JP4009044B2 - 薄膜複屈折素子及びその製造方法及び製造装置 - Google Patents
薄膜複屈折素子及びその製造方法及び製造装置 Download PDFInfo
- Publication number
- JP4009044B2 JP4009044B2 JP28843099A JP28843099A JP4009044B2 JP 4009044 B2 JP4009044 B2 JP 4009044B2 JP 28843099 A JP28843099 A JP 28843099A JP 28843099 A JP28843099 A JP 28843099A JP 4009044 B2 JP4009044 B2 JP 4009044B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- substrate
- thin
- birefringent element
- birefringence
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims description 185
- 238000004519 manufacturing process Methods 0.000 title claims description 69
- 238000000034 method Methods 0.000 title claims description 27
- 239000010408 film Substances 0.000 claims description 351
- 239000000758 substrate Substances 0.000 claims description 303
- 238000001704 evaporation Methods 0.000 claims description 107
- 238000007740 vapor deposition Methods 0.000 claims description 101
- 230000008020 evaporation Effects 0.000 claims description 79
- 230000003287 optical effect Effects 0.000 claims description 67
- 239000000126 substance Substances 0.000 claims description 56
- 230000008021 deposition Effects 0.000 claims description 48
- 239000000463 material Substances 0.000 claims description 43
- 230000007613 environmental effect Effects 0.000 claims description 35
- 239000012788 optical film Substances 0.000 claims description 27
- 239000002356 single layer Substances 0.000 claims description 25
- 230000033001 locomotion Effects 0.000 claims description 24
- 238000012544 monitoring process Methods 0.000 claims description 14
- 238000010438 heat treatment Methods 0.000 claims description 13
- 239000011248 coating agent Substances 0.000 claims description 9
- 238000000576 coating method Methods 0.000 claims description 9
- 238000005224 laser annealing Methods 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 230000001360 synchronised effect Effects 0.000 claims description 3
- 238000000151 deposition Methods 0.000 description 43
- 238000009826 distribution Methods 0.000 description 27
- 239000007789 gas Substances 0.000 description 18
- 150000002500 ions Chemical class 0.000 description 16
- 230000003595 spectral effect Effects 0.000 description 14
- 238000010586 diagram Methods 0.000 description 11
- 238000010521 absorption reaction Methods 0.000 description 10
- 238000002834 transmittance Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 7
- 239000000853 adhesive Substances 0.000 description 6
- 230000001070 adhesive effect Effects 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 238000000137 annealing Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000006117 anti-reflective coating Substances 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000002173 cutting fluid Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910021532 Calcite Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Images
Landscapes
- Polarising Elements (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28843099A JP4009044B2 (ja) | 1999-10-08 | 1999-10-08 | 薄膜複屈折素子及びその製造方法及び製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28843099A JP4009044B2 (ja) | 1999-10-08 | 1999-10-08 | 薄膜複屈折素子及びその製造方法及び製造装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001108832A JP2001108832A (ja) | 2001-04-20 |
| JP2001108832A5 JP2001108832A5 (enExample) | 2006-11-24 |
| JP4009044B2 true JP4009044B2 (ja) | 2007-11-14 |
Family
ID=17730123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28843099A Expired - Fee Related JP4009044B2 (ja) | 1999-10-08 | 1999-10-08 | 薄膜複屈折素子及びその製造方法及び製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4009044B2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9376744B2 (en) | 2011-05-16 | 2016-06-28 | Dexerials Corporation | Phase-difference element having birefringent film containing TiO2 and Ta2O5 |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2003248124A1 (en) * | 2003-07-25 | 2005-02-14 | Fujitsu Limited | Optical filter, imager, and method for manufacturing optical filter |
| JP2007025572A (ja) * | 2005-07-21 | 2007-02-01 | Fujifilm Holdings Corp | 偏光ビームスプリッタ及び反射型液晶プロジェクタ |
| CN100413995C (zh) * | 2005-10-27 | 2008-08-27 | 中山大学 | 一种光学镀膜偏振光谱监控系统 |
| EP1796400A1 (en) * | 2005-12-06 | 2007-06-13 | JDS Uniphase Corporation | Thin-film optical retarders |
| JP2009075459A (ja) | 2007-09-21 | 2009-04-09 | Fujifilm Corp | 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ |
| JP2009161843A (ja) * | 2008-01-10 | 2009-07-23 | Fujinon Corp | ワーク支持部材、光学素子、位相差素子及び偏光ビームスプリッタ |
| JP2012008363A (ja) * | 2010-06-25 | 2012-01-12 | Sony Chemical & Information Device Corp | 波長板の製造方法 |
| JP5318079B2 (ja) * | 2010-12-08 | 2013-10-16 | 富士フイルム株式会社 | 二軸性複屈折体の製造方法 |
| JP2014149316A (ja) * | 2011-06-02 | 2014-08-21 | Asahi Glass Co Ltd | 位相差板の製造方法および位相差板 |
| JP7491117B2 (ja) * | 2020-07-23 | 2024-05-28 | セイコーエプソン株式会社 | 液晶装置および電子機器 |
| CN113488603B (zh) * | 2021-07-07 | 2023-08-25 | 业成科技（成都）有限公司 | 光学显示装置的制作方法 |
| CN113337802A (zh) * | 2021-07-14 | 2021-09-03 | 苏州佑伦真空设备科技有限公司 | 一种无死角的视窗 |
| JP2023098288A (ja) * | 2021-12-28 | 2023-07-10 | 富士フイルム株式会社 | 位相差補償素子、液晶表示素子及び液晶プロジェクタ |
-
1999
- 1999-10-08 JP JP28843099A patent/JP4009044B2/ja not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9376744B2 (en) | 2011-05-16 | 2016-06-28 | Dexerials Corporation | Phase-difference element having birefringent film containing TiO2 and Ta2O5 |
| US9946001B2 (en) | 2011-05-16 | 2018-04-17 | Dexerials Corporation | Phase difference element having birefringent film containing titanium oxide tantalum oxide |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2001108832A (ja) | 2001-04-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4009044B2 (ja) | 薄膜複屈折素子及びその製造方法及び製造装置 | |
| US20210255377A1 (en) | 3d identification filter | |
| KR100389756B1 (ko) | 광 헤드 | |
| EP0103485B1 (en) | Processes for manufacturing double refraction plates and double refraction plates made by such processes | |
| JPH11241162A (ja) | 光学的にモニタできるスパッタリング方法及びそのための装置 | |
| US9946001B2 (en) | Phase difference element having birefringent film containing titanium oxide tantalum oxide | |
| US20190169739A1 (en) | An interference coating or its part consisting layers with different porosity | |
| JP3458763B2 (ja) | 複屈折板 | |
| JP3745790B2 (ja) | 光情報記録媒体の製造装置及び製造方法 | |
| JP2001108832A5 (enExample) | ||
| US20200165716A1 (en) | Film forming method and film forming apparatus | |
| JPH05134115A (ja) | 複屈折部材 | |
| CN116590683B (zh) | 一种光学薄膜及其制备方法、光学薄膜元件 | |
| JPS63106703A (ja) | 光学素子 | |
| JP2009007651A (ja) | 減光フィルタの成膜方法、減光フィルタの製造装置及びこれを用いた減光フィルタ並びに撮像光量絞り装置 | |
| JPH1123840A (ja) | 複屈折板 | |
| JPH09296265A (ja) | 斜め蒸着膜の製造方法 | |
| JP2002258035A (ja) | 多層膜カットフィルター及びその製造方法 | |
| JPS58223101A (ja) | 多面鏡の製造方法 | |
| JPH11337733A (ja) | 複屈折板及びその作製方法 | |
| JP4502540B2 (ja) | 光学多層膜干渉フィルタの作製装置および作製方法 | |
| JPS63144306A (ja) | 誘電体多層膜及びその製造方法 | |
| JPH05323119A (ja) | 複屈折光学素子およびその製造方法 | |
| JP5171214B2 (ja) | フォトニック結晶を用いた波長板の製造方法 | |
| CN120143328B (zh) | 光学相位延迟反射膜及其镀制方法、卡具 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061005 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061005 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070410 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070611 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070821 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070831 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100907 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 4009044 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130907 Year of fee payment: 6 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |