JP4108243B2 - 感光性樹脂積層体 - Google Patents
感光性樹脂積層体 Download PDFInfo
- Publication number
- JP4108243B2 JP4108243B2 JP2000019857A JP2000019857A JP4108243B2 JP 4108243 B2 JP4108243 B2 JP 4108243B2 JP 2000019857 A JP2000019857 A JP 2000019857A JP 2000019857 A JP2000019857 A JP 2000019857A JP 4108243 B2 JP4108243 B2 JP 4108243B2
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- acrylate
- resin layer
- meth
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Materials For Photolithography (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000019857A JP4108243B2 (ja) | 1999-04-14 | 2000-01-28 | 感光性樹脂積層体 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11-107200 | 1999-04-14 | ||
| JP10720099 | 1999-04-14 | ||
| JP2000019857A JP4108243B2 (ja) | 1999-04-14 | 2000-01-28 | 感光性樹脂積層体 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000356852A JP2000356852A (ja) | 2000-12-26 |
| JP2000356852A5 JP2000356852A5 (enExample) | 2007-02-08 |
| JP4108243B2 true JP4108243B2 (ja) | 2008-06-25 |
Family
ID=26447250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000019857A Expired - Lifetime JP4108243B2 (ja) | 1999-04-14 | 2000-01-28 | 感光性樹脂積層体 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4108243B2 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2003057821A (ja) * | 2001-08-13 | 2003-02-28 | Showa Highpolymer Co Ltd | 感光性樹脂および感光性樹脂組成物 |
| WO2003042758A1 (fr) * | 2001-11-12 | 2003-05-22 | Asahi Kasei Emd Corporation | Composition de resine photosensible et applications correspondantes |
| KR100521999B1 (ko) * | 2002-09-03 | 2005-10-18 | 주식회사 코오롱 | 샌드블래스트 레지스트용 감광성수지 조성물 |
| JP2005031639A (ja) * | 2003-06-16 | 2005-02-03 | Hitachi Chem Co Ltd | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法、プリント配線板の製造法、並びにプリント配線板、及びそれを用いた電子部品 |
| JP4632117B2 (ja) * | 2004-07-27 | 2011-02-16 | 日立化成工業株式会社 | 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法 |
| MY207705A (en) * | 2019-10-16 | 2025-03-13 | Resonac Corp | Photosensitive resin film, resist pattern forming method, and wiring pattern forming method |
| JPWO2022201432A1 (enExample) | 2021-03-25 | 2022-09-29 | ||
| WO2023238202A1 (ja) | 2022-06-06 | 2023-12-14 | 株式会社レゾナック | 感光性エレメント、及び、レジストパターンの形成方法 |
| JP2024087194A (ja) | 2022-12-19 | 2024-07-01 | 株式会社レゾナック | 感光性エレメント、及び、レジストパターンの形成方法 |
-
2000
- 2000-01-28 JP JP2000019857A patent/JP4108243B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000356852A (ja) | 2000-12-26 |
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