JP3965191B2 - 蛍光x線分析装置およびそれに用いるプログラム - Google Patents
蛍光x線分析装置およびそれに用いるプログラム Download PDFInfo
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- JP3965191B2 JP3965191B2 JP2005109503A JP2005109503A JP3965191B2 JP 3965191 B2 JP3965191 B2 JP 3965191B2 JP 2005109503 A JP2005109503 A JP 2005109503A JP 2005109503 A JP2005109503 A JP 2005109503A JP 3965191 B2 JP3965191 B2 JP 3965191B2
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/305—Accessories, mechanical or electrical features computer simulations
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- Analysing Materials By The Use Of Radiation (AREA)
Description
2 1次X線
4 2次X線(蛍光X線、散乱線)
9 検出手段
10 算出手段
13 試料
13a 試料表面
φ 入射角
ψ 散乱角
Claims (5)
- 試料に1次X線を照射するX線源と、
試料から発生する2次X線の強度を測定する検出手段と、
仮定した組成に基づいて、試料中の各元素から発生する2次X線の理論強度を計算し、その理論強度と前記検出手段で測定した測定強度を理論強度スケールに換算した換算測定強度とが一致するように、前記仮定した組成を逐次近似的に修正計算して、試料の組成を算出する算出手段とを備えた蛍光X線分析装置において、
前記算出手段が、前記理論強度を計算するにあたり、試料の大きさ、ならびに試料表面の各位置に照射される1次X線の強度および入射角をパラメータとして、1次X線の発生位置、方向を乱数で決めて試料表面まで1次X線を進行させた光路ごとに2次X線の理論強度をシミュレーション計算することを特徴とする蛍光X線分析装置。 - 請求項1において、
前記算出手段が、複数の前記仮定した組成について、前記理論強度を同時に計算する蛍光X線分析装置。 - 請求項1または2において、
前記算出手段が、あらかじめ求められた試料表面における1次X線の入射角分布または散乱角分布を用いる蛍光X線分析装置。 - 請求項1から3までのいずれか一項において、
試料表面の高さを測るための目盛りが設けられた試料容器を備えた蛍光X線分析装置。 - 請求項1から4までのいずれか一項に記載の蛍光X線分析装置が備えるコンピュータを前記算出手段として機能させるためのプログラム。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005109503A JP3965191B2 (ja) | 2005-04-06 | 2005-04-06 | 蛍光x線分析装置およびそれに用いるプログラム |
EP05814603A EP1870699A4 (en) | 2005-04-06 | 2005-12-08 | X-RAY FLUORESCENCE SPECTROSCOPE AND PROGRAM USED BY THIS SPECTROSCOPE |
US11/910,510 US7961842B2 (en) | 2005-04-06 | 2005-12-08 | X-ray fluorescence spectrometer and program used therein |
CN2005800493510A CN101151524B (zh) | 2005-04-06 | 2005-12-08 | 荧光x射线分析装置和其所采用的程序 |
PCT/JP2005/022552 WO2006112084A1 (ja) | 2005-04-06 | 2005-12-08 | 蛍光x線分析装置およびそれに用いるプログラム |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005109503A JP3965191B2 (ja) | 2005-04-06 | 2005-04-06 | 蛍光x線分析装置およびそれに用いるプログラム |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006292399A JP2006292399A (ja) | 2006-10-26 |
JP3965191B2 true JP3965191B2 (ja) | 2007-08-29 |
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ID=37114826
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2005109503A Active JP3965191B2 (ja) | 2005-04-06 | 2005-04-06 | 蛍光x線分析装置およびそれに用いるプログラム |
Country Status (5)
Country | Link |
---|---|
US (1) | US7961842B2 (ja) |
EP (1) | EP1870699A4 (ja) |
JP (1) | JP3965191B2 (ja) |
CN (1) | CN101151524B (ja) |
WO (1) | WO2006112084A1 (ja) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5448347B2 (ja) * | 2008-01-29 | 2014-03-19 | 三菱重工業株式会社 | 爆発物検査装置 |
JP5276382B2 (ja) * | 2008-08-28 | 2013-08-28 | 株式会社リガク | 蛍光x線分析装置 |
JP2011099749A (ja) * | 2009-11-05 | 2011-05-19 | Horiba Ltd | 濃度計測方法及び蛍光x線分析装置 |
JP5634763B2 (ja) * | 2010-06-21 | 2014-12-03 | 株式会社堀場製作所 | 蛍光x線分析装置及びコンピュータプログラム |
CN102226774B (zh) * | 2011-03-31 | 2013-08-07 | 广东出入境检验检疫局检验检疫技术中心 | 多功能x射线荧光能谱仪样品盘及其检测方法 |
WO2015056305A1 (ja) * | 2013-10-15 | 2015-04-23 | 株式会社島津製作所 | 蛍光x線分析方法及び蛍光x線分析装置 |
WO2015056304A1 (ja) * | 2013-10-15 | 2015-04-23 | 株式会社島津製作所 | 蛍光x線分析方法及び蛍光x線分析装置 |
CN112378938A (zh) * | 2015-08-10 | 2021-02-19 | 株式会社理学 | 荧光x射线分析装置 |
CN110312928B (zh) * | 2017-03-15 | 2021-03-26 | 株式会社理学 | 荧光x射线分析方法以及荧光x射线分析装置 |
CN112461876B (zh) * | 2019-09-06 | 2022-10-28 | 余姚舜宇智能光学技术有限公司 | 基于能量色散荧光x光谱仪的待测样品参数检测方法及其检测系统 |
JP6944730B2 (ja) * | 2020-02-12 | 2021-10-06 | 株式会社リガク | 定量分析方法、定量分析プログラム及び蛍光x線分析装置 |
JP7249666B2 (ja) | 2020-10-30 | 2023-03-31 | 株式会社リガク | 蛍光x線分析装置 |
EP4276452B1 (en) * | 2022-05-13 | 2024-07-03 | Bruker AXS GmbH | System and method for determining mass fractions in a test sample with wave-length dispersive x-ray fluorescence spectrometers |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS53136888A (en) * | 1978-04-28 | 1978-11-29 | Horiba Ltd | Sample cell |
JP2853261B2 (ja) * | 1989-05-16 | 1999-02-03 | 三菱マテリアル株式会社 | 金属分析方法および分析装置 |
US6130931A (en) * | 1998-09-17 | 2000-10-10 | Process Control, Inc. | X-ray fluorescence elemental analyzer |
US6292532B1 (en) * | 1998-12-28 | 2001-09-18 | Rigaku Industrial Corporation | Fluorescent X-ray analyzer useable as wavelength dispersive type and energy dispersive type |
JP3889187B2 (ja) | 1999-09-09 | 2007-03-07 | 株式会社リガク | 蛍光x線分析方法およびその装置 |
DE10159828B4 (de) * | 2001-12-06 | 2007-09-20 | Rigaku Industrial Corporation, Takatsuki | Röntgenfluoreszenzspektrometer |
JP2003297891A (ja) * | 2002-01-31 | 2003-10-17 | Rigaku Industrial Co | 半導体用蛍光x線分析装置 |
JP3965173B2 (ja) | 2004-08-31 | 2007-08-29 | 理学電機工業株式会社 | 蛍光x線分析装置およびそれに用いるプログラム |
JP4247559B2 (ja) * | 2005-06-07 | 2009-04-02 | 株式会社リガク | 蛍光x線分析装置およびそれに用いるプログラム |
-
2005
- 2005-04-06 JP JP2005109503A patent/JP3965191B2/ja active Active
- 2005-12-08 US US11/910,510 patent/US7961842B2/en active Active
- 2005-12-08 WO PCT/JP2005/022552 patent/WO2006112084A1/ja not_active Application Discontinuation
- 2005-12-08 CN CN2005800493510A patent/CN101151524B/zh active Active
- 2005-12-08 EP EP05814603A patent/EP1870699A4/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
EP1870699A1 (en) | 2007-12-26 |
US7961842B2 (en) | 2011-06-14 |
CN101151524B (zh) | 2013-06-05 |
JP2006292399A (ja) | 2006-10-26 |
CN101151524A (zh) | 2008-03-26 |
WO2006112084A1 (ja) | 2006-10-26 |
US20090041184A1 (en) | 2009-02-12 |
EP1870699A4 (en) | 2012-01-04 |
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