JPH10237307A5 - - Google Patents

Info

Publication number
JPH10237307A5
JPH10237307A5 JP1997056882A JP5688297A JPH10237307A5 JP H10237307 A5 JPH10237307 A5 JP H10237307A5 JP 1997056882 A JP1997056882 A JP 1997056882A JP 5688297 A JP5688297 A JP 5688297A JP H10237307 A5 JPH10237307 A5 JP H10237307A5
Authority
JP
Japan
Prior art keywords
present
components
trispentanedioate
tripropoxyvanadium
dibutoxybispentanedioate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1997056882A
Other languages
English (en)
Japanese (ja)
Other versions
JPH10237307A (ja
JP3848424B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP05688297A external-priority patent/JP3848424B2/ja
Priority to JP05688297A priority Critical patent/JP3848424B2/ja
Priority to EP19980102981 priority patent/EP0860462A3/en
Priority to SG1998000386A priority patent/SG65053A1/en
Priority to KR1019980005694A priority patent/KR19980071624A/ko
Priority to TW087102622A priority patent/TW364184B/zh
Publication of JPH10237307A publication Critical patent/JPH10237307A/ja
Priority to US09/412,219 priority patent/US6191183B1/en
Publication of JPH10237307A5 publication Critical patent/JPH10237307A5/ja
Publication of JP3848424B2 publication Critical patent/JP3848424B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP05688297A 1997-02-24 1997-02-24 シリカ薄膜の形成方法 Expired - Fee Related JP3848424B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP05688297A JP3848424B2 (ja) 1997-02-24 1997-02-24 シリカ薄膜の形成方法
EP19980102981 EP0860462A3 (en) 1997-02-24 1998-02-20 Composition and method for the formation of silica thin films
SG1998000386A SG65053A1 (en) 1997-02-24 1998-02-21 Composition and method for formation of silica thin films
TW087102622A TW364184B (en) 1997-02-24 1998-02-24 Composition and method for formation of silica thin films
KR1019980005694A KR19980071624A (ko) 1997-02-24 1998-02-24 실리카 박막 형성용 조성물 및 이의 형성 방법
US09/412,219 US6191183B1 (en) 1997-02-24 1999-10-05 Method for the formation of silica thin films

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP05688297A JP3848424B2 (ja) 1997-02-24 1997-02-24 シリカ薄膜の形成方法

Publications (3)

Publication Number Publication Date
JPH10237307A JPH10237307A (ja) 1998-09-08
JPH10237307A5 true JPH10237307A5 (enExample) 2004-12-09
JP3848424B2 JP3848424B2 (ja) 2006-11-22

Family

ID=13039799

Family Applications (1)

Application Number Title Priority Date Filing Date
JP05688297A Expired - Fee Related JP3848424B2 (ja) 1997-02-24 1997-02-24 シリカ薄膜の形成方法

Country Status (1)

Country Link
JP (1) JP3848424B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4771574B2 (ja) * 2000-05-24 2011-09-14 旭化成ケミカルズ株式会社 光触媒組成物
JP4783117B2 (ja) * 2005-10-21 2011-09-28 東レ・ダウコーニング株式会社 シリカ系ガラス薄層付き無機質基板、その製造方法、コーテイング剤および半導体装置
TWI707400B (zh) * 2016-02-24 2020-10-11 日商日產化學工業股份有限公司 使用含矽組成物之半導體基板之平坦化方法

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