KR100723561B1 - 칼슘 플루오라이드 응력판 및 그 제조 방법 - Google Patents
칼슘 플루오라이드 응력판 및 그 제조 방법 Download PDFInfo
- Publication number
- KR100723561B1 KR100723561B1 KR1020027008159A KR20027008159A KR100723561B1 KR 100723561 B1 KR100723561 B1 KR 100723561B1 KR 1020027008159 A KR1020027008159 A KR 1020027008159A KR 20027008159 A KR20027008159 A KR 20027008159A KR 100723561 B1 KR100723561 B1 KR 100723561B1
- Authority
- KR
- South Korea
- Prior art keywords
- caf
- plate
- force
- delay
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/12—Halides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0128—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on electro-mechanical, magneto-mechanical, elasto-optic effects
- G02F1/0131—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on electro-mechanical, magneto-mechanical, elasto-optic effects based on photo-elastic effects, e.g. mechanically induced birefringence
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Nonlinear Science (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/471,484 | 1999-12-23 | ||
| US09/471,484 US6324003B1 (en) | 1999-12-23 | 1999-12-23 | Calcium fluoride (CaF2) stress plate and method of making the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20020077370A KR20020077370A (ko) | 2002-10-11 |
| KR100723561B1 true KR100723561B1 (ko) | 2007-06-04 |
Family
ID=23871805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020027008159A Expired - Fee Related KR100723561B1 (ko) | 1999-12-23 | 2000-12-21 | 칼슘 플루오라이드 응력판 및 그 제조 방법 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6324003B1 (enExample) |
| EP (1) | EP1242836B1 (enExample) |
| JP (1) | JP4210058B2 (enExample) |
| KR (1) | KR100723561B1 (enExample) |
| AU (1) | AU2443001A (enExample) |
| DE (1) | DE60026885T2 (enExample) |
| WO (1) | WO2001050161A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6937394B2 (en) * | 2001-04-10 | 2005-08-30 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Device and method for changing the stress-induced birefringence and/or the thickness of an optical component |
| US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| WO2002093209A2 (de) * | 2001-05-15 | 2002-11-21 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
| AU2002257270A1 (en) * | 2001-05-16 | 2002-11-25 | Corning Incorporated | Preferred crystal orientation optical elements from cubic materials |
| US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| US6785051B2 (en) | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
| US7453641B2 (en) * | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
| US6844972B2 (en) * | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
| US6995908B2 (en) | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
| JPWO2003054590A1 (ja) * | 2001-12-10 | 2005-04-28 | 株式会社ニコン | 光リソグラフィー装置に用いられる光学素子用のフッ化物結晶材料及びその製造方法 |
| US7292388B2 (en) * | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
| AU2002356590A1 (en) * | 2002-05-08 | 2003-11-11 | Carl Zeiss Smt Ag | Lens consisting of a crystalline material |
| US20050190446A1 (en) * | 2002-06-25 | 2005-09-01 | Carl Zeiss Amt Ag | Catadioptric reduction objective |
| DE10229614A1 (de) * | 2002-06-25 | 2004-01-15 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
| US6958864B2 (en) * | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| US6969028B2 (en) * | 2003-01-22 | 2005-11-29 | The Boeing Company | Scarf nozzle for a jet engine and method of using the same |
| US7408616B2 (en) * | 2003-09-26 | 2008-08-05 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| US7084960B2 (en) * | 2004-03-29 | 2006-08-01 | Intel Corporation | Lithography using controlled polarization |
| US7158275B2 (en) * | 2004-04-13 | 2007-01-02 | Intel Corporation | Polarization modulator |
| JP4913041B2 (ja) * | 2004-06-04 | 2012-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 強度変化の補償を伴う投影系及びそのための補償素子 |
| DE102007014587A1 (de) | 2007-03-23 | 2008-09-25 | Carl Zeiss Smt Ag | Doppelbrechende Verzögerungsplattenanordnung |
| DE102012211549B3 (de) | 2012-07-03 | 2013-07-04 | Polytec Gmbh | Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09248488A (ja) * | 1996-03-18 | 1997-09-22 | Toto Ltd | 空気清浄装置 |
| KR19980030509A (ko) * | 1996-10-30 | 1998-07-25 | 문정환 | 위상반전 마스크의 제조방법 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1485083A (fr) | 1965-07-08 | 1967-06-16 | Ibm | Lames à retard de phase variable |
| US3600611A (en) | 1970-03-18 | 1971-08-17 | Kettering Scient Research Inc | Elasto-optic device with mechanical bias |
| DE19637563A1 (de) | 1996-09-14 | 1998-03-19 | Zeiss Carl Fa | Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte |
| DE19810089A1 (de) | 1998-03-10 | 1999-09-16 | Zeiss Carl Fa | Doppelbrechende Plattenanordnung mit Spannungsdoppelbrechung |
| JP3856265B2 (ja) | 1998-03-12 | 2006-12-13 | 株式会社ニコン | 光学素子の製造方法、光学素子の複屈折算出方法及び複屈折判定方法 |
-
1999
- 1999-12-23 US US09/471,484 patent/US6324003B1/en not_active Expired - Fee Related
-
2000
- 2000-12-21 EP EP00988198A patent/EP1242836B1/en not_active Expired - Lifetime
- 2000-12-21 WO PCT/US2000/034645 patent/WO2001050161A1/en not_active Ceased
- 2000-12-21 DE DE60026885T patent/DE60026885T2/de not_active Expired - Lifetime
- 2000-12-21 KR KR1020027008159A patent/KR100723561B1/ko not_active Expired - Fee Related
- 2000-12-21 JP JP2001550056A patent/JP4210058B2/ja not_active Expired - Fee Related
- 2000-12-21 AU AU24430/01A patent/AU2443001A/en not_active Abandoned
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09248488A (ja) * | 1996-03-18 | 1997-09-22 | Toto Ltd | 空気清浄装置 |
| KR19980030509A (ko) * | 1996-10-30 | 1998-07-25 | 문정환 | 위상반전 마스크의 제조방법 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1242836A1 (en) | 2002-09-25 |
| US6324003B1 (en) | 2001-11-27 |
| DE60026885D1 (de) | 2006-05-11 |
| DE60026885T2 (de) | 2006-08-17 |
| JP2003519401A (ja) | 2003-06-17 |
| AU2443001A (en) | 2001-07-16 |
| EP1242836B1 (en) | 2006-03-22 |
| WO2001050161A1 (en) | 2001-07-12 |
| KR20020077370A (ko) | 2002-10-11 |
| WO2001050161A9 (en) | 2002-05-16 |
| JP4210058B2 (ja) | 2009-01-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100723561B1 (ko) | 칼슘 플루오라이드 응력판 및 그 제조 방법 | |
| US7265834B2 (en) | Polarization analyzer | |
| US6870621B2 (en) | Small spot ellipsometer | |
| US4492436A (en) | Polarization independent beam splitter | |
| US5587793A (en) | Birefringence distribution measuring method | |
| JP2003035822A (ja) | 偏光器および偏光器を備えたマイクロリソグラフィー投影システム | |
| JP5118311B2 (ja) | 位相差および光軸方位の測定装置 | |
| Priestley | Birefringence dispersion in fused silica for DUV lithography | |
| JP5021645B2 (ja) | 偏光子,及び偏光子を用いた顕微鏡 | |
| US12322620B2 (en) | Reflective waveplates for pupil polarization filtering | |
| SU1727105A1 (ru) | Автоколлимационное устройство | |
| Nomura et al. | Polarimetry of illumination for 193-nm lithography used for the manufacture of high-end LSIs | |
| US20250155623A1 (en) | Nanostructured birefringent optical elements and microscopes with nanostructured birefringent optical elements | |
| RU2039948C1 (ru) | Устройство для поляризационного измерения характеристик прозрачного объекта | |
| JP3000030B2 (ja) | 光ファイバ部品の反射量の測定法及びそのための装置 | |
| Bennett | Polarization| Introduction | |
| Zhang et al. | Performance measurement technique for 193-nm depolarizer | |
| JPH04109136A (ja) | 屈折率分布測定装置 | |
| Pezzaniti et al. | Polarization BRDF | |
| Furutono et al. | Wide-view-angle λ/4 plates for diagnosing 193-nm lithography tools | |
| CN119902361A (zh) | 具有可调谐束剪切距离的无棱镜微分干涉对比显微镜 | |
| Sakurai | Special polarization characteristic features of a three dimensional terahertz photonic crystal not apparently apply to physical and optical basic rules | |
| Center | Jean M. Bennett | |
| JPS60107546A (ja) | 複像子を用いた光学モジュール | |
| JPH07168127A (ja) | 光アイソレータ |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
St.27 status event code: A-0-1-A10-A15-nap-PA0105 |
|
| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
|
| A201 | Request for examination | ||
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
St.27 status event code: A-1-2-D10-D21-exm-PE0902 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
|
| E13-X000 | Pre-grant limitation requested |
St.27 status event code: A-2-3-E10-E13-lim-X000 |
|
| P11-X000 | Amendment of application requested |
St.27 status event code: A-2-2-P10-P11-nap-X000 |
|
| P13-X000 | Application amended |
St.27 status event code: A-2-2-P10-P13-nap-X000 |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
St.27 status event code: A-1-2-D10-D22-exm-PE0701 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
St.27 status event code: A-2-4-F10-F11-exm-PR0701 |
|
| PR1002 | Payment of registration fee |
St.27 status event code: A-2-2-U10-U12-oth-PR1002 Fee payment year number: 1 |
|
| PG1601 | Publication of registration |
St.27 status event code: A-4-4-Q10-Q13-nap-PG1601 |
|
| G170 | Re-publication after modification of scope of protection [patent] | ||
| PG1701 | Publication of correction |
St.27 status event code: A-5-5-P10-P19-oth-PG1701 Patent document republication publication date: 20080423 Republication note text: Request for Correction Notice (Document Request) Gazette number: 1007235610000 Gazette reference publication date: 20070604 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 4 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20120511 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
St.27 status event code: A-4-4-U10-U11-oth-PR1001 Fee payment year number: 6 |
|
| LAPS | Lapse due to unpaid annual fee | ||
| PC1903 | Unpaid annual fee |
St.27 status event code: A-4-4-U10-U13-oth-PC1903 Not in force date: 20130524 Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE |
|
| PC1903 | Unpaid annual fee |
St.27 status event code: N-4-6-H10-H13-oth-PC1903 Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE Not in force date: 20130524 |
|
| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-5-5-R10-R18-oth-X000 |