JP3883324B2 - 感光性組成物、感光性塗布物および微細パターン構造体 - Google Patents
感光性組成物、感光性塗布物および微細パターン構造体 Download PDFInfo
- Publication number
- JP3883324B2 JP3883324B2 JP9658999A JP9658999A JP3883324B2 JP 3883324 B2 JP3883324 B2 JP 3883324B2 JP 9658999 A JP9658999 A JP 9658999A JP 9658999 A JP9658999 A JP 9658999A JP 3883324 B2 JP3883324 B2 JP 3883324B2
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- Japan
- Prior art keywords
- water
- group
- photosensitive composition
- polymer
- photosensitive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9658999A JP3883324B2 (ja) | 1999-04-02 | 1999-04-02 | 感光性組成物、感光性塗布物および微細パターン構造体 |
TW89118048A TWI225573B (en) | 1999-04-02 | 2000-09-04 | Photosensitive composition, photosensitive coating material and fine pattern structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9658999A JP3883324B2 (ja) | 1999-04-02 | 1999-04-02 | 感光性組成物、感光性塗布物および微細パターン構造体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2000292922A JP2000292922A (ja) | 2000-10-20 |
JP3883324B2 true JP3883324B2 (ja) | 2007-02-21 |
Family
ID=14169118
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9658999A Expired - Fee Related JP3883324B2 (ja) | 1999-04-02 | 1999-04-02 | 感光性組成物、感光性塗布物および微細パターン構造体 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3883324B2 (zh) |
TW (1) | TWI225573B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6112647B2 (ja) * | 2012-06-11 | 2017-04-12 | 互応化学工業株式会社 | リフトオフ法用レジスト剤及び導体パターンの作製方法 |
CN111965939B (zh) * | 2020-08-11 | 2023-06-20 | 杭州福斯特电子材料有限公司 | 一种感光树脂组合物及其干膜抗蚀剂 |
-
1999
- 1999-04-02 JP JP9658999A patent/JP3883324B2/ja not_active Expired - Fee Related
-
2000
- 2000-09-04 TW TW89118048A patent/TWI225573B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2000292922A (ja) | 2000-10-20 |
TWI225573B (en) | 2004-12-21 |
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