JP3892961B2 - 光学薄膜の製造方法 - Google Patents
光学薄膜の製造方法 Download PDFInfo
- Publication number
- JP3892961B2 JP3892961B2 JP05393398A JP5393398A JP3892961B2 JP 3892961 B2 JP3892961 B2 JP 3892961B2 JP 05393398 A JP05393398 A JP 05393398A JP 5393398 A JP5393398 A JP 5393398A JP 3892961 B2 JP3892961 B2 JP 3892961B2
- Authority
- JP
- Japan
- Prior art keywords
- film thickness
- light
- thin film
- plasma
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000010409 thin film Substances 0.000 title claims description 39
- 230000003287 optical effect Effects 0.000 title claims description 26
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 239000010408 film Substances 0.000 claims description 101
- 239000000758 substrate Substances 0.000 claims description 55
- 238000004544 sputter deposition Methods 0.000 claims description 30
- 230000015572 biosynthetic process Effects 0.000 claims description 28
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 2
- 239000012788 optical film Substances 0.000 description 22
- 238000012544 monitoring process Methods 0.000 description 13
- 238000005259 measurement Methods 0.000 description 12
- 230000005540 biological transmission Effects 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 238000002310 reflectometry Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 238000005477 sputtering target Methods 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 108700027336 Suppressor of Cytokine Signaling 1 Proteins 0.000 description 2
- 102100024779 Suppressor of cytokine signaling 1 Human genes 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Images
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05393398A JP3892961B2 (ja) | 1998-03-05 | 1998-03-05 | 光学薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP05393398A JP3892961B2 (ja) | 1998-03-05 | 1998-03-05 | 光学薄膜の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPH11246968A JPH11246968A (ja) | 1999-09-14 |
| JPH11246968A5 JPH11246968A5 (enExample) | 2005-02-17 |
| JP3892961B2 true JP3892961B2 (ja) | 2007-03-14 |
Family
ID=12956556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP05393398A Expired - Fee Related JP3892961B2 (ja) | 1998-03-05 | 1998-03-05 | 光学薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3892961B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4862295B2 (ja) * | 2005-06-27 | 2012-01-25 | パナソニック電工株式会社 | 有機ｅｌ素子の製造方法及び製造装置 |
| CN108277459B (zh) * | 2018-03-29 | 2020-02-18 | 武汉华星光电半导体显示技术有限公司 | 膜厚检测装置及蒸镀机 |
| KR102245087B1 (ko) * | 2019-07-08 | 2021-04-28 | 엘지전자 주식회사 | 증착 장비용 박막 두께 측정장치 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0666337A1 (en) * | 1994-01-28 | 1995-08-09 | Applied Materials, Inc. | Method and apparatus for measuring the deposition rate of opaque films |
| JPH07333451A (ja) * | 1994-06-09 | 1995-12-22 | Matsushita Electric Ind Co Ltd | 薄膜の形成方法及びその形成装置 |
| JP3776479B2 (ja) * | 1995-04-25 | 2006-05-17 | オリンパス株式会社 | 光学薄膜およびその製造方法 |
| JP3745790B2 (ja) * | 1995-05-15 | 2006-02-15 | 株式会社デンソー | 光情報記録媒体の製造装置及び製造方法 |
| JPH09291358A (ja) * | 1996-04-24 | 1997-11-11 | Olympus Optical Co Ltd | 光学薄膜の製造方法および光学薄膜 |
-
1998
- 1998-03-05 JP JP05393398A patent/JP3892961B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH11246968A (ja) | 1999-09-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6863785B2 (en) | Sputtering apparatus and sputter film deposition method | |
| US5754297A (en) | Method and apparatus for monitoring the deposition rate of films during physical vapor deposition | |
| US6646753B2 (en) | In-situ thickness and refractive index monitoring and control system for thin film deposition | |
| JP3774094B2 (ja) | 膜厚、加工深さ測定装置及び成膜加工方法 | |
| CH634424A5 (fr) | Procede et appareil de detection et de commande de depot d'une pellicule fine. | |
| JP2023113733A (ja) | 基板上に少粒子層を形成するための方法および装置 | |
| JP3643540B2 (ja) | プラズマ処理装置 | |
| JP3892961B2 (ja) | 光学薄膜の製造方法 | |
| JP2019094534A (ja) | スパッタリング装置及び膜の製造方法 | |
| JP6672204B2 (ja) | 反応性スパッタリングの成膜装置、および成膜方法 | |
| JP4487264B2 (ja) | スパッタ装置及びスパッタ成膜方法 | |
| JP2006083404A (ja) | 多層膜形成用スパッタリング装置及びその膜厚制御方法 | |
| JP2009041091A (ja) | 成膜方法および成膜装置 | |
| JP5246862B2 (ja) | スパッタリング装置 | |
| JP4547612B2 (ja) | 膜厚制御方法及び装置、並びに光学多層膜の製造方法 | |
| JP4280890B2 (ja) | スパッタ装置及びスパッタ成膜方法 | |
| JP4830260B2 (ja) | 膜厚検出方法 | |
| CN101713062B (zh) | 遮光元件及其镀膜方法 | |
| JP4018959B2 (ja) | プラズマ処理装置 | |
| JPH116064A (ja) | 光学薄膜の製造方法及び製造装置 | |
| JPH0533132A (ja) | 金属膜の成膜方法及びその装置 | |
| JPS596376A (ja) | スパツタ装置 | |
| JP4457566B2 (ja) | スパッタリング方法 | |
| JPH04176866A (ja) | スパッタリング装置用成膜速度制御装置 | |
| JPH09302463A (ja) | 光学薄膜の製造装置及び製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20040315 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20040315 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20060801 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20060822 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061023 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20061128 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20061208 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20101215 Year of fee payment: 4 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111215 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20111215 Year of fee payment: 5 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121215 Year of fee payment: 6 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131215 Year of fee payment: 7 |
|
| LAPS | Cancellation because of no payment of annual fees |