JP3773510B2 - 放電プラズマ処理方法および放電プラズマ処理装置 - Google Patents
放電プラズマ処理方法および放電プラズマ処理装置 Download PDFInfo
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- JP3773510B2 JP3773510B2 JP2003315932A JP2003315932A JP3773510B2 JP 3773510 B2 JP3773510 B2 JP 3773510B2 JP 2003315932 A JP2003315932 A JP 2003315932A JP 2003315932 A JP2003315932 A JP 2003315932A JP 3773510 B2 JP3773510 B2 JP 3773510B2
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- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003315932A JP3773510B2 (ja) | 2003-09-08 | 2003-09-08 | 放電プラズマ処理方法および放電プラズマ処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003315932A JP3773510B2 (ja) | 2003-09-08 | 2003-09-08 | 放電プラズマ処理方法および放電プラズマ処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005085586A JP2005085586A (ja) | 2005-03-31 |
| JP2005085586A5 JP2005085586A5 (enExample) | 2005-07-14 |
| JP3773510B2 true JP3773510B2 (ja) | 2006-05-10 |
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ID=34416030
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003315932A Expired - Fee Related JP3773510B2 (ja) | 2003-09-08 | 2003-09-08 | 放電プラズマ処理方法および放電プラズマ処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3773510B2 (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5336691B2 (ja) * | 2005-09-16 | 2013-11-06 | 国立大学法人東北大学 | プラズマ発生装置、表面処理装置、光源、プラズマ発生方法、表面処理方法および光照射方法 |
| US7914692B2 (en) * | 2006-08-29 | 2011-03-29 | Ngk Insulators, Ltd. | Methods of generating plasma, of etching an organic material film, of generating minus ions, of oxidation and nitriding |
| JP6376685B2 (ja) * | 2014-05-16 | 2018-08-22 | 東レエンジニアリング株式会社 | 薄膜形成装置および薄膜形成方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5864030A (ja) * | 1981-10-13 | 1983-04-16 | Nec Kyushu Ltd | プラズマエツチング装置 |
| JPS63102318A (ja) * | 1986-10-20 | 1988-05-07 | Tokyo Electron Ltd | プラズマエツチング方法 |
| JPH04199816A (ja) * | 1990-11-29 | 1992-07-21 | Mitsubishi Electric Corp | プラズマｃｖｄ装置 |
| JP4378592B2 (ja) * | 2000-11-13 | 2009-12-09 | 株式会社安川電機 | 放電発生装置の制御方法 |
| JP2002217168A (ja) * | 2001-01-15 | 2002-08-02 | Nec Corp | プラズマ処理方法 |
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2003
- 2003-09-08 JP JP2003315932A patent/JP3773510B2/ja not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| JP2005085586A (ja) | 2005-03-31 |
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