JP3275838B2 - 光照射装置 - Google Patents

光照射装置

Info

Publication number
JP3275838B2
JP3275838B2 JP21992098A JP21992098A JP3275838B2 JP 3275838 B2 JP3275838 B2 JP 3275838B2 JP 21992098 A JP21992098 A JP 21992098A JP 21992098 A JP21992098 A JP 21992098A JP 3275838 B2 JP3275838 B2 JP 3275838B2
Authority
JP
Japan
Prior art keywords
mirror
light
condenser
condenser mirror
light irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP21992098A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000040655A (ja
Inventor
高尚 上野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Original Assignee
Ushio Denki KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK filed Critical Ushio Denki KK
Priority to JP21992098A priority Critical patent/JP3275838B2/ja
Priority to TW088106661A priority patent/TW411489B/zh
Priority to KR10-1999-0029566A priority patent/KR100500606B1/ko
Publication of JP2000040655A publication Critical patent/JP2000040655A/ja
Application granted granted Critical
Publication of JP3275838B2 publication Critical patent/JP3275838B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
JP21992098A 1998-07-21 1998-07-21 光照射装置 Expired - Fee Related JP3275838B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP21992098A JP3275838B2 (ja) 1998-07-21 1998-07-21 光照射装置
TW088106661A TW411489B (en) 1998-07-21 1999-04-26 Illuminating device
KR10-1999-0029566A KR100500606B1 (ko) 1998-07-21 1999-07-21 광조사장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21992098A JP3275838B2 (ja) 1998-07-21 1998-07-21 光照射装置

Publications (2)

Publication Number Publication Date
JP2000040655A JP2000040655A (ja) 2000-02-08
JP3275838B2 true JP3275838B2 (ja) 2002-04-22

Family

ID=16743100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21992098A Expired - Fee Related JP3275838B2 (ja) 1998-07-21 1998-07-21 光照射装置

Country Status (3)

Country Link
JP (1) JP3275838B2 (ko)
KR (1) KR100500606B1 (ko)
TW (1) TW411489B (ko)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10045265A1 (de) * 2000-09-13 2002-03-21 Zeiss Carl Vorrichtung zum Bündeln der Strahlung einer Lichtquelle
JP2003207738A (ja) * 2002-01-17 2003-07-25 Ushio Inc 光照射装置
JP2009231719A (ja) * 2008-03-25 2009-10-08 Topcon Corp 露光装置に用いられる楕円鏡の保持方法および保持装置
JP5659497B2 (ja) * 2010-02-08 2015-01-28 ウシオ電機株式会社 光照射装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5022617U (ko) * 1973-06-20 1975-03-13
JPH0715554B2 (ja) * 1986-11-11 1995-02-22 株式会社ニコン 照明光源装置
JPH01117025A (ja) * 1987-10-30 1989-05-09 Ushio Inc 光照射器
JPH06320097A (ja) * 1993-05-18 1994-11-22 Iwasaki Electric Co Ltd 紫外線照射装置
JP3377347B2 (ja) * 1995-10-05 2003-02-17 大日本スクリーン製造株式会社 基板の周辺部露光装置
JPH1055713A (ja) * 1996-08-08 1998-02-24 Ushio Inc 紫外線照射装置
KR200160907Y1 (ko) * 1997-11-11 1999-11-15 윤종용 램프장착기구
JPH11258815A (ja) * 1998-03-10 1999-09-24 Nikon Corp 光源ユニットおよび露光装置

Also Published As

Publication number Publication date
TW411489B (en) 2000-11-11
JP2000040655A (ja) 2000-02-08
KR20000011876A (ko) 2000-02-25
KR100500606B1 (ko) 2005-07-11

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