JP4182825B2 - 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材 - Google Patents

日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材 Download PDF

Info

Publication number
JP4182825B2
JP4182825B2 JP2003182524A JP2003182524A JP4182825B2 JP 4182825 B2 JP4182825 B2 JP 4182825B2 JP 2003182524 A JP2003182524 A JP 2003182524A JP 2003182524 A JP2003182524 A JP 2003182524A JP 4182825 B2 JP4182825 B2 JP 4182825B2
Authority
JP
Japan
Prior art keywords
fine particles
solar
solar radiation
dispersion
radiation shielding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003182524A
Other languages
English (en)
Japanese (ja)
Other versions
JP2004083397A (ja
JP2004083397A5 (enExample
Inventor
武 長南
裕子 久野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP2003182524A priority Critical patent/JP4182825B2/ja
Priority to CNB038054744A priority patent/CN100467386C/zh
Priority to US10/482,296 priority patent/US7247371B2/en
Priority to PCT/JP2003/008359 priority patent/WO2004002894A1/ja
Priority to AU2003246172A priority patent/AU2003246172A1/en
Publication of JP2004083397A publication Critical patent/JP2004083397A/ja
Publication of JP2004083397A5 publication Critical patent/JP2004083397A5/ja
Application granted granted Critical
Publication of JP4182825B2 publication Critical patent/JP4182825B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/67—Particle size smaller than 100 nm
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G19/00—Compounds of tin
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G30/00—Compounds of antimony
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G30/00—Compounds of antimony
    • C01G30/004—Oxides; Hydroxides; Oxyacids
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/0096—Compounds of antimony
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/32—Radiation-absorbing paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/48—Stabilisers against degradation by oxygen, light or heat
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/66—Additives characterised by particle size
    • C09D7/68—Particle size between 100-1000 nm
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/60—Compounds characterised by their crystallite size
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/18—Oxygen-containing compounds, e.g. metal carbonyls
    • C08K3/20—Oxides; Hydroxides
    • C08K3/22—Oxides; Hydroxides of metals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
    • Y10T428/256—Heavy metal or aluminum or compound thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Inorganic Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Glass (AREA)
JP2003182524A 2002-07-01 2003-06-26 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材 Expired - Fee Related JP4182825B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2003182524A JP4182825B2 (ja) 2002-07-01 2003-06-26 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材
CNB038054744A CN100467386C (zh) 2002-07-01 2003-07-01 屏蔽阳光用锑锡氧化物微粒和用其的阳光屏蔽体形成用分散液及阳光屏蔽体和屏蔽阳光用透明基材
US10/482,296 US7247371B2 (en) 2002-07-01 2003-07-01 Antimony tin oxide fine particles for sunlight shielding, and disperse liquid for formation of sunlight shielding solid, sunlight shielding solid, and transparent substrate for sunlight shielding using thereof
PCT/JP2003/008359 WO2004002894A1 (ja) 2002-07-01 2003-07-01 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材
AU2003246172A AU2003246172A1 (en) 2002-07-01 2003-07-01 Fine particles of antimony tin oxide for sunscreen, dispersion thereof for sunscreen material formation, sunscreen material and transparent base material for sunscreen

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002192622 2002-07-01
JP2003182524A JP4182825B2 (ja) 2002-07-01 2003-06-26 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材

Publications (3)

Publication Number Publication Date
JP2004083397A JP2004083397A (ja) 2004-03-18
JP2004083397A5 JP2004083397A5 (enExample) 2005-07-28
JP4182825B2 true JP4182825B2 (ja) 2008-11-19

Family

ID=30002337

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003182524A Expired - Fee Related JP4182825B2 (ja) 2002-07-01 2003-06-26 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材

Country Status (5)

Country Link
US (1) US7247371B2 (enExample)
JP (1) JP4182825B2 (enExample)
CN (1) CN100467386C (enExample)
AU (1) AU2003246172A1 (enExample)
WO (1) WO2004002894A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1827546B (zh) * 2006-02-16 2012-06-20 雷亚林 一种屏蔽红外、远红外线及导电玻璃、陶瓷膜的制备方法
WO2008127409A2 (en) * 2006-11-07 2008-10-23 Ppg Industries Ohio, Inc. Infrared absorber
JP2008230954A (ja) * 2007-02-21 2008-10-02 Sumitomo Metal Mining Co Ltd 日射遮蔽体形成用アンチモン含有酸化錫微粒子の製造方法、日射遮蔽体形成用分散液、日射遮蔽体、および、日射遮蔽用基材
EP1967495B1 (en) 2007-02-21 2012-08-01 Sumitomo Metal Mining Co., Ltd. Manufacturing method for antimony-containing tin oxide fine particles for forming solar radiation shielding body, dispersion for forming solar radiation shielding body, solar radiation sheilding body, and solar radiation shielding base material
WO2009031316A1 (ja) * 2007-09-05 2009-03-12 Kabushiki Kaisha Toshiba 可視光応答型光触媒粉末とそれを用いた可視光応答型の光触媒材料、光触媒塗料および光触媒製品
CN101821005B (zh) * 2007-09-05 2012-09-26 株式会社东芝 可见光响应型光催化剂粉末及其制造方法，以及使用了该粉末的可见光响应型光催化剂材料、光催化剂涂料、光催化剂产品
US9513408B2 (en) 2012-03-29 2016-12-06 Mitsubishi Materials Corporation Antimony-doped tin oxide powder and method of producing the same
JP5740046B2 (ja) * 2012-03-29 2015-06-24 三菱マテリアル株式会社 赤外線カット材
EP2910985B1 (en) * 2012-10-19 2019-05-08 Nippon Kayaku Kabushiki Kaisha Heat-ray-shielding sheet
CN103641157B (zh) * 2013-12-04 2015-08-19 西南交通大学 一种制备低电阻纳米粉体的方法
WO2017057110A1 (ja) * 2015-09-30 2017-04-06 住友金属鉱山株式会社 赤外線吸収微粒子、およびそれを用いた分散液、分散体、合わせ透明基材、フィルム、ガラスと、その製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597043A (ja) * 1982-07-06 1984-01-14 株式会社豊田中央研究所 熱線遮蔽積層体
US5236737A (en) * 1989-08-02 1993-08-17 E. I. Du Pont De Nemours And Company Electroconductive composition and process of preparation
JP2844011B2 (ja) 1990-06-29 1999-01-06 石原産業株式会社 導電性微粉末およびその製造方法
JP2844012B2 (ja) 1990-07-19 1999-01-06 石原産業株式会社 導電性微粉末およびその製造方法
JPH05246710A (ja) 1992-03-04 1993-09-24 Mitsubishi Materials Corp 導電性粉末およびその製造方法
CA2138245A1 (en) * 1992-06-29 1994-01-06 Howard Wayne Jacobson Electroconductive material and process
JPH06183708A (ja) 1992-12-15 1994-07-05 Mitsubishi Materials Corp 導電性白色粉末
JPH06232586A (ja) 1993-01-29 1994-08-19 Sumitomo Cement Co Ltd 電磁波遮蔽膜およびその製造方法
JPH08127860A (ja) 1994-10-31 1996-05-21 Sumitomo Metal Mining Co Ltd 透明導電膜形成用処理液およびその処理液を用いた透明導電膜の作製方法ならびに得られた透明導電膜
US5484694A (en) * 1994-11-21 1996-01-16 Eastman Kodak Company Imaging element comprising an electrically-conductive layer containing antimony-doped tin oxide particles
JP3609159B2 (ja) 1995-06-23 2005-01-12 石原産業株式会社 針状導電性アンチモン含有酸化錫微粉末及びその製造方法
TW440544B (en) * 1994-12-27 2001-06-16 Ishihara Sangyo Kaisha Electroconductive composition
JP3647929B2 (ja) 1995-05-18 2005-05-18 石原産業株式会社 導電性アンチモン含有酸化錫微粉末の製造方法
JPH10101375A (ja) * 1996-09-30 1998-04-21 Sumitomo Metal Mining Co Ltd 日射遮蔽膜用塗布液およびこれを用いた日射遮蔽膜
US5788887A (en) * 1996-11-01 1998-08-04 E. I. Du Pont De Nemours And Company Antimony doped tin oxide electroconductive powder
JP2978146B2 (ja) 1998-03-27 1999-11-15 大塚化学株式会社 導電性粉末及び透明導電性組成物
US6218018B1 (en) * 1998-08-21 2001-04-17 Atofina Chemicals, Inc. Solar control coated glass

Also Published As

Publication number Publication date
CN1639068A (zh) 2005-07-13
US7247371B2 (en) 2007-07-24
CN100467386C (zh) 2009-03-11
JP2004083397A (ja) 2004-03-18
AU2003246172A1 (en) 2004-01-19
WO2004002894A1 (ja) 2004-01-08
US20050163999A1 (en) 2005-07-28

Similar Documents

Publication Publication Date Title
JP4626284B2 (ja) 日射遮蔽体形成用タングステン酸化物微粒子の製造方法、および日射遮蔽体形成用タングステン酸化物微粒子
JP4096277B2 (ja) 日射遮蔽材料、日射遮蔽膜用塗布液、及び、日射遮蔽膜
JP6269780B2 (ja) 混合分散液
JP2005226008A (ja) 日射遮蔽体形成用分散液及び日射遮蔽体並びにその製造方法
JP4182825B2 (ja) 日射遮蔽用アンチモン錫酸化物微粒子とこれを用いた日射遮蔽体形成用分散液および日射遮蔽体並びに日射遮蔽用透明基材
US20090216492A1 (en) Solar radiation shielding member and solar radiation shielding member forming fluid dispersion
JP3262098B2 (ja) 熱線遮蔽材料とこれを用いた熱線遮蔽器材並びに塗布液および熱線遮蔽膜
JP2003176132A (ja) 日射遮蔽用アンチモン錫酸化物粒子および日射遮蔽膜形成用塗布液ならびに日射遮蔽膜
JP5387925B2 (ja) 赤外線遮蔽材料微粒子分散体、赤外線遮蔽体、及び赤外線遮蔽材料微粒子の製造方法、並びに赤外線遮蔽材料微粒子
JP3744188B2 (ja) 熱線遮蔽膜形成用塗布液及び熱線遮蔽膜
JP4200424B2 (ja) 日射遮蔽材料の製造方法、日射遮蔽膜形成用塗布液および日射遮蔽膜並びに日射遮蔽用透明基材
JP2008230954A (ja) 日射遮蔽体形成用アンチモン含有酸化錫微粒子の製造方法、日射遮蔽体形成用分散液、日射遮蔽体、および、日射遮蔽用基材
JP6171733B2 (ja) 熱線遮蔽分散体形成用塗布液および熱線遮蔽体
EP1967495B1 (en) Manufacturing method for antimony-containing tin oxide fine particles for forming solar radiation shielding body, dispersion for forming solar radiation shielding body, solar radiation sheilding body, and solar radiation shielding base material
JP2003215328A (ja) 日射遮蔽用微粒子とこの微粒子を含む日射遮蔽膜形成用塗布液および日射遮蔽膜
JP2002194291A (ja) 日射遮蔽膜形成用塗布液の製造方法
JP2012082109A (ja) 高耐熱性熱線遮蔽体形成用タングステン酸化物微粒子の製造方法、高耐熱性熱線遮蔽体形成用タングステン酸化物微粒子および高耐熱性熱線遮蔽体形成用分散液、並びに高耐熱性熱線遮蔽体
JP4120887B2 (ja) 日射遮蔽用Ｉｎ４Ｓｎ３Ｏ１２複合酸化物微粒子及びその製造方法並びに日射遮蔽膜形成用塗布液及び日射遮蔽膜及び日射遮蔽用基材
JP2004284904A (ja) 日射遮蔽材料の製造方法、日射遮蔽材料、日射遮蔽膜形成用塗布液および日射遮蔽膜
JP2002138271A (ja) 熱線遮蔽用微粒子の製造方法およびこの方法により製造された微粒子を用いた熱線遮蔽膜形成用塗布液の製造方法
JP2003327429A (ja) 日射遮蔽用微粒子とこの微粒子を含む日射遮蔽膜形成用塗布液および日射遮蔽膜
JP2003327917A (ja) 日射遮蔽材料の製造方法とこの日射遮蔽材料を用いた塗布液並びに日射遮蔽膜
JP2002201027A (ja) 日射遮蔽用インジウム錫酸化物微粒子とその製造方法およびこれを用いた塗布液および日射遮蔽膜
JP2005231974A (ja) 日射遮蔽体と日射遮蔽複合体および日射遮蔽体または日射遮蔽複合体の製造に適用される分散液
HK1124303B (en) Manufacturing method for antimony-containing tin oxide fine particles for forming solar radiation shielding body, dispersion for forming solar radiation shielding body, solar radiation shielding body, and solar radiation shielding base material

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041222

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080401

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20080528

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20080602

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080627

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20080812

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20080825

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110912

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4182825

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110912

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120912

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130912

Year of fee payment: 5

LAPS Cancellation because of no payment of annual fees