JP3883324B2 - 感光性組成物、感光性塗布物および微細パターン構造体 - Google Patents

感光性組成物、感光性塗布物および微細パターン構造体 Download PDF

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Publication number
JP3883324B2
JP3883324B2 JP9658999A JP9658999A JP3883324B2 JP 3883324 B2 JP3883324 B2 JP 3883324B2 JP 9658999 A JP9658999 A JP 9658999A JP 9658999 A JP9658999 A JP 9658999A JP 3883324 B2 JP3883324 B2 JP 3883324B2
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Japan
Prior art keywords
water
group
photosensitive composition
polymer
photosensitive
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP9658999A
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English (en)
Japanese (ja)
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JP2000292922A (ja
Inventor
崇一郎 長田
雅史 榎戸
良博 高木
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Fujifilm Electronic Materials Co Ltd
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Fujifilm Electronic Materials Co Ltd
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Priority to JP9658999A priority Critical patent/JP3883324B2/ja
Priority to TW89118048A priority patent/TWI225573B/zh
Publication of JP2000292922A publication Critical patent/JP2000292922A/ja
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Publication of JP3883324B2 publication Critical patent/JP3883324B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9658999A 1999-04-02 1999-04-02 感光性組成物、感光性塗布物および微細パターン構造体 Expired - Fee Related JP3883324B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9658999A JP3883324B2 (ja) 1999-04-02 1999-04-02 感光性組成物、感光性塗布物および微細パターン構造体
TW89118048A TWI225573B (en) 1999-04-02 2000-09-04 Photosensitive composition, photosensitive coating material and fine pattern structure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9658999A JP3883324B2 (ja) 1999-04-02 1999-04-02 感光性組成物、感光性塗布物および微細パターン構造体

Publications (2)

Publication Number Publication Date
JP2000292922A JP2000292922A (ja) 2000-10-20
JP3883324B2 true JP3883324B2 (ja) 2007-02-21

Family

ID=14169118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9658999A Expired - Fee Related JP3883324B2 (ja) 1999-04-02 1999-04-02 感光性組成物、感光性塗布物および微細パターン構造体

Country Status (2)

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JP (1) JP3883324B2 (zh)
TW (1) TWI225573B (zh)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6112647B2 (ja) * 2012-06-11 2017-04-12 互応化学工業株式会社 リフトオフ法用レジスト剤及び導体パターンの作製方法
CN111965939B (zh) * 2020-08-11 2023-06-20 杭州福斯特电子材料有限公司 一种感光树脂组合物及其干膜抗蚀剂

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Publication number Publication date
JP2000292922A (ja) 2000-10-20
TWI225573B (en) 2004-12-21

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