JPH11246968A5 - - Google Patents

Info

Publication number
JPH11246968A5
JPH11246968A5 JP1998053933A JP5393398A JPH11246968A5 JP H11246968 A5 JPH11246968 A5 JP H11246968A5 JP 1998053933 A JP1998053933 A JP 1998053933A JP 5393398 A JP5393398 A JP 5393398A JP H11246968 A5 JPH11246968 A5 JP H11246968A5
Authority
JP
Japan
Prior art keywords
light
wavelength range
thin film
film thickness
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1998053933A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11246968A (ja
JP3892961B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP05393398A priority Critical patent/JP3892961B2/ja
Priority claimed from JP05393398A external-priority patent/JP3892961B2/ja
Publication of JPH11246968A publication Critical patent/JPH11246968A/ja
Publication of JPH11246968A5 publication Critical patent/JPH11246968A5/ja
Application granted granted Critical
Publication of JP3892961B2 publication Critical patent/JP3892961B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP05393398A 1998-03-05 1998-03-05 光学薄膜の製造方法 Expired - Fee Related JP3892961B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP05393398A JP3892961B2 (ja) 1998-03-05 1998-03-05 光学薄膜の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05393398A JP3892961B2 (ja) 1998-03-05 1998-03-05 光学薄膜の製造方法

Publications (3)

Publication Number Publication Date
JPH11246968A JPH11246968A (ja) 1999-09-14
JPH11246968A5 true JPH11246968A5 (enExample) 2005-02-17
JP3892961B2 JP3892961B2 (ja) 2007-03-14

Family

ID=12956556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05393398A Expired - Fee Related JP3892961B2 (ja) 1998-03-05 1998-03-05 光学薄膜の製造方法

Country Status (1)

Country Link
JP (1) JP3892961B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4862295B2 (ja) * 2005-06-27 2012-01-25 パナソニック電工株式会社 有機ｅｌ素子の製造方法及び製造装置
CN108277459B (zh) * 2018-03-29 2020-02-18 武汉华星光电半导体显示技术有限公司 膜厚检测装置及蒸镀机
KR102245087B1 (ko) * 2019-07-08 2021-04-28 엘지전자 주식회사 증착 장비용 박막 두께 측정장치

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0666337A1 (en) * 1994-01-28 1995-08-09 Applied Materials, Inc. Method and apparatus for measuring the deposition rate of opaque films
JPH07333451A (ja) * 1994-06-09 1995-12-22 Matsushita Electric Ind Co Ltd 薄膜の形成方法及びその形成装置
JP3776479B2 (ja) * 1995-04-25 2006-05-17 オリンパス株式会社 光学薄膜およびその製造方法
JP3745790B2 (ja) * 1995-05-15 2006-02-15 株式会社デンソー 光情報記録媒体の製造装置及び製造方法
JPH09291358A (ja) * 1996-04-24 1997-11-11 Olympus Optical Co Ltd 光学薄膜の製造方法および光学薄膜

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