JP4078683B2 - 投影露光装置及び投影露光方法並びに走査露光方法 - Google Patents

投影露光装置及び投影露光方法並びに走査露光方法 Download PDF

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Publication number
JP4078683B2
JP4078683B2 JP33284796A JP33284796A JP4078683B2 JP 4078683 B2 JP4078683 B2 JP 4078683B2 JP 33284796 A JP33284796 A JP 33284796A JP 33284796 A JP33284796 A JP 33284796A JP 4078683 B2 JP4078683 B2 JP 4078683B2
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JP
Japan
Prior art keywords
stage
substrate
exposure
wafer
sensitive substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP33284796A
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English (en)
Japanese (ja)
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JPH10163100A5 (enrdf_load_html_response
JPH10163100A (ja
Inventor
健爾 西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP33284796A priority Critical patent/JP4078683B2/ja
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to SG200005339A priority patent/SG93267A1/en
Priority to CNB011216433A priority patent/CN1244021C/zh
Priority to AU50678/98A priority patent/AU5067898A/en
Priority to DE69738910T priority patent/DE69738910D1/de
Priority to CNB011176660A priority patent/CN1244019C/zh
Priority to IL13013797A priority patent/IL130137A/xx
Priority to AT97913467T priority patent/ATE404906T1/de
Priority to EP97913467A priority patent/EP0951054B1/en
Priority to SG200103143A priority patent/SG102627A1/en
Priority to CNB011216425A priority patent/CN1244020C/zh
Priority to SG200103141A priority patent/SG88823A1/en
Priority to HK00103393.7A priority patent/HK1024104B/xx
Priority to PCT/JP1997/004350 priority patent/WO1998024115A1/ja
Priority to SG200103142A priority patent/SG88824A1/en
Priority to EP08005700A priority patent/EP1944654A3/en
Priority to KR1020017006773A priority patent/KR20030096435A/ko
Priority to CNB011176652A priority patent/CN1244018C/zh
Priority to CNB971811172A priority patent/CN1144263C/zh
Publication of JPH10163100A publication Critical patent/JPH10163100A/ja
Priority to KR1019997004747A priority patent/KR100315249B1/ko
Priority to KR1019997004939A priority patent/KR100314557B1/ko
Priority to US09/666,407 priority patent/US6400441B1/en
Priority to US09/714,620 priority patent/US6549269B1/en
Priority to US09/714,943 priority patent/US6341007B1/en
Priority to US09/716,405 priority patent/US6590634B1/en
Priority to KR1020017006772A priority patent/KR100315251B1/ko
Priority to KR1020017006771A priority patent/KR100315250B1/ko
Priority to US10/024,147 priority patent/US6798491B2/en
Priority to KR1020020072335A priority patent/KR20060086496A/ko
Priority to KR1020020072333A priority patent/KR20060086495A/ko
Priority to US10/879,144 priority patent/US7177008B2/en
Publication of JPH10163100A5 publication Critical patent/JPH10163100A5/ja
Priority to US11/647,492 priority patent/US7256869B2/en
Application granted granted Critical
Publication of JP4078683B2 publication Critical patent/JP4078683B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP33284796A 1996-11-28 1996-11-28 投影露光装置及び投影露光方法並びに走査露光方法 Expired - Lifetime JP4078683B2 (ja)

Priority Applications (32)

Application Number Priority Date Filing Date Title
JP33284796A JP4078683B2 (ja) 1996-11-28 1996-11-28 投影露光装置及び投影露光方法並びに走査露光方法
IL13013797A IL130137A (en) 1996-11-28 1997-11-28 Exposure apparatus and an exposure method
AU50678/98A AU5067898A (en) 1996-11-28 1997-11-28 Aligner and method for exposure
DE69738910T DE69738910D1 (de) 1996-11-28 1997-11-28 Ausrichtvorrichtung und belichtungsverfahren
CNB011176660A CN1244019C (zh) 1996-11-28 1997-11-28 曝光装置以及曝光方法
CNB011176652A CN1244018C (zh) 1996-11-28 1997-11-28 曝光方法和曝光装置
AT97913467T ATE404906T1 (de) 1996-11-28 1997-11-28 Ausrichtvorrichtung und belichtungsverfahren
EP97913467A EP0951054B1 (en) 1996-11-28 1997-11-28 Aligner and method for exposure
SG200103143A SG102627A1 (en) 1996-11-28 1997-11-28 Lithographic device
CNB011216425A CN1244020C (zh) 1996-11-28 1997-11-28 曝光装置
SG200103141A SG88823A1 (en) 1996-11-28 1997-11-28 Projection exposure apparatus
HK00103393.7A HK1024104B (en) 1996-11-28 1997-11-28 Aligner and method for exposure
PCT/JP1997/004350 WO1998024115A1 (fr) 1996-11-28 1997-11-28 Dispositif d'alignement et procede d'exposition
CNB011216433A CN1244021C (zh) 1996-11-28 1997-11-28 光刻装置和曝光方法
EP08005700A EP1944654A3 (en) 1996-11-28 1997-11-28 An exposure apparatus and an exposure method
KR1020017006773A KR20030096435A (ko) 1996-11-28 1997-11-28 노광장치 및 노광방법
SG200005339A SG93267A1 (en) 1996-11-28 1997-11-28 An exposure apparatus and an exposure method
CNB971811172A CN1144263C (zh) 1996-11-28 1997-11-28 曝光装置以及曝光方法
SG200103142A SG88824A1 (en) 1996-11-28 1997-11-28 Projection exposure method
KR1019997004747A KR100315249B1 (ko) 1996-11-28 1999-05-28 노광장치 및 노광방법
KR1019997004939A KR100314557B1 (ko) 1996-11-28 1999-06-03 노광장치 및 노광방법
US09/666,407 US6400441B1 (en) 1996-11-28 2000-09-20 Projection exposure apparatus and method
US09/714,620 US6549269B1 (en) 1996-11-28 2000-11-17 Exposure apparatus and an exposure method
US09/714,943 US6341007B1 (en) 1996-11-28 2000-11-20 Exposure apparatus and method
US09/716,405 US6590634B1 (en) 1996-11-28 2000-11-21 Exposure apparatus and method
KR1020017006772A KR100315251B1 (ko) 1996-11-28 2001-05-30 노광장치 및 노광방법
KR1020017006771A KR100315250B1 (ko) 1996-11-28 2001-05-30 노광장치 및 노광방법
US10/024,147 US6798491B2 (en) 1996-11-28 2001-12-21 Exposure apparatus and an exposure method
KR1020020072335A KR20060086496A (ko) 1996-11-28 2002-11-20 노광장치 및 노광방법
KR1020020072333A KR20060086495A (ko) 1996-11-28 2002-11-20 노광장치 및 노광방법
US10/879,144 US7177008B2 (en) 1996-11-28 2004-06-30 Exposure apparatus and method
US11/647,492 US7256869B2 (en) 1996-11-28 2006-12-29 Exposure apparatus and an exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33284796A JP4078683B2 (ja) 1996-11-28 1996-11-28 投影露光装置及び投影露光方法並びに走査露光方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2007112522A Division JP4029360B2 (ja) 2007-04-23 2007-04-23 投影露光装置及び投影露光方法並びに走査露光方法

Publications (3)

Publication Number Publication Date
JPH10163100A JPH10163100A (ja) 1998-06-19
JPH10163100A5 JPH10163100A5 (enrdf_load_html_response) 2005-08-11
JP4078683B2 true JP4078683B2 (ja) 2008-04-23

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JP33284796A Expired - Lifetime JP4078683B2 (ja) 1996-11-28 1996-11-28 投影露光装置及び投影露光方法並びに走査露光方法

Country Status (1)

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JP (1) JP4078683B2 (enrdf_load_html_response)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7023521B2 (en) 1999-04-13 2006-04-04 Nikon Corporation Exposure apparatus, exposure method and process for producing device
US7301605B2 (en) 2000-03-03 2007-11-27 Nikon Corporation Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
KR100532760B1 (ko) * 2003-12-31 2005-12-01 동부아남반도체 주식회사 스텝퍼에서 공정시간 단축을 위한 노광 시퀀스 설정 방법
JP5084432B2 (ja) * 2007-10-05 2012-11-28 キヤノン株式会社 露光方法、露光装置およびデバイス製造方法
US20090153824A1 (en) * 2007-12-17 2009-06-18 Kla-Tencor Corporation Multiple chuck scanning stage
JP7114370B2 (ja) * 2018-06-29 2022-08-08 キヤノン株式会社 露光装置および物品の製造方法
JP2020052075A (ja) * 2018-09-21 2020-04-02 株式会社Ｓｃｒｅｅｎホールディングス 描画装置および描画方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61263123A (ja) * 1985-05-16 1986-11-21 Canon Inc ステップアンドリピート露光方法
JPS6387725A (ja) * 1986-10-01 1988-04-19 Sumitomo Heavy Ind Ltd ステ−ジ移動機構
JPS63261850A (ja) * 1987-04-20 1988-10-28 Fujitsu Ltd 縦型ｘ−ｙステ−ジ
JP2580651B2 (ja) * 1987-12-18 1997-02-12 株式会社ニコン 投影露光装置及び露光方法
JPH02126629A (ja) * 1988-11-07 1990-05-15 Canon Inc 投影露光装置
JP3203719B2 (ja) * 1991-12-26 2001-08-27 株式会社ニコン 露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
JP3202308B2 (ja) * 1992-02-21 2001-08-27 キヤノン株式会社 複合位置決め装置
JP2887033B2 (ja) * 1992-11-19 1999-04-26 キヤノン株式会社 精密位置決め装置
JP3218484B2 (ja) * 1992-12-25 2001-10-15 株式会社ニコン 投影露光装置、露光方法、及び該方法を用いる半導体製造方法
JP3451606B2 (ja) * 1994-12-08 2003-09-29 株式会社ニコン 投影露光装置
JP3387074B2 (ja) * 1993-12-08 2003-03-17 株式会社ニコン 走査露光方法、及び走査型露光装置
JPH07200009A (ja) * 1993-12-28 1995-08-04 Canon Inc 位置決め装置
US5715064A (en) * 1994-06-17 1998-02-03 International Business Machines Corporation Step and repeat apparatus having enhanced accuracy and increased throughput
JP3572430B2 (ja) * 1994-11-29 2004-10-06 株式会社ニコン 露光方法及びその装置

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Publication number Publication date
JPH10163100A (ja) 1998-06-19

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