JP4045870B2 - 光学素子作製方法、これに用いる電着液および光学素子製造装置 - Google Patents

光学素子作製方法、これに用いる電着液および光学素子製造装置 Download PDF

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Publication number
JP4045870B2
JP4045870B2 JP2002179857A JP2002179857A JP4045870B2 JP 4045870 B2 JP4045870 B2 JP 4045870B2 JP 2002179857 A JP2002179857 A JP 2002179857A JP 2002179857 A JP2002179857 A JP 2002179857A JP 4045870 B2 JP4045870 B2 JP 4045870B2
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Japan
Prior art keywords
optical element
thin film
substrate
functional material
electrodeposition
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Expired - Fee Related
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JP2002179857A
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English (en)
Japanese (ja)
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JP2004021196A (ja
Inventor
敬司 清水
茂実 大津
和敏 谷田
英一 圷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Fujifilm Business Innovation Corp
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Publication date
Application filed by Fuji Xerox Co Ltd, Fujifilm Business Innovation Corp filed Critical Fuji Xerox Co Ltd
Priority to JP2002179857A priority Critical patent/JP4045870B2/ja
Priority to CNB031093779A priority patent/CN1299135C/zh
Priority to US10/461,342 priority patent/US20030234180A1/en
Publication of JP2004021196A publication Critical patent/JP2004021196A/ja
Application granted granted Critical
Publication of JP4045870B2 publication Critical patent/JP4045870B2/ja
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Expired - Fee Related legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/44—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications
    • C09D5/448—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for electrophoretic applications characterised by the additives used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/12—Electroforming by electrophoresis
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C25D1/20—Separation of the formed objects from the electrodes with no destruction of said electrodes
    • C25D1/22—Separating compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D13/00—Electrophoretic coating characterised by the process
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/061—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-optical organic material
    • G02F1/065—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on electro-optical organic material in an optical waveguide structure
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2202/00—Materials and properties
    • G02F2202/36—Micro- or nanomaterials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Electrochemistry (AREA)
  • Molecular Biology (AREA)
  • Health & Medical Sciences (AREA)
  • Nanotechnology (AREA)
  • Wood Science & Technology (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Biophysics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Optical Filters (AREA)
  • Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
JP2002179857A 2002-06-20 2002-06-20 光学素子作製方法、これに用いる電着液および光学素子製造装置 Expired - Fee Related JP4045870B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2002179857A JP4045870B2 (ja) 2002-06-20 2002-06-20 光学素子作製方法、これに用いる電着液および光学素子製造装置
CNB031093779A CN1299135C (zh) 2002-06-20 2003-04-08 光学元件制作方法与用于此的沉积液及光学元件制造装置
US10/461,342 US20030234180A1 (en) 2002-06-20 2003-06-16 Process for preparation of optical element, electrolytic solution used for the same and apparatus for preparation of optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002179857A JP4045870B2 (ja) 2002-06-20 2002-06-20 光学素子作製方法、これに用いる電着液および光学素子製造装置

Publications (2)

Publication Number Publication Date
JP2004021196A JP2004021196A (ja) 2004-01-22
JP4045870B2 true JP4045870B2 (ja) 2008-02-13

Family

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JP2002179857A Expired - Fee Related JP4045870B2 (ja) 2002-06-20 2002-06-20 光学素子作製方法、これに用いる電着液および光学素子製造装置

Country Status (3)

Country Link
US (1) US20030234180A1 (zh)
JP (1) JP4045870B2 (zh)
CN (1) CN1299135C (zh)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7829147B2 (en) 2005-08-18 2010-11-09 Corning Incorporated Hermetically sealing a device without a heat treating step and the resulting hermetically sealed device
US20080206589A1 (en) * 2007-02-28 2008-08-28 Bruce Gardiner Aitken Low tempertature sintering using Sn2+ containing inorganic materials to hermetically seal a device
US7722929B2 (en) 2005-08-18 2010-05-25 Corning Incorporated Sealing technique for decreasing the time it takes to hermetically seal a device and the resulting hermetically sealed device
US20070040501A1 (en) 2005-08-18 2007-02-22 Aitken Bruce G Method for inhibiting oxygen and moisture degradation of a device and the resulting device
US20080048178A1 (en) * 2006-08-24 2008-02-28 Bruce Gardiner Aitken Tin phosphate barrier film, method, and apparatus
JP5145900B2 (ja) * 2006-11-22 2013-02-20 三菱化学株式会社 導光部材、光導波路および導光板
CN102822247B (zh) 2010-04-14 2016-06-08 3M创新有限公司 图案化梯度聚合物膜和方法
CN102331596B (zh) * 2011-10-09 2013-12-04 华映视讯（吴江）有限公司 彩色树脂组合物与形成多色彩色滤光片的方法
CN103088382B (zh) * 2013-03-01 2016-02-17 浙江大学 一种光控局部电沉积二氧化硅薄膜的制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH667361GA3 (zh) * 1986-02-04 1988-10-14
US5158653A (en) * 1988-09-26 1992-10-27 Lashmore David S Method for production of predetermined concentration graded alloys
JP3262466B2 (ja) * 1994-12-07 2002-03-04 キヤノン株式会社 現像スリーブ及び現像装置
JP3794073B2 (ja) * 1996-09-19 2006-07-05 富士ゼロックス株式会社 光起電力を用いた画像形成方法及び画像形成部材
US6309782B1 (en) * 1997-10-29 2001-10-30 Fuji Xerox Co., Ltd. Color filter and method for manufacturing the same
JP3152192B2 (ja) * 1997-12-16 2001-04-03 富士ゼロックス株式会社 画像形成方法及びそれに用いる画像形成装置
US6132587A (en) * 1998-10-19 2000-10-17 Jorne; Jacob Uniform electroplating of wafers
US6720119B2 (en) * 2000-07-27 2004-04-13 Fuji Xerox Co., Ltd. Method of fabricating high-dielectric color filter
CN1138023C (zh) * 2001-05-31 2004-02-11 北京科技大学 一种制备氧化物陶瓷涂层的阴极微弧电沉积方法

Also Published As

Publication number Publication date
CN1467512A (zh) 2004-01-14
US20030234180A1 (en) 2003-12-25
CN1299135C (zh) 2007-02-07
JP2004021196A (ja) 2004-01-22

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