JP3805547B2 - 試料作製装置 - Google Patents

試料作製装置 Download PDF

Info

Publication number
JP3805547B2
JP3805547B2 JP01313099A JP1313099A JP3805547B2 JP 3805547 B2 JP3805547 B2 JP 3805547B2 JP 01313099 A JP01313099 A JP 01313099A JP 1313099 A JP1313099 A JP 1313099A JP 3805547 B2 JP3805547 B2 JP 3805547B2
Authority
JP
Japan
Prior art keywords
sample
holder
stage
piece
ion beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP01313099A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000214056A (ja
JP2000214056A5 (enrdf_load_stackoverflow
Inventor
馨 梅村
祐一 間所
聡 富松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=11824584&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3805547(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP01313099A priority Critical patent/JP3805547B2/ja
Publication of JP2000214056A publication Critical patent/JP2000214056A/ja
Publication of JP2000214056A5 publication Critical patent/JP2000214056A5/ja
Application granted granted Critical
Publication of JP3805547B2 publication Critical patent/JP3805547B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • Sampling And Sample Adjustment (AREA)
JP01313099A 1999-01-21 1999-01-21 試料作製装置 Expired - Lifetime JP3805547B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP01313099A JP3805547B2 (ja) 1999-01-21 1999-01-21 試料作製装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP01313099A JP3805547B2 (ja) 1999-01-21 1999-01-21 試料作製装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2005363394A Division JP4048210B2 (ja) 2005-12-16 2005-12-16 試料作製方法

Publications (3)

Publication Number Publication Date
JP2000214056A JP2000214056A (ja) 2000-08-04
JP2000214056A5 JP2000214056A5 (enrdf_load_stackoverflow) 2005-11-04
JP3805547B2 true JP3805547B2 (ja) 2006-08-02

Family

ID=11824584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP01313099A Expired - Lifetime JP3805547B2 (ja) 1999-01-21 1999-01-21 試料作製装置

Country Status (1)

Country Link
JP (1) JP3805547B2 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8835845B2 (en) 2007-06-01 2014-09-16 Fei Company In-situ STEM sample preparation
WO2020074026A1 (en) 2018-10-10 2020-04-16 Tescan Brno, S.R.O. Device with at least one adjustable sample holder and method of changing holder tilt angle and method of preparing a lamella

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4178741B2 (ja) 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
JP4616509B2 (ja) * 2001-05-11 2011-01-19 公三 藤本 位置決めマーカおよび位置決め装置
JP4012158B2 (ja) * 2004-02-13 2007-11-21 松下電器産業株式会社 電子顕微鏡装置および電子顕微鏡観察方法
JP3874011B2 (ja) * 2005-04-04 2007-01-31 株式会社日立製作所 微小試料加工観察方法及び装置
JP4507952B2 (ja) * 2005-04-04 2010-07-21 株式会社日立製作所 微小試料加工観察方法及び装置
JP4675860B2 (ja) * 2006-08-09 2011-04-27 株式会社日立ハイテクノロジーズ イオンミリング装置及びその方法
JP4673278B2 (ja) * 2006-09-25 2011-04-20 株式会社日立製作所 ウエハの検査方法
JP5125123B2 (ja) * 2007-01-31 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP4100450B2 (ja) * 2007-02-23 2008-06-11 株式会社日立製作所 微小試料加工観察方法及び装置
JP5125143B2 (ja) * 2007-02-23 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP5125174B2 (ja) * 2007-03-29 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP5125184B2 (ja) * 2007-04-03 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
JP4952597B2 (ja) * 2008-01-25 2012-06-13 株式会社デンソー 加工装置
JP4834704B2 (ja) * 2008-09-01 2011-12-14 株式会社日立製作所 試料作製方法
JP5126031B2 (ja) * 2008-12-01 2013-01-23 株式会社日立製作所 微小試料加工観察方法及び装置
EP2756282A4 (en) * 2011-09-12 2015-01-21 Fei Co SHINE ANGLE TILLER
JP5316626B2 (ja) * 2011-11-14 2013-10-16 株式会社日立製作所 微小試料加工観察方法及び装置
CN107084869B (zh) 2011-12-01 2020-03-31 Fei 公司 用于横截面视图薄层的背侧打薄的高吞吐量tem制备工艺和硬件
JP5846931B2 (ja) 2012-01-25 2016-01-20 株式会社日立ハイテクノロジーズ 電子顕微鏡用試料ホルダ
TWI628702B (zh) * 2012-10-05 2018-07-01 Fei公司 高「高寬比」結構之分析
CN103792114B (zh) * 2012-11-02 2016-04-20 中芯国际集成电路制造(上海)有限公司 Tem样品的制备方法
US9905394B1 (en) * 2017-02-16 2018-02-27 Carl Zeiss Microscopy Gmbh Method for analyzing an object and a charged particle beam device for carrying out this method
JP7512849B2 (ja) 2019-11-22 2024-07-09 住友金属鉱山株式会社 透過電子顕微鏡観察用試料とその作製方法
CN113484115B (zh) * 2021-07-08 2025-06-27 浙江师范大学 试件预切缝装置
KR20240044181A (ko) * 2022-09-28 2024-04-04 삼성전자주식회사 투과 전자 현미경의 시편 홀더 및 이를 이용한 반도체 소자 검사 방법
WO2024157336A1 (ja) * 2023-01-23 2024-08-02 株式会社日立ハイテク 荷電粒子ビーム装置及び試料片の作製・観察方法
JPWO2024157337A1 (enrdf_load_stackoverflow) * 2023-01-23 2024-08-02

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2708547B2 (ja) * 1989-05-10 1998-02-04 株式会社日立製作所 デバイス移植方法
JP2774884B2 (ja) * 1991-08-22 1998-07-09 株式会社日立製作所 試料の分離方法及びこの分離方法で得た分離試料の分析方法
JP2842083B2 (ja) * 1992-09-17 1998-12-24 株式会社日立製作所 試料ホルダー、これを用いた試料加工観察システム、試料観察方法、透過形電子顕微鏡及びイオンビーム装置
JPH06232238A (ja) * 1993-02-05 1994-08-19 Hitachi Ltd 試料処理装置および試料処理方法
JPH08304243A (ja) * 1995-05-11 1996-11-22 Nippon Steel Corp 断面薄膜試料及びその作製方法及び断面薄膜試料用ホルダ
JP2994257B2 (ja) * 1996-04-12 1999-12-27 エヌオーケーイージーアンドジーオプトエレクトロニクス株式会社 プリンタ装置
JPH10199446A (ja) * 1997-01-06 1998-07-31 Hitachi Ltd 陰極線管表示装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8835845B2 (en) 2007-06-01 2014-09-16 Fei Company In-situ STEM sample preparation
WO2020074026A1 (en) 2018-10-10 2020-04-16 Tescan Brno, S.R.O. Device with at least one adjustable sample holder and method of changing holder tilt angle and method of preparing a lamella
US11476080B2 (en) 2018-10-10 2022-10-18 Tescan Brno, S.R.O. Device with at least one adjustable sample holder and method of changing holder tilt angle and method of preparing a lamella

Also Published As

Publication number Publication date
JP2000214056A (ja) 2000-08-04

Similar Documents

Publication Publication Date Title
JP3805547B2 (ja) 試料作製装置
JP3547143B2 (ja) 試料作製方法
JP4185604B2 (ja) 試料解析方法、試料作成方法およびそのための装置
JP3633325B2 (ja) 試料作製装置および試料作製方法
JP3965761B2 (ja) 試料作製装置および試料作製方法
JP3677968B2 (ja) 試料解析方法および装置
JP4185962B2 (ja) 試料作製装置
JP2008153239A5 (enrdf_load_stackoverflow)
JPH11108813A (ja) 試料作製方法および装置
JP4357347B2 (ja) 試料加工方法及び試料観察方法
JP4048210B2 (ja) 試料作製方法
JP3695181B2 (ja) 基板抽出方法及びそれを用いた電子部品製造方法
JP4589993B2 (ja) 集束イオンビーム装置
JP4185963B2 (ja) 試料解析方法、及び試料作製方法
JP4353962B2 (ja) 試料解析方法及び試料作製方法
JP4185961B2 (ja) 集束イオンビーム装置
JP2004309499A (ja) 試料作製装置および試料作製方法
JP3709886B2 (ja) 試料解析方法および装置
JP2004343131A (ja) 試料解析方法および装置
JP4096916B2 (ja) 試料解析方法および装置
JP4016970B2 (ja) 試料作製装置および試料作製方法
JP4590007B2 (ja) 集束イオンビーム装置、それを用いた試料片作製方法及び試料ホルダ
JP4612746B2 (ja) 試料作製装置
JP4177860B2 (ja) 試料作製方法
JP2009014734A (ja) 試料作製装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050808

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050808

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20050808

RD02 Notification of acceptance of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7422

Effective date: 20050808

A975 Report on accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A971005

Effective date: 20050914

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20051018

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051216

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20060207

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060403

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20060425

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20060510

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100519

Year of fee payment: 4

S201 Request for registration of exclusive licence

Free format text: JAPANESE INTERMEDIATE CODE: R314201

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100519

Year of fee payment: 4

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100519

Year of fee payment: 4

S201 Request for registration of exclusive licence

Free format text: JAPANESE INTERMEDIATE CODE: R314201

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100519

Year of fee payment: 4

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100519

Year of fee payment: 4

R370 Written measure of declining of transfer procedure

Free format text: JAPANESE INTERMEDIATE CODE: R370

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110519

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110519

Year of fee payment: 5

S221 Written request for registration of change of exclusive licence

Free format text: JAPANESE INTERMEDIATE CODE: R314221

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110519

Year of fee payment: 5

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110519

Year of fee payment: 5

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120519

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120519

Year of fee payment: 6

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130519

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130519

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130519

Year of fee payment: 7

EXPY Cancellation because of completion of term