JP3559766B2 - 走査露光装置及び走査露光方法並びにデバイスの製造方法 - Google Patents

走査露光装置及び走査露光方法並びにデバイスの製造方法 Download PDF

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Publication number
JP3559766B2
JP3559766B2 JP2001045651A JP2001045651A JP3559766B2 JP 3559766 B2 JP3559766 B2 JP 3559766B2 JP 2001045651 A JP2001045651 A JP 2001045651A JP 2001045651 A JP2001045651 A JP 2001045651A JP 3559766 B2 JP3559766 B2 JP 3559766B2
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Japan
Prior art keywords
substrate
variation
scanning exposure
exposure apparatus
exposure
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JP2001045651A
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JP2002246304A5 (enExample
JP2002246304A (ja
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博史 黒澤
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Canon Inc
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Canon Inc
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Priority to JP2001045651A priority Critical patent/JP3559766B2/ja
Priority to US10/077,860 priority patent/US6704093B2/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP2001045651A 2001-02-21 2001-02-21 走査露光装置及び走査露光方法並びにデバイスの製造方法 Expired - Fee Related JP3559766B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2001045651A JP3559766B2 (ja) 2001-02-21 2001-02-21 走査露光装置及び走査露光方法並びにデバイスの製造方法
US10/077,860 US6704093B2 (en) 2001-02-21 2002-02-20 Scanning exposure apparatus, scanning exposure method, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001045651A JP3559766B2 (ja) 2001-02-21 2001-02-21 走査露光装置及び走査露光方法並びにデバイスの製造方法

Publications (3)

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JP2002246304A JP2002246304A (ja) 2002-08-30
JP3559766B2 true JP3559766B2 (ja) 2004-09-02
JP2002246304A5 JP2002246304A5 (enExample) 2004-11-11

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JP2001045651A Expired - Fee Related JP3559766B2 (ja) 2001-02-21 2001-02-21 走査露光装置及び走査露光方法並びにデバイスの製造方法

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US (1) US6704093B2 (enExample)
JP (1) JP3559766B2 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002252161A (ja) * 2001-02-23 2002-09-06 Hitachi Ltd 半導体製造システム
JP3982270B2 (ja) * 2002-01-29 2007-09-26 信越半導体株式会社 半導体ウエーハの製造方法および半導体ウエーハ製造の受注方法ならびに半導体ウエーハ製造の受注システム
JP2005129674A (ja) * 2003-10-23 2005-05-19 Canon Inc 走査露光装置およびデバイス製造方法
JP2005243887A (ja) * 2004-02-26 2005-09-08 Nikon Corp リソグラフィ装置の製造方法
JP3870207B2 (ja) 2004-08-05 2007-01-17 キヤノン株式会社 液浸露光装置及びデバイス製造方法
JP2006250636A (ja) * 2005-03-09 2006-09-21 Hitachi Kenki Fine Tech Co Ltd 移動装置
CN100498540C (zh) * 2005-11-17 2009-06-10 中国科学院电工研究所 步进扫描光刻机晶片台掩模台同步控制系统
US20080126014A1 (en) * 2006-08-22 2008-05-29 Yuanting Cui Statistical method and automated system for detection of particulate matter on wafer processing chucks
US7917244B2 (en) * 2007-03-14 2011-03-29 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for reducing critical dimension side-to-side tilting error
NL2004256A (en) * 2009-05-13 2010-11-18 Asml Netherlands Bv Enhancing alignment in lithographic apparatus device manufacture.
NL2005719A (en) 2009-12-18 2011-06-21 Asml Netherlands Bv Method of measuring properties of dynamic positioning errors in a lithographic apparatus, data processing apparatus, and computer program product.
JP5574749B2 (ja) * 2010-02-24 2014-08-20 キヤノン株式会社 露光条件及びマスクパターンのうち少なくとも一方を決定する決定方法及びプログラム、情報処理装置
JP5864977B2 (ja) * 2011-09-16 2016-02-17 キヤノン株式会社 走査光学系の製造方法および走査光学系の検査装置
CN102621909A (zh) * 2012-04-06 2012-08-01 中国科学院上海应用物理研究所 一种压弯机构运动控制系统
CN102621910A (zh) * 2012-04-16 2012-08-01 中国科学院上海应用物理研究所 一种基于epics的四刀狭缝控制系统及其控制方法
JP2015115540A (ja) * 2013-12-13 2015-06-22 株式会社日立国際電気 管理装置、基板処理装置の管理方法および基板処理システム並びに記録媒体
CN105629886B (zh) * 2015-12-31 2019-01-29 福建睿能科技股份有限公司 机控设备、纺织设备及其控制系统、控制装置
US20220157448A1 (en) * 2020-11-13 2022-05-19 Heartware, Inc. Detection of abnormal changes in flow pulsatility clinically correlated with adverse events using logfile data
JP7699458B2 (ja) * 2021-04-06 2025-06-27 キヤノン株式会社 露光装置、露光方法及び物品の製造方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5172402A (en) * 1990-03-09 1992-12-15 Canon Kabushiki Kaisha Exposure apparatus
JP3336436B2 (ja) * 1991-04-02 2002-10-21 株式会社ニコン リソグラフィシステム、情報収集装置、露光装置、及び半導体デバイス製造方法
JP3513973B2 (ja) * 1995-04-28 2004-03-31 株式会社ニコン 走査露光方法および該方法を用いた回路素子製造方法
JP3391940B2 (ja) * 1995-06-26 2003-03-31 キヤノン株式会社 照明装置及び露光装置
JPH09129550A (ja) * 1995-08-30 1997-05-16 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
US5883701A (en) * 1995-09-21 1999-03-16 Canon Kabushiki Kaisha Scanning projection exposure method and apparatus
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
US5936710A (en) * 1996-01-05 1999-08-10 Canon Kabushiki Kaisha Scanning type exposure apparatus, position control apparatus, and method therefor
JP3459742B2 (ja) * 1996-01-17 2003-10-27 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
US6049372A (en) * 1996-06-25 2000-04-11 Nikon Corporation Exposure apparatus
US6195155B1 (en) * 1997-04-18 2001-02-27 Nikon Corporation Scanning type exposure method
US6509953B1 (en) * 1998-02-09 2003-01-21 Nikon Corporation Apparatus for exposing a pattern onto an object with controlled scanning
US6260282B1 (en) * 1998-03-27 2001-07-17 Nikon Corporation Stage control with reduced synchronization error and settling time
JP2000021716A (ja) 1998-06-30 2000-01-21 Canon Inc 露光装置及びこれを用いたデバイスの製造方法

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Publication number Publication date
US6704093B2 (en) 2004-03-09
US20020145713A1 (en) 2002-10-10
JP2002246304A (ja) 2002-08-30

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