JP4210058B2 - フッ化カルシウム（ＣａＦ２）ストレスプレートおよびそれを作製する方法 - Google Patents

フッ化カルシウム（ＣａＦ２）ストレスプレートおよびそれを作製する方法 Download PDF

Info

Publication number
JP4210058B2
JP4210058B2 JP2001550056A JP2001550056A JP4210058B2 JP 4210058 B2 JP4210058 B2 JP 4210058B2 JP 2001550056 A JP2001550056 A JP 2001550056A JP 2001550056 A JP2001550056 A JP 2001550056A JP 4210058 B2 JP4210058 B2 JP 4210058B2
Authority
JP
Japan
Prior art keywords
caf
plate
refractive index
optical
stress plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001550056A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003519401A5 (enExample
JP2003519401A (ja
Inventor
ジーン ジャイ マーティン，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of JP2003519401A publication Critical patent/JP2003519401A/ja
Publication of JP2003519401A5 publication Critical patent/JP2003519401A5/ja
Application granted granted Critical
Publication of JP4210058B2 publication Critical patent/JP4210058B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0128—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-mechanical, magneto-mechanical, elasto-optic effects
    • G02F1/0131—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-mechanical, magneto-mechanical, elasto-optic effects based on photo-elastic effects, e.g. mechanically induced birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Nonlinear Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Polarising Elements (AREA)
JP2001550056A 1999-12-23 2000-12-21 フッ化カルシウム（ＣａＦ２）ストレスプレートおよびそれを作製する方法 Expired - Fee Related JP4210058B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/471,484 1999-12-23
US09/471,484 US6324003B1 (en) 1999-12-23 1999-12-23 Calcium fluoride (CaF2) stress plate and method of making the same
PCT/US2000/034645 WO2001050161A1 (en) 1999-12-23 2000-12-21 CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME

Publications (3)

Publication Number Publication Date
JP2003519401A JP2003519401A (ja) 2003-06-17
JP2003519401A5 JP2003519401A5 (enExample) 2008-02-14
JP4210058B2 true JP4210058B2 (ja) 2009-01-14

Family

ID=23871805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001550056A Expired - Fee Related JP4210058B2 (ja) 1999-12-23 2000-12-21 フッ化カルシウム（ＣａＦ２）ストレスプレートおよびそれを作製する方法

Country Status (7)

Country Link
US (1) US6324003B1 (enExample)
EP (1) EP1242836B1 (enExample)
JP (1) JP4210058B2 (enExample)
KR (1) KR100723561B1 (enExample)
AU (1) AU2443001A (enExample)
DE (1) DE60026885T2 (enExample)
WO (1) WO2001050161A1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6937394B2 (en) * 2001-04-10 2005-08-30 Carl Zeiss Semiconductor Manufacturing Technologies Ag Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
WO2002093209A2 (de) * 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
AU2002257270A1 (en) * 2001-05-16 2002-11-25 Corning Incorporated Preferred crystal orientation optical elements from cubic materials
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6785051B2 (en) 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
JPWO2003054590A1 (ja) * 2001-12-10 2005-04-28 株式会社ニコン 光リソグラフィー装置に用いられる光学素子用のフッ化物結晶材料及びその製造方法
US7292388B2 (en) * 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
AU2002356590A1 (en) * 2002-05-08 2003-11-11 Carl Zeiss Smt Ag Lens consisting of a crystalline material
US20050190446A1 (en) * 2002-06-25 2005-09-01 Carl Zeiss Amt Ag Catadioptric reduction objective
DE10229614A1 (de) * 2002-06-25 2004-01-15 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US6969028B2 (en) * 2003-01-22 2005-11-29 The Boeing Company Scarf nozzle for a jet engine and method of using the same
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
US7084960B2 (en) * 2004-03-29 2006-08-01 Intel Corporation Lithography using controlled polarization
US7158275B2 (en) * 2004-04-13 2007-01-02 Intel Corporation Polarization modulator
JP4913041B2 (ja) * 2004-06-04 2012-04-11 カール・ツァイス・エスエムティー・ゲーエムベーハー 強度変化の補償を伴う投影系及びそのための補償素子
DE102007014587A1 (de) 2007-03-23 2008-09-25 Carl Zeiss Smt Ag Doppelbrechende Verzögerungsplattenanordnung
DE102012211549B3 (de) 2012-07-03 2013-07-04 Polytec Gmbh Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1485083A (fr) 1965-07-08 1967-06-16 Ibm Lames à retard de phase variable
US3600611A (en) 1970-03-18 1971-08-17 Kettering Scient Research Inc Elasto-optic device with mechanical bias
JPH09248488A (ja) * 1996-03-18 1997-09-22 Toto Ltd 空気清浄装置
DE19637563A1 (de) 1996-09-14 1998-03-19 Zeiss Carl Fa Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte
KR100223812B1 (ko) * 1996-10-30 1999-10-15 구본준 위상반전 마스크의 제조방법
DE19810089A1 (de) 1998-03-10 1999-09-16 Zeiss Carl Fa Doppelbrechende Plattenanordnung mit Spannungsdoppelbrechung
JP3856265B2 (ja) 1998-03-12 2006-12-13 株式会社ニコン 光学素子の製造方法、光学素子の複屈折算出方法及び複屈折判定方法

Also Published As

Publication number Publication date
KR100723561B1 (ko) 2007-06-04
EP1242836A1 (en) 2002-09-25
US6324003B1 (en) 2001-11-27
DE60026885D1 (de) 2006-05-11
DE60026885T2 (de) 2006-08-17
JP2003519401A (ja) 2003-06-17
AU2443001A (en) 2001-07-16
EP1242836B1 (en) 2006-03-22
WO2001050161A1 (en) 2001-07-12
KR20020077370A (ko) 2002-10-11
WO2001050161A9 (en) 2002-05-16

Similar Documents

Publication Publication Date Title
JP4210058B2 (ja) フッ化カルシウム（ＣａＦ２）ストレスプレートおよびそれを作製する方法
JP7069265B2 (ja) メタ表面、メタ表面の製造方法及びデバイス
US7265834B2 (en) Polarization analyzer
US20010012149A1 (en) Optical elements comprising photonic crystals and applications thereof
CN110927993B (zh) 基于全介质超表面结构的退偏器
JP2006330105A (ja) 偏光制御素子および偏光制御素子の偏光制御方法
JP5118311B2 (ja) 位相差および光軸方位の測定装置
JP2002116085A (ja) 偏光計測装置
CN115097568B (zh) 一种基于超表面的片上光自旋控制型双波导耦合系统
CN108828787A (zh) 一种微纳结构大视场角消色差波片
KR101190438B1 (ko) 마이크로 리소그라피 투영노출장치의 광학장치
US7239450B2 (en) Method of determining lens materials for a projection exposure apparatus
JP4975162B2 (ja) 紫外線用自己クローニングフォトニック結晶
US12444630B2 (en) Single-material waveplates for pupil polarization filtering
CN116454717A (zh) 原子频标中激光器偏振调控器及其结构优化和制作方法
Sakurai Special polarization characteristic features of a three dimensional terahertz photonic crystal not apparently apply to physical and optical basic rules
Deng et al. Fabrication and properties of visible‐light subwavelength amorphous silicon transmission gratings
CN119902361A (zh) 具有可调谐束剪切距离的无棱镜微分干涉对比显微镜
Cheng et al. Thin-Film Terahertz Metamaterials Manufactured by Laser Direct Writing
JP2025505624A (ja) ナノ構造複屈折光学素子およびナノ構造複屈折光学素子を備えた顕微鏡
CN1904671A (zh) 二维光子晶体宽带波片及其设计方法与应用

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050802

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061124

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20061124

A711 Notification of change in applicant

Free format text: JAPANESE INTERMEDIATE CODE: A711

Effective date: 20070803

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20070815

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070828

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071218

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080603

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080903

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080926

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20081024

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111031

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20121031

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees