DE60026885T2 - SPANNUNGSDOPPELBRECHUNGSPLATTE AUS CALCIUMFLUORID (CaF2) SOWIE ZUGEHÖRIGES HERSTELLUNGSVERFAHREN - Google Patents
SPANNUNGSDOPPELBRECHUNGSPLATTE AUS CALCIUMFLUORID (CaF2) SOWIE ZUGEHÖRIGES HERSTELLUNGSVERFAHREN Download PDFInfo
- Publication number
- DE60026885T2 DE60026885T2 DE60026885T DE60026885T DE60026885T2 DE 60026885 T2 DE60026885 T2 DE 60026885T2 DE 60026885 T DE60026885 T DE 60026885T DE 60026885 T DE60026885 T DE 60026885T DE 60026885 T2 DE60026885 T2 DE 60026885T2
- Authority
- DE
- Germany
- Prior art keywords
- caf
- planes
- cubic
- transmission axis
- force
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 title description 4
- 238000005336 cracking Methods 0.000 title 1
- 229910004261 CaF 2 Inorganic materials 0.000 claims description 107
- 230000003287 optical effect Effects 0.000 claims description 53
- 230000005540 biological transmission Effects 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 21
- 238000005520 cutting process Methods 0.000 claims description 4
- 238000005498 polishing Methods 0.000 claims 4
- 239000013598 vector Substances 0.000 description 18
- 230000006835 compression Effects 0.000 description 16
- 238000007906 compression Methods 0.000 description 16
- 239000000523 sample Substances 0.000 description 16
- 230000010287 polarization Effects 0.000 description 15
- 239000004065 semiconductor Substances 0.000 description 12
- 235000012431 wafers Nutrition 0.000 description 12
- 238000000576 coating method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000005286 illumination Methods 0.000 description 7
- 239000011575 calcium Substances 0.000 description 5
- 238000003776 cleavage reaction Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 230000007017 scission Effects 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000002178 crystalline material Substances 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 3
- 229910001424 calcium ion Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- -1 Fluorine ions Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002372 labelling Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/12—Halides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0128—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on electro-mechanical, magneto-mechanical, elasto-optic effects
- G02F1/0131—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on electro-mechanical, magneto-mechanical, elasto-optic effects based on photo-elastic effects, e.g. mechanically induced birefringence
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Nonlinear Science (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US471484 | 1999-12-23 | ||
| US09/471,484 US6324003B1 (en) | 1999-12-23 | 1999-12-23 | Calcium fluoride (CaF2) stress plate and method of making the same |
| PCT/US2000/034645 WO2001050161A1 (en) | 1999-12-23 | 2000-12-21 | CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60026885D1 DE60026885D1 (de) | 2006-05-11 |
| DE60026885T2 true DE60026885T2 (de) | 2006-08-17 |
Family
ID=23871805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60026885T Expired - Lifetime DE60026885T2 (de) | 1999-12-23 | 2000-12-21 | SPANNUNGSDOPPELBRECHUNGSPLATTE AUS CALCIUMFLUORID (CaF2) SOWIE ZUGEHÖRIGES HERSTELLUNGSVERFAHREN |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US6324003B1 (enExample) |
| EP (1) | EP1242836B1 (enExample) |
| JP (1) | JP4210058B2 (enExample) |
| KR (1) | KR100723561B1 (enExample) |
| AU (1) | AU2443001A (enExample) |
| DE (1) | DE60026885T2 (enExample) |
| WO (1) | WO2001050161A1 (enExample) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6937394B2 (en) * | 2001-04-10 | 2005-08-30 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Device and method for changing the stress-induced birefringence and/or the thickness of an optical component |
| US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
| WO2002093209A2 (de) * | 2001-05-15 | 2002-11-21 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
| AU2002257270A1 (en) * | 2001-05-16 | 2002-11-25 | Corning Incorporated | Preferred crystal orientation optical elements from cubic materials |
| US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
| US6785051B2 (en) | 2001-07-18 | 2004-08-31 | Corning Incorporated | Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures |
| US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
| US7453641B2 (en) * | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
| US6844972B2 (en) * | 2001-10-30 | 2005-01-18 | Mcguire, Jr. James P. | Reducing aberration in optical systems comprising cubic crystalline optical elements |
| US6995908B2 (en) | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
| JPWO2003054590A1 (ja) * | 2001-12-10 | 2005-04-28 | 株式会社ニコン | 光リソグラフィー装置に用いられる光学素子用のフッ化物結晶材料及びその製造方法 |
| US7292388B2 (en) * | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
| AU2002356590A1 (en) * | 2002-05-08 | 2003-11-11 | Carl Zeiss Smt Ag | Lens consisting of a crystalline material |
| US20050190446A1 (en) * | 2002-06-25 | 2005-09-01 | Carl Zeiss Amt Ag | Catadioptric reduction objective |
| DE10229614A1 (de) * | 2002-06-25 | 2004-01-15 | Carl Zeiss Smt Ag | Katadioptrisches Reduktionsobjektiv |
| US6958864B2 (en) * | 2002-08-22 | 2005-10-25 | Asml Netherlands B.V. | Structures and methods for reducing polarization aberration in integrated circuit fabrication systems |
| US6969028B2 (en) * | 2003-01-22 | 2005-11-29 | The Boeing Company | Scarf nozzle for a jet engine and method of using the same |
| US7408616B2 (en) * | 2003-09-26 | 2008-08-05 | Carl Zeiss Smt Ag | Microlithographic exposure method as well as a projection exposure system for carrying out the method |
| US7084960B2 (en) * | 2004-03-29 | 2006-08-01 | Intel Corporation | Lithography using controlled polarization |
| US7158275B2 (en) * | 2004-04-13 | 2007-01-02 | Intel Corporation | Polarization modulator |
| JP4913041B2 (ja) * | 2004-06-04 | 2012-04-11 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 強度変化の補償を伴う投影系及びそのための補償素子 |
| DE102007014587A1 (de) | 2007-03-23 | 2008-09-25 | Carl Zeiss Smt Ag | Doppelbrechende Verzögerungsplattenanordnung |
| DE102012211549B3 (de) | 2012-07-03 | 2013-07-04 | Polytec Gmbh | Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1485083A (fr) | 1965-07-08 | 1967-06-16 | Ibm | Lames à retard de phase variable |
| US3600611A (en) | 1970-03-18 | 1971-08-17 | Kettering Scient Research Inc | Elasto-optic device with mechanical bias |
| JPH09248488A (ja) * | 1996-03-18 | 1997-09-22 | Toto Ltd | 空気清浄装置 |
| DE19637563A1 (de) | 1996-09-14 | 1998-03-19 | Zeiss Carl Fa | Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte |
| KR100223812B1 (ko) * | 1996-10-30 | 1999-10-15 | 구본준 | 위상반전 마스크의 제조방법 |
| DE19810089A1 (de) | 1998-03-10 | 1999-09-16 | Zeiss Carl Fa | Doppelbrechende Plattenanordnung mit Spannungsdoppelbrechung |
| JP3856265B2 (ja) | 1998-03-12 | 2006-12-13 | 株式会社ニコン | 光学素子の製造方法、光学素子の複屈折算出方法及び複屈折判定方法 |
-
1999
- 1999-12-23 US US09/471,484 patent/US6324003B1/en not_active Expired - Fee Related
-
2000
- 2000-12-21 EP EP00988198A patent/EP1242836B1/en not_active Expired - Lifetime
- 2000-12-21 WO PCT/US2000/034645 patent/WO2001050161A1/en not_active Ceased
- 2000-12-21 DE DE60026885T patent/DE60026885T2/de not_active Expired - Lifetime
- 2000-12-21 KR KR1020027008159A patent/KR100723561B1/ko not_active Expired - Fee Related
- 2000-12-21 JP JP2001550056A patent/JP4210058B2/ja not_active Expired - Fee Related
- 2000-12-21 AU AU24430/01A patent/AU2443001A/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR100723561B1 (ko) | 2007-06-04 |
| EP1242836A1 (en) | 2002-09-25 |
| US6324003B1 (en) | 2001-11-27 |
| DE60026885D1 (de) | 2006-05-11 |
| JP2003519401A (ja) | 2003-06-17 |
| AU2443001A (en) | 2001-07-16 |
| EP1242836B1 (en) | 2006-03-22 |
| WO2001050161A1 (en) | 2001-07-12 |
| KR20020077370A (ko) | 2002-10-11 |
| WO2001050161A9 (en) | 2002-05-16 |
| JP4210058B2 (ja) | 2009-01-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE60026885T2 (de) | SPANNUNGSDOPPELBRECHUNGSPLATTE AUS CALCIUMFLUORID (CaF2) SOWIE ZUGEHÖRIGES HERSTELLUNGSVERFAHREN | |
| DE69807753T2 (de) | Breitbandige optische phasenverzögerungsvorrichtung | |
| EP0902909B1 (de) | Interferenzfilter auf der basis von porösem silicium | |
| DE3702203C2 (de) | Verfahren zum Messen von Relativbewegungen | |
| DE60129286T2 (de) | Photonenkristall-Wellenleiter | |
| DE10133841A1 (de) | Objektiv mit Kristall-Linsen | |
| DE69831195T2 (de) | Verfahren zur Herstellung einer Phasenverzögerungsfolie | |
| DE69626637T2 (de) | Polarisierte anzeige mit hohem wirkungsgrad | |
| DE69417174T2 (de) | Beleuchtungssystem für Farbbildprojektionsvorrichtung und zirkularer Polarisator zur Anwendung in einem solchen System | |
| EP0937999B1 (de) | Optisches System mit Polarisationskompensator | |
| DE60004146T2 (de) | Methode und Anordnung zur Herstellung eines photonischen Kristalls | |
| DE69217633T2 (de) | Optischer Polarisationsstrahlenteiler und seine Verwendung in einem Abbildungssystem | |
| DE69630101T2 (de) | Polarisationselement | |
| DE10124474A1 (de) | Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens | |
| DE10123725A1 (de) | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren | |
| DE69226514T2 (de) | Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode | |
| DE10124803A1 (de) | Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator | |
| DE69131418T2 (de) | Projektor mit Hologramm | |
| DE2908752A1 (de) | Optisches transmissionsfilter | |
| DE4209725A1 (de) | Verfahren zur messung der dicke von fluessigkristallzellen | |
| DE10328938A1 (de) | Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie | |
| DE68927778T2 (de) | Elektronisch variables MUEF-Filter für Abbildungsanordnungen | |
| DE112004001318T5 (de) | Verzögerungsschicht und Flüssigkristallanzeigevorrichtung, bei der diese eingesetzt wird | |
| DE112022001126T5 (de) | Kontinuierlich entarteter elliptischer Retarder für empfindliche Partikeldetektion | |
| DE69128872T2 (de) | Polarisationsunabhängige optische Vorrichtung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition |