 2016-04-06 마포스 쏘시에타 페르 아지오니 기계가공되는 대상물의 두께를 간섭계에 의해 광학적으로 검사하는 방법 및 장치
KR102236207B1 (ko) * 2013-07-26 2021-04-06 마포스 쏘시에타 페르 아지오니 기계가공되는 대상물의 두께를 간섭계에 의해 광학적으로 검사하는 방법 및 장치

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US7483147B2 (en) 2009-01-27
JP2006138854A (ja) 2006-06-01
US20060098206A1 (en) 2006-05-11

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