JP3890136B2 - 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置 - Google Patents

露光装置とこれを用いたデバイス製造方法、ならびにステージ装置 Download PDF

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Publication number
JP3890136B2
JP3890136B2 JP07503498A JP7503498A JP3890136B2 JP 3890136 B2 JP3890136 B2 JP 3890136B2 JP 07503498 A JP07503498 A JP 07503498A JP 7503498 A JP7503498 A JP 7503498A JP 3890136 B2 JP3890136 B2 JP 3890136B2
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JP
Japan
Prior art keywords
stage
linear motor
exposure apparatus
exposure
movable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP07503498A
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English (en)
Japanese (ja)
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JPH10326747A (ja
JPH10326747A5 (enExample
Inventor
義一 宮島
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Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP07503498A priority Critical patent/JP3890136B2/ja
Priority to US09/046,553 priority patent/US6262794B1/en
Publication of JPH10326747A publication Critical patent/JPH10326747A/ja
Publication of JPH10326747A5 publication Critical patent/JPH10326747A5/ja
Application granted granted Critical
Publication of JP3890136B2 publication Critical patent/JP3890136B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70766—Reaction force control means, e.g. countermass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP07503498A 1997-03-25 1998-03-10 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置 Expired - Fee Related JP3890136B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP07503498A JP3890136B2 (ja) 1997-03-25 1998-03-10 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置
US09/046,553 US6262794B1 (en) 1997-03-25 1998-03-24 Exposure apparatus and device manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP9-88655 1997-03-25
JP8865597 1997-03-25
JP07503498A JP3890136B2 (ja) 1997-03-25 1998-03-10 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2006294944A Division JP4208914B2 (ja) 1997-03-25 2006-10-30 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置

Publications (3)

Publication Number Publication Date
JPH10326747A JPH10326747A (ja) 1998-12-08
JPH10326747A5 JPH10326747A5 (enExample) 2004-11-11
JP3890136B2 true JP3890136B2 (ja) 2007-03-07

Family

ID=26416190

Family Applications (1)

Application Number Title Priority Date Filing Date
JP07503498A Expired - Fee Related JP3890136B2 (ja) 1997-03-25 1998-03-10 露光装置とこれを用いたデバイス製造方法、ならびにステージ装置

Country Status (2)

Country Link
US (1) US6262794B1 (enExample)
JP (1) JP3890136B2 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW448487B (en) * 1997-11-22 2001-08-01 Nippon Kogaku Kk Exposure apparatus, exposure method and manufacturing method of device
EP1134793A4 (en) * 1998-06-17 2006-07-26 Nikon Corp EXPOSURE METHOD AND DEVICE
JP4408010B2 (ja) * 1999-07-01 2010-02-03 富士通株式会社 Ｗｄｍ用光送信装置
KR100625625B1 (ko) * 1999-10-07 2006-09-20 가부시키가이샤 니콘 기판, 스테이지 장치, 스테이지 구동 방법, 노광 장치 및노광 방법
JP2001118773A (ja) * 1999-10-18 2001-04-27 Nikon Corp ステージ装置及び露光装置
JP2001297960A (ja) * 2000-04-11 2001-10-26 Nikon Corp ステージ装置および露光装置
JP2002184662A (ja) * 2000-10-04 2002-06-28 Nikon Corp ステージ装置及び露光装置
US6593997B1 (en) * 2000-11-16 2003-07-15 Nikon Corporation Stage assembly including a reaction assembly
US6603531B1 (en) * 2000-11-16 2003-08-05 Nikon Corporation Stage assembly including a reaction assembly that is connected by actuators
US6958808B2 (en) * 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
US6757053B1 (en) 2000-11-16 2004-06-29 Nikon Corporation Stage assembly including a reaction mass assembly
US6885430B2 (en) * 2000-11-16 2005-04-26 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
JP2002176761A (ja) 2000-12-08 2002-06-21 Canon Inc リニアモータ及び該リニアモータを用いた露光装置
JP4724297B2 (ja) 2000-12-26 2011-07-13 キヤノン株式会社 露光装置、デバイス製造方法
JP3963426B2 (ja) * 2001-11-28 2007-08-22 キヤノン株式会社 ステージ装置および露光装置
US6724466B2 (en) * 2002-03-26 2004-04-20 Nikon Corporation Stage assembly including a damping assembly
US7061577B2 (en) 2002-03-26 2006-06-13 Nikon Corporation Image adjustor including damping assembly
JP2004207502A (ja) * 2002-12-25 2004-07-22 Canon Inc 誤操作防止方法
US20040252287A1 (en) * 2003-06-11 2004-12-16 Michael Binnard Reaction frame assembly that functions as a reaction mass
JP3826118B2 (ja) * 2003-07-08 2006-09-27 キヤノン株式会社 露光装置
JP3870182B2 (ja) * 2003-09-09 2007-01-17 キヤノン株式会社 露光装置及びデバイス製造方法
US7221433B2 (en) 2004-01-28 2007-05-22 Nikon Corporation Stage assembly including a reaction assembly having a connector assembly
JP4383911B2 (ja) * 2004-02-03 2009-12-16 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
JP2006120798A (ja) * 2004-10-20 2006-05-11 Canon Inc 露光装置
US7193683B2 (en) 2005-01-06 2007-03-20 Nikon Corporation Stage design for reflective optics
JP2013538447A (ja) * 2010-08-05 2013-10-10 エーエスエムエル ネザーランズ ビー．ブイ． インプリントリソグラフィ
TWI513811B (zh) * 2011-10-27 2015-12-21 Hon Hai Prec Ind Co Ltd 自動解蠟裝置
KR102409486B1 (ko) * 2020-04-21 2022-06-16 (주)하드램 마이크로 엘이디 제조 장치
JP7689871B2 (ja) * 2020-08-12 2025-06-09 ファスフォードテクノロジ株式会社 ダイボンディング装置および半導体装置の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62200726A (ja) * 1986-02-28 1987-09-04 Canon Inc 露光装置
JP2808677B2 (ja) 1989-06-20 1998-10-08 株式会社ニコン ステージ駆動方法
JPH03107639A (ja) 1989-09-20 1991-05-08 Nikon Corp 振動防止型位置決め装置
US5684856A (en) * 1991-09-18 1997-11-04 Canon Kabushiki Kaisha Stage device and pattern transfer system using the same
DE69322983T2 (de) * 1992-02-21 1999-07-15 Canon K.K., Tokio/Tokyo System zum Steuern von Trägerplatten
JP3217522B2 (ja) * 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
JP3107639B2 (ja) 1992-03-31 2000-11-13 株式会社トクヤマ アセチルアミノメチルシクロヘキサンカルボン酸エステルアミドヒドロラーゼおよびその製造方法
US5477304A (en) * 1992-10-22 1995-12-19 Nikon Corporation Projection exposure apparatus
KR0139039B1 (ko) * 1993-06-30 1998-06-01 미타라이 하지메 노광장치와 이것을 이용한 디바이스 제조방법
US5699145A (en) * 1993-07-14 1997-12-16 Nikon Corporation Scanning type exposure apparatus
US5850280A (en) * 1994-06-16 1998-12-15 Nikon Corporation Stage unit, drive table, and scanning exposure and apparatus using same
JP3613291B2 (ja) * 1995-03-08 2005-01-26 株式会社ニコン 露光装置
JP3815750B2 (ja) * 1995-10-09 2006-08-30 キヤノン株式会社 ステージ装置、ならびに前記ステージ装置を用いた露光装置およびデバイス製造方法
JP3918200B2 (ja) * 1995-11-16 2007-05-23 株式会社ニコン リソグラフィ装置の製造方法及びリソグラフィ装置

Also Published As

Publication number Publication date
US6262794B1 (en) 2001-07-17
JPH10326747A (ja) 1998-12-08

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