JP4106701B2 - 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法 - Google Patents

回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法 Download PDF

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Publication number
JP4106701B2
JP4106701B2 JP2001378001A JP2001378001A JP4106701B2 JP 4106701 B2 JP4106701 B2 JP 4106701B2 JP 2001378001 A JP2001378001 A JP 2001378001A JP 2001378001 A JP2001378001 A JP 2001378001A JP 4106701 B2 JP4106701 B2 JP 4106701B2
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Prior art keywords
optical
axis
diffractive optical
diffractive
optical member
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Expired - Lifetime
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JP2001378001A
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English (en)
Japanese (ja)
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JP2003178951A5 (enExample
JP2003178951A (ja
Inventor
光紀 豊田
修 谷津
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Nikon Corp
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Nikon Corp
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Priority to JP2001378001A priority Critical patent/JP4106701B2/ja
Priority to TW091125068A priority patent/TW567406B/zh
Priority to KR10-2004-7009094A priority patent/KR20040074077A/ko
Priority to PCT/JP2002/012729 priority patent/WO2003050856A1/ja
Priority to AU2002354091A priority patent/AU2002354091A1/en
Publication of JP2003178951A publication Critical patent/JP2003178951A/ja
Priority to US10/860,161 priority patent/US7095560B2/en
Publication of JP2003178951A5 publication Critical patent/JP2003178951A5/ja
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Publication of JP4106701B2 publication Critical patent/JP4106701B2/ja
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2001378001A 2001-12-12 2001-12-12 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法 Expired - Lifetime JP4106701B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2001378001A JP4106701B2 (ja) 2001-12-12 2001-12-12 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法
TW091125068A TW567406B (en) 2001-12-12 2002-10-25 Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
PCT/JP2002/012729 WO2003050856A1 (en) 2001-12-12 2002-12-04 Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
AU2002354091A AU2002354091A1 (en) 2001-12-12 2002-12-04 Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
KR10-2004-7009094A KR20040074077A (ko) 2001-12-12 2002-12-04 회절 광학 장치, 굴절 광학 장치, 조명 광학 장치, 노광장치 및 노광 방법
US10/860,161 US7095560B2 (en) 2001-12-12 2004-06-04 Diffractive optical device, refractive optical device, illumination optical system, exposure apparatus and exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001378001A JP4106701B2 (ja) 2001-12-12 2001-12-12 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法

Publications (3)

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JP2003178951A JP2003178951A (ja) 2003-06-27
JP2003178951A5 JP2003178951A5 (enExample) 2005-08-18
JP4106701B2 true JP4106701B2 (ja) 2008-06-25

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JP2001378001A Expired - Lifetime JP4106701B2 (ja) 2001-12-12 2001-12-12 回折光学装置、屈折光学装置、照明光学装置、露光装置および露光方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019225830A1 (ko) * 2018-05-23 2019-11-28 한화정밀기계 주식회사 웨이퍼 가공 장치

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100685743B1 (ko) 2005-06-22 2007-02-22 삼성전자주식회사 광학 부재 홀더 및 이를 갖는 투영 노광 장치
EP2614298B1 (en) * 2010-09-10 2016-11-09 Martin Professional ApS Illumination device with split beam effect
WO2012089224A1 (en) * 2010-12-28 2012-07-05 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019225830A1 (ko) * 2018-05-23 2019-11-28 한화정밀기계 주식회사 웨이퍼 가공 장치

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JP2003178951A (ja) 2003-06-27

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