JP3848424B2 - シリカ薄膜の形成方法 - Google Patents

シリカ薄膜の形成方法 Download PDF

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Publication number
JP3848424B2
JP3848424B2 JP05688297A JP5688297A JP3848424B2 JP 3848424 B2 JP3848424 B2 JP 3848424B2 JP 05688297 A JP05688297 A JP 05688297A JP 5688297 A JP5688297 A JP 5688297A JP 3848424 B2 JP3848424 B2 JP 3848424B2
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JP
Japan
Prior art keywords
hydrogen silsesquioxane
thin film
silsesquioxane resin
silica
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP05688297A
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English (en)
Japanese (ja)
Other versions
JPH10237307A5 (enExample
JPH10237307A (ja
Inventor
基 佐々木
昭彦 小林
清隆 澤
勝利 峰
隆司 中村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Dow Corning Toray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Toray Co Ltd filed Critical Dow Corning Toray Co Ltd
Priority to JP05688297A priority Critical patent/JP3848424B2/ja
Priority to EP19980102981 priority patent/EP0860462A3/en
Priority to SG1998000386A priority patent/SG65053A1/en
Priority to TW087102622A priority patent/TW364184B/zh
Priority to KR1019980005694A priority patent/KR19980071624A/ko
Publication of JPH10237307A publication Critical patent/JPH10237307A/ja
Priority to US09/412,219 priority patent/US6191183B1/en
Publication of JPH10237307A5 publication Critical patent/JPH10237307A5/ja
Application granted granted Critical
Publication of JP3848424B2 publication Critical patent/JP3848424B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Application Of Or Painting With Fluid Materials (AREA)
  • Silicon Compounds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Formation Of Insulating Films (AREA)
JP05688297A 1997-02-24 1997-02-24 シリカ薄膜の形成方法 Expired - Fee Related JP3848424B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP05688297A JP3848424B2 (ja) 1997-02-24 1997-02-24 シリカ薄膜の形成方法
EP19980102981 EP0860462A3 (en) 1997-02-24 1998-02-20 Composition and method for the formation of silica thin films
SG1998000386A SG65053A1 (en) 1997-02-24 1998-02-21 Composition and method for formation of silica thin films
KR1019980005694A KR19980071624A (ko) 1997-02-24 1998-02-24 실리카 박막 형성용 조성물 및 이의 형성 방법
TW087102622A TW364184B (en) 1997-02-24 1998-02-24 Composition and method for formation of silica thin films
US09/412,219 US6191183B1 (en) 1997-02-24 1999-10-05 Method for the formation of silica thin films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05688297A JP3848424B2 (ja) 1997-02-24 1997-02-24 シリカ薄膜の形成方法

Publications (3)

Publication Number Publication Date
JPH10237307A JPH10237307A (ja) 1998-09-08
JPH10237307A5 JPH10237307A5 (enExample) 2004-12-09
JP3848424B2 true JP3848424B2 (ja) 2006-11-22

Family

ID=13039799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05688297A Expired - Fee Related JP3848424B2 (ja) 1997-02-24 1997-02-24 シリカ薄膜の形成方法

Country Status (1)

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JP (1) JP3848424B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4771574B2 (ja) * 2000-05-24 2011-09-14 旭化成ケミカルズ株式会社 光触媒組成物
JP4783117B2 (ja) * 2005-10-21 2011-09-28 東レ・ダウコーニング株式会社 シリカ系ガラス薄層付き無機質基板、その製造方法、コーテイング剤および半導体装置
KR102830156B1 (ko) * 2016-02-24 2025-07-07 닛산 가가쿠 가부시키가이샤 실리콘 함유 조성물을 이용한 반도체 기판의 평탄화방법

Also Published As

Publication number Publication date
JPH10237307A (ja) 1998-09-08

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