JP3724424B2 - 蛍光ｘ線分析装置 - Google Patents

蛍光ｘ線分析装置 Download PDF

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Publication number
JP3724424B2
JP3724424B2 JP2002007329A JP2002007329A JP3724424B2 JP 3724424 B2 JP3724424 B2 JP 3724424B2 JP 2002007329 A JP2002007329 A JP 2002007329A JP 2002007329 A JP2002007329 A JP 2002007329A JP 3724424 B2 JP3724424 B2 JP 3724424B2
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Japan
Prior art keywords
rays
ray
fluorescent
sample
configuration
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Expired - Lifetime
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JP2002007329A
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English (en)
Japanese (ja)
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JP2003207466A5 (enExample
JP2003207466A (ja
Inventor
章二 桑原
隆雄 丸井
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Shimadzu Corp
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Shimadzu Corp
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Priority to JP2002007329A priority Critical patent/JP3724424B2/ja
Priority to US10/317,185 priority patent/US20030133536A1/en
Publication of JP2003207466A publication Critical patent/JP2003207466A/ja
Publication of JP2003207466A5 publication Critical patent/JP2003207466A5/ja
Application granted granted Critical
Publication of JP3724424B2 publication Critical patent/JP3724424B2/ja
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Expired - Lifetime legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2002007329A 2002-01-16 2002-01-16 蛍光ｘ線分析装置 Expired - Lifetime JP3724424B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002007329A JP3724424B2 (ja) 2002-01-16 2002-01-16 蛍光ｘ線分析装置
US10/317,185 US20030133536A1 (en) 2002-01-16 2002-12-12 X-ray fluorescence spectrometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002007329A JP3724424B2 (ja) 2002-01-16 2002-01-16 蛍光ｘ線分析装置

Publications (3)

Publication Number Publication Date
JP2003207466A JP2003207466A (ja) 2003-07-25
JP2003207466A5 JP2003207466A5 (enExample) 2005-04-07
JP3724424B2 true JP3724424B2 (ja) 2005-12-07

Family

ID=19191319

Family Applications (1)

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JP2002007329A Expired - Lifetime JP3724424B2 (ja) 2002-01-16 2002-01-16 蛍光ｘ線分析装置

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US (1) US20030133536A1 (enExample)
JP (1) JP3724424B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004019030A1 (de) * 2004-04-17 2005-11-03 Katz, Elisabeth Vorrichtung für die Elementanalyse
JP5102549B2 (ja) * 2006-07-14 2012-12-19 独立行政法人科学技術振興機構 Ｘ線分析装置及びｘ線分析方法
JP2009210371A (ja) * 2008-03-04 2009-09-17 Tohken Co Ltd 低加速電圧ｘ線顕微装置
US7972062B2 (en) * 2009-07-16 2011-07-05 Edax, Inc. Optical positioner design in X-ray analyzer for coaxial micro-viewing and analysis
CN102543243B (zh) 2010-12-28 2016-07-13 Ge医疗系统环球技术有限公司 集成毛细管式平行x射线聚焦透镜
EP2998730B1 (en) * 2013-05-27 2020-05-13 Shimadzu Corporation X-ray fluorescence analyzer
CN103698350B (zh) * 2013-12-26 2016-03-30 北京师范大学 一种x射线双谱仪
US10175184B2 (en) 2015-06-22 2019-01-08 Moxtek, Inc. XRF analyzer for light element detection
JP7361389B2 (ja) * 2020-03-04 2023-10-16 国立研究開発法人産業技術総合研究所 光学及び放射光顕微分光装置
CN116735639A (zh) * 2023-05-12 2023-09-12 力合科技（湖南）股份有限公司 轻元素检测装置及检测方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH082604Y2 (ja) * 1989-08-03 1996-01-29 理学電機工業株式会社 特性ｘ線検出装置
US5192869A (en) * 1990-10-31 1993-03-09 X-Ray Optical Systems, Inc. Device for controlling beams of particles, X-ray and gamma quanta
US6345086B1 (en) * 1999-09-14 2002-02-05 Veeco Instruments Inc. X-ray fluorescence system and method

Also Published As

Publication number Publication date
JP2003207466A (ja) 2003-07-25
US20030133536A1 (en) 2003-07-17

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