JP3817399B2 - 磁気抵抗センサー - Google Patents
磁気抵抗センサー Download PDFInfo
- Publication number
- JP3817399B2 JP3817399B2 JP36624099A JP36624099A JP3817399B2 JP 3817399 B2 JP3817399 B2 JP 3817399B2 JP 36624099 A JP36624099 A JP 36624099A JP 36624099 A JP36624099 A JP 36624099A JP 3817399 B2 JP3817399 B2 JP 3817399B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- magnetic
- oxide
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000005291 magnetic effect Effects 0.000 claims description 162
- 239000010410 layer Substances 0.000 claims description 119
- 230000003647 oxidation Effects 0.000 claims description 35
- 238000007254 oxidation reaction Methods 0.000 claims description 35
- 230000005294 ferromagnetic effect Effects 0.000 claims description 31
- 238000009812 interlayer coupling reaction Methods 0.000 claims description 16
- 229910045601 alloy Inorganic materials 0.000 claims description 15
- 239000000956 alloy Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 12
- 230000005290 antiferromagnetic effect Effects 0.000 claims description 10
- 239000011241 protective layer Substances 0.000 claims description 9
- 229910044991 metal oxide Inorganic materials 0.000 claims description 7
- 150000004706 metal oxides Chemical class 0.000 claims description 7
- 230000008878 coupling Effects 0.000 claims description 3
- 238000010168 coupling process Methods 0.000 claims description 3
- 238000005859 coupling reaction Methods 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims 3
- 229910052751 metal Inorganic materials 0.000 claims 3
- 229910052715 tantalum Inorganic materials 0.000 claims 2
- 230000001681 protective effect Effects 0.000 description 33
- 238000010586 diagram Methods 0.000 description 15
- 230000000694 effects Effects 0.000 description 15
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 9
- 229910052760 oxygen Inorganic materials 0.000 description 9
- 239000001301 oxygen Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 7
- 230000005415 magnetization Effects 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 229910003321 CoFe Inorganic materials 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002772 conduction electron Substances 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005381 magnetic domain Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- 238000005477 sputtering target Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B2005/3996—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Hall/Mr Elements (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36624099A JP3817399B2 (ja) | 1999-12-24 | 1999-12-24 | 磁気抵抗センサー |
| US09/741,804 US20010006444A1 (en) | 1999-12-24 | 2000-12-22 | Magnetoresistive sensor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP36624099A JP3817399B2 (ja) | 1999-12-24 | 1999-12-24 | 磁気抵抗センサー |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001184613A JP2001184613A (ja) | 2001-07-06 |
| JP2001184613A5 JP2001184613A5 (enExample) | 2004-10-14 |
| JP3817399B2 true JP3817399B2 (ja) | 2006-09-06 |
Family
ID=18486284
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP36624099A Expired - Fee Related JP3817399B2 (ja) | 1999-12-24 | 1999-12-24 | 磁気抵抗センサー |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20010006444A1 (enExample) |
| JP (1) | JP3817399B2 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001222803A (ja) | 2000-02-03 | 2001-08-17 | Tdk Corp | 磁気変換素子および薄膜磁気ヘッド |
| US6888703B2 (en) * | 2001-09-17 | 2005-05-03 | Headway Technologies, Inc. | Multilayered structures comprising magnetic nano-oxide layers for current perpindicular to plane GMR heads |
| US6758950B2 (en) * | 2002-01-14 | 2004-07-06 | Seagate Technology Llc | Controlled magnetron shape for uniformly sputtered thin film |
| US6913782B2 (en) * | 2002-12-03 | 2005-07-05 | Hitachi Global Storage Technologies Netherlands B.V. | Fabrication of self-aligned reflective/protective overlays on magnetoresistance sensors, and the sensors |
| US7085110B2 (en) * | 2003-07-07 | 2006-08-01 | Hitachi Global Storage Technologies Netherlands, B.V. | Thermally stable oxidized bias layer structure for magnetoresistive magnetic head for a hard disk drive |
| US7446985B2 (en) * | 2003-12-19 | 2008-11-04 | Agency For Science Technology And Research | Epitaxial oxide cap layers for enhancing GMR performance |
| JP2006196745A (ja) * | 2005-01-14 | 2006-07-27 | Alps Electric Co Ltd | 磁気検出素子、およびその製造方法 |
| JP5292726B2 (ja) * | 2007-06-13 | 2013-09-18 | ヤマハ株式会社 | 磁気センサ及びその製造方法 |
| JP2013115413A (ja) | 2011-12-01 | 2013-06-10 | Sony Corp | 記憶素子、記憶装置 |
| JP2013115400A (ja) * | 2011-12-01 | 2013-06-10 | Sony Corp | 記憶素子、記憶装置 |
| US11009570B2 (en) * | 2018-11-16 | 2021-05-18 | Samsung Electronics Co., Ltd. | Hybrid oxide/metal cap layer for boron-free free layer |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5206590A (en) * | 1990-12-11 | 1993-04-27 | International Business Machines Corporation | Magnetoresistive sensor based on the spin valve effect |
| JPH0536032A (ja) * | 1991-08-01 | 1993-02-12 | Hitachi Ltd | 磁気抵抗効果型ヘツド及びその製造方法 |
| JP3022023B2 (ja) * | 1992-04-13 | 2000-03-15 | 株式会社日立製作所 | 磁気記録再生装置 |
| US5422571A (en) * | 1993-02-08 | 1995-06-06 | International Business Machines Corporation | Magnetoresistive spin valve sensor having a nonmagnetic back layer |
| US5869963A (en) * | 1996-09-12 | 1999-02-09 | Alps Electric Co., Ltd. | Magnetoresistive sensor and head |
| CN1194116C (zh) * | 1996-11-20 | 2005-03-23 | 东芝株式会社 | 溅射靶,用其制成的抗铁磁材料膜和磁阻效应器件 |
| JPH10154311A (ja) * | 1996-11-21 | 1998-06-09 | Nec Corp | 磁気抵抗効果素子およびシールド型磁気抵抗効果センサ |
| JP3827789B2 (ja) * | 1996-12-27 | 2006-09-27 | 株式会社東芝 | 磁気抵抗効果ヘッド |
| JP2970590B2 (ja) * | 1997-05-14 | 1999-11-02 | 日本電気株式会社 | 磁気抵抗効果素子並びにこれを用いた磁気抵抗効果センサ、磁気抵抗検出システム及び磁気記憶システム |
| US6069769A (en) * | 1997-09-30 | 2000-05-30 | International Business Machines Corporation | Air bearing slider having rounded corners |
| JPH11161921A (ja) * | 1997-12-01 | 1999-06-18 | Nec Corp | 磁気抵抗効果素子およびその製造方法 |
| US6258470B1 (en) * | 1998-01-16 | 2001-07-10 | Matsushita Electric Industrial Co., Ltd. | Exchange coupling film, magnetoresistance effect device, magnetoresistance effective head and method for producing exchange coupling film |
| JP2925542B1 (ja) * | 1998-03-12 | 1999-07-28 | ティーディーケイ株式会社 | 磁気抵抗効果膜および磁気抵抗効果型ヘッド |
| JPH11273033A (ja) * | 1998-03-18 | 1999-10-08 | Tdk Corp | 磁気抵抗効果多層膜及び該磁気抵抗効果多層膜を備えた薄膜磁気ヘッド |
| US6424506B1 (en) * | 1998-07-21 | 2002-07-23 | Alps Electric Co., Ltd. | Spin-valve magnetoresistive thin film element |
| JP2000040212A (ja) * | 1998-07-24 | 2000-02-08 | Alps Electric Co Ltd | スピンバルブ型薄膜素子 |
| JP3959881B2 (ja) * | 1999-02-08 | 2007-08-15 | Tdk株式会社 | 磁気抵抗効果センサの製造方法 |
| US6268985B1 (en) * | 1999-03-30 | 2001-07-31 | International Business Machines Corporation | Read head having spin valve sensor with improved capping layer |
| US6208491B1 (en) * | 1999-05-26 | 2001-03-27 | International Business Machines Corporation | Spin valve with improved capping layer structure |
| US6219208B1 (en) * | 1999-06-25 | 2001-04-17 | International Business Machines Corporation | Dual spin valve sensor with self-pinned layer specular reflector |
| JP2001110016A (ja) * | 1999-10-05 | 2001-04-20 | Alps Electric Co Ltd | スピンバルブ型薄膜磁気素子およびその製造方法、およびこのスピンバルブ型薄膜磁気素子を備えた薄膜磁気ヘッド |
| JP3623417B2 (ja) * | 1999-12-03 | 2005-02-23 | アルプス電気株式会社 | スピンバルブ型薄膜磁気素子及び薄膜磁気ヘッド |
| US6430013B1 (en) * | 1999-12-06 | 2002-08-06 | International Business Machines Corporation | Magnetoresistive structure having improved thermal stability via magnetic barrier layer within a free layer |
| US6783635B2 (en) * | 1999-12-09 | 2004-08-31 | International Business Machines Corporation | Spin valve sensor free layer structure with a cobalt based layer that promotes magnetic stability and high magnetoresistance |
| TW495745B (en) * | 2000-03-09 | 2002-07-21 | Koninkl Philips Electronics Nv | Magnetic field element having a biasing magnetic layer structure |
-
1999
- 1999-12-24 JP JP36624099A patent/JP3817399B2/ja not_active Expired - Fee Related
-
2000
- 2000-12-22 US US09/741,804 patent/US20010006444A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| US20010006444A1 (en) | 2001-07-05 |
| JP2001184613A (ja) | 2001-07-06 |
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