AU2443001A - Calcium fluoride (CaF2) stress plate and method of making the same - Google Patents

Calcium fluoride (CaF2) stress plate and method of making the same

Info

Publication number
AU2443001A
AU2443001A AU24430/01A AU2443001A AU2443001A AU 2443001 A AU2443001 A AU 2443001A AU 24430/01 A AU24430/01 A AU 24430/01A AU 2443001 A AU2443001 A AU 2443001A AU 2443001 A AU2443001 A AU 2443001A
Authority
AU
Australia
Prior art keywords
caf2
making
same
calcium fluoride
stress plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU24430/01A
Other languages
English (en)
Inventor
Gene Jay Martin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2443001A publication Critical patent/AU2443001A/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0128—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-mechanical, magneto-mechanical, elasto-optic effects
    • G02F1/0131—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-mechanical, magneto-mechanical, elasto-optic effects based on photo-elastic effects, e.g. mechanically induced birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Nonlinear Science (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Polarising Elements (AREA)
AU24430/01A 1999-12-23 2000-12-21 Calcium fluoride (CaF2) stress plate and method of making the same Abandoned AU2443001A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/471,484 US6324003B1 (en) 1999-12-23 1999-12-23 Calcium fluoride (CaF2) stress plate and method of making the same
US09471484 1999-12-23
PCT/US2000/034645 WO2001050161A1 (en) 1999-12-23 2000-12-21 CALCIUM FLUORIDE (CaF2) STRESS PLATE AND METHOD OF MAKING THE SAME

Publications (1)

Publication Number Publication Date
AU2443001A true AU2443001A (en) 2001-07-16

Family

ID=23871805

Family Applications (1)

Application Number Title Priority Date Filing Date
AU24430/01A Abandoned AU2443001A (en) 1999-12-23 2000-12-21 Calcium fluoride (CaF2) stress plate and method of making the same

Country Status (7)

Country Link
US (1) US6324003B1 (enExample)
EP (1) EP1242836B1 (enExample)
JP (1) JP4210058B2 (enExample)
KR (1) KR100723561B1 (enExample)
AU (1) AU2443001A (enExample)
DE (1) DE60026885T2 (enExample)
WO (1) WO2001050161A1 (enExample)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6937394B2 (en) * 2001-04-10 2005-08-30 Carl Zeiss Semiconductor Manufacturing Technologies Ag Device and method for changing the stress-induced birefringence and/or the thickness of an optical component
JP2004526331A (ja) * 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
CN1514943A (zh) * 2001-05-16 2004-07-21 康宁股份有限公司 来自立方体材料的较佳晶体取向光学元件
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US6785051B2 (en) 2001-07-18 2004-08-31 Corning Incorporated Intrinsic birefringence compensation for below 200 nanometer wavelength optical lithography components with cubic crystalline structures
US6995908B2 (en) 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
JPWO2003054590A1 (ja) * 2001-12-10 2005-04-28 株式会社ニコン 光リソグラフィー装置に用いられる光学素子用のフッ化物結晶材料及びその製造方法
US7292388B2 (en) * 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
AU2002356590A1 (en) * 2002-05-08 2003-11-11 Carl Zeiss Smt Ag Lens consisting of a crystalline material
DE10229614A1 (de) * 2002-06-25 2004-01-15 Carl Zeiss Smt Ag Katadioptrisches Reduktionsobjektiv
US20050190446A1 (en) * 2002-06-25 2005-09-01 Carl Zeiss Amt Ag Catadioptric reduction objective
US6958864B2 (en) 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US6969028B2 (en) * 2003-01-22 2005-11-29 The Boeing Company Scarf nozzle for a jet engine and method of using the same
US7408616B2 (en) * 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
US7084960B2 (en) * 2004-03-29 2006-08-01 Intel Corporation Lithography using controlled polarization
US7158275B2 (en) * 2004-04-13 2007-01-02 Intel Corporation Polarization modulator
KR101199076B1 (ko) * 2004-06-04 2012-11-07 칼 짜이스 에스엠티 게엠베하 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
DE102007014587A1 (de) 2007-03-23 2008-09-25 Carl Zeiss Smt Ag Doppelbrechende Verzögerungsplattenanordnung
DE102012211549B3 (de) 2012-07-03 2013-07-04 Polytec Gmbh Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1485083A (fr) 1965-07-08 1967-06-16 Ibm Lames à retard de phase variable
US3600611A (en) 1970-03-18 1971-08-17 Kettering Scient Research Inc Elasto-optic device with mechanical bias
JPH09248488A (ja) * 1996-03-18 1997-09-22 Toto Ltd 空気清浄装置
DE19637563A1 (de) 1996-09-14 1998-03-19 Zeiss Carl Fa Doppelbrechende Planplattenanordnung und DUV-Viertelwellenplatte
KR100223812B1 (ko) * 1996-10-30 1999-10-15 구본준 위상반전 마스크의 제조방법
DE19810089A1 (de) 1998-03-10 1999-09-16 Zeiss Carl Fa Doppelbrechende Plattenanordnung mit Spannungsdoppelbrechung
JP3856265B2 (ja) 1998-03-12 2006-12-13 株式会社ニコン 光学素子の製造方法、光学素子の複屈折算出方法及び複屈折判定方法

Also Published As

Publication number Publication date
JP2003519401A (ja) 2003-06-17
DE60026885D1 (de) 2006-05-11
KR100723561B1 (ko) 2007-06-04
WO2001050161A1 (en) 2001-07-12
EP1242836A1 (en) 2002-09-25
EP1242836B1 (en) 2006-03-22
US6324003B1 (en) 2001-11-27
JP4210058B2 (ja) 2009-01-14
KR20020077370A (ko) 2002-10-11
DE60026885T2 (de) 2006-08-17
WO2001050161A9 (en) 2002-05-16

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase