JP3674041B2 - シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品 - Google Patents

シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品 Download PDF

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JP3674041B2
JP3674041B2 JP2003068544A JP2003068544A JP3674041B2 JP 3674041 B2 JP3674041 B2 JP 3674041B2 JP 2003068544 A JP2003068544 A JP 2003068544A JP 2003068544 A JP2003068544 A JP 2003068544A JP 3674041 B2 JP3674041 B2 JP 3674041B2
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atom
silica
forming
composition
based film
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Japanese (ja)
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JP2004277501A5 (enExample
JP2004277501A (ja
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治彰 桜井
浩一 阿部
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Resonac Corp
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Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Resonac Corp
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  • Paints Or Removers (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
JP2003068544A 2003-03-13 2003-03-13 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品 Expired - Fee Related JP3674041B2 (ja)

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JP2003068544A JP3674041B2 (ja) 2003-03-13 2003-03-13 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品

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JP2003068544A JP3674041B2 (ja) 2003-03-13 2003-03-13 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品

Related Child Applications (10)

Application Number Title Priority Date Filing Date
JP2004260261A Division JP5143334B2 (ja) 2004-09-07 2004-09-07 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004280147A Division JP2005089761A (ja) 2004-09-27 2004-09-27 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004302049A Division JP2005105282A (ja) 2004-10-15 2004-10-15 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004302043A Division JP2005105281A (ja) 2004-10-15 2004-10-15 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004304676A Division JP2005042123A (ja) 2004-10-19 2004-10-19 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004312794A Division JP2005139447A (ja) 2004-10-27 2004-10-27 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004312793A Division JP2005105283A (ja) 2004-10-27 2004-10-27 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004325516A Division JP2005097626A (ja) 2004-11-09 2004-11-09 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004329588A Division JP2005136429A (ja) 2004-11-12 2004-11-12 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品
JP2004329593A Division JP5143335B2 (ja) 2004-11-12 2004-11-12 シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法、並びにシリカ系被膜を備える電子部品

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JP2004277501A JP2004277501A (ja) 2004-10-07
JP2004277501A5 JP2004277501A5 (enExample) 2005-06-16
JP3674041B2 true JP3674041B2 (ja) 2005-07-20

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004277502A (ja) * 2003-03-13 2004-10-07 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品
US8466229B2 (en) 2004-09-02 2013-06-18 Hitachi Chemical Co., Ltd. Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
JP2006183028A (ja) * 2004-11-30 2006-07-13 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
JP2006183029A (ja) * 2004-11-30 2006-07-13 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
JP2006183027A (ja) * 2004-11-30 2006-07-13 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
JP2006160811A (ja) * 2004-12-03 2006-06-22 Tokyo Ohka Kogyo Co Ltd シリカ系被膜形成用塗布液
JP2006213908A (ja) * 2004-12-21 2006-08-17 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜の形成方法、シリカ系被膜、及び、電子部品
US20080260956A1 (en) 2004-12-21 2008-10-23 Haruaki Sakurai Film, Silica Film and Method of Forming the Same, Composition for Forming Silica Film, and Electronic Part
JP2006182811A (ja) * 2004-12-24 2006-07-13 Tokyo Ohka Kogyo Co Ltd シリカ系被膜形成用塗布液
US7939590B2 (en) 2005-04-13 2011-05-10 Tokyo Ohka Kogyo Co., Ltd. Composition for forming silica-based coating film
JP4757525B2 (ja) * 2005-04-13 2011-08-24 東京応化工業株式会社 シリカ系被膜形成用組成物
JP4757524B2 (ja) * 2005-04-13 2011-08-24 東京応化工業株式会社 シリカ系被膜形成用組成物
JP4949692B2 (ja) 2006-02-07 2012-06-13 東京応化工業株式会社 低屈折率シリカ系被膜形成用組成物
JP2007211062A (ja) * 2006-02-07 2007-08-23 Tokyo Ohka Kogyo Co Ltd 着色シリカ系被膜形成用組成物
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
KR102285627B1 (ko) * 2012-02-02 2021-08-04 닛산 가가쿠 가부시키가이샤 저굴절율 막형성용 조성물
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004277502A (ja) * 2003-03-13 2004-10-07 Hitachi Chem Co Ltd シリカ系被膜形成用組成物、シリカ系被膜及びその形成方法並びにシリカ系被膜を備える電子部品
US8466229B2 (en) 2004-09-02 2013-06-18 Hitachi Chemical Co., Ltd. Composition for forming silica-based film, method of forming silica-based film, and electronic component provided with silica-based film

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