JP3199729B2 - １―（２―スルホエチル）―ピリジニウムベタインを含有する酸性ニッケル浴 - Google Patents

１―（２―スルホエチル）―ピリジニウムベタインを含有する酸性ニッケル浴

Info

Publication number
JP3199729B2
JP3199729B2 JP50767591A JP50767591A JP3199729B2 JP 3199729 B2 JP3199729 B2 JP 3199729B2 JP 50767591 A JP50767591 A JP 50767591A JP 50767591 A JP50767591 A JP 50767591A JP 3199729 B2 JP3199729 B2 JP 3199729B2
Authority
JP
Japan
Prior art keywords
nickel bath
concentration
acidic nickel
bath according
acidic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP50767591A
Other languages
English (en)
Japanese (ja)
Other versions
JPH05506695A (ja
Inventor
ダームス，ヴォルフガング
Original Assignee
アトテク ドイチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by アトテク ドイチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング filed Critical アトテク ドイチュラント ゲゼルシャフト ミット ベシュレンクテル ハフツング
Publication of JPH05506695A publication Critical patent/JPH05506695A/ja
Application granted granted Critical
Publication of JP3199729B2 publication Critical patent/JP3199729B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18—Heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Pyridine Compounds (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Chemically Coating (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
JP50767591A 1990-04-23 1991-04-22 １―（２―スルホエチル）―ピリジニウムベタインを含有する酸性ニッケル浴 Expired - Fee Related JP3199729B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4013349A DE4013349A1 (de) 1990-04-23 1990-04-23 1-(2-sulfoaethyl)pyridiniumbetain, verfahren zu dessen herstellung sowie saure nickelbaeder enthaltend diese verbindung
DE4013349.4 1990-04-23

Publications (2)

Publication Number Publication Date
JPH05506695A JPH05506695A (ja) 1993-09-30
JP3199729B2 true JP3199729B2 (ja) 2001-08-20

Family

ID=6405158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50767591A Expired - Fee Related JP3199729B2 (ja) 1990-04-23 1991-04-22 １―（２―スルホエチル）―ピリジニウムベタインを含有する酸性ニッケル浴

Country Status (8)

Country Link
US (1) US5264112A (xx)
EP (1) EP0526497B1 (xx)
JP (1) JP3199729B2 (xx)
AT (1) ATE118253T1 (xx)
DE (2) DE4013349A1 (xx)
ES (1) ES2068577T3 (xx)
HK (1) HK3596A (xx)
WO (1) WO1991016474A1 (xx)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69829188T2 (de) * 1997-08-01 2005-12-29 Reilly Industries, Inc., Indianapolis Supernukleophile in 4-stellung substituierte pyridinkatalysatoren und verfahren die nützlich zu deren herstellung sind
DE19805487A1 (de) 1998-02-11 1999-08-12 Basf Ag Synthese von 1-(2-Sulfoethyl)-pyridiniumbetain
DE102014207778B3 (de) * 2014-04-25 2015-05-21 Kiesow Dr. Brinkmann GmbH & Co. KG Verwendung einer Mischung zur Verwendung in einem galvanischen Bad oder eines galvanischen Bades zur Herstellung einer Glanznickelschicht sowie Verfahren zur Herstellung eines Artikels mit einer Glanznickelschicht
US10458032B2 (en) * 2017-06-15 2019-10-29 Rohm And Haas Electronic Materials Llc Environmentally friendly nickel electroplating compositions and methods
US10718059B2 (en) * 2017-07-10 2020-07-21 Rohm And Haas Electronic Materials Llc Nickel electroplating compositions with cationic polymers and methods of electroplating nickel
EP3456870A1 (en) * 2017-09-13 2019-03-20 ATOTECH Deutschland GmbH A bath and method for filling a vertical interconnect access or trench of a work piece with nickel or a nickel alloy

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL100419C (xx) * 1955-03-16
US3131189A (en) * 1961-10-16 1964-04-28 Pure Oil Co Preparation of quaternary ammonium betaine salts
FR1529883A (fr) * 1967-05-11 1968-06-21 Conservatoire Nat Arts Procédé de sulfoéthylation d'amines tertiaires et nouveaux composés obtenus
DE1621157A1 (de) * 1967-08-16 1971-05-19 Riedel & Co Saures galvanisches Nickelbad
US3862019A (en) * 1974-04-26 1975-01-21 R O Hull & Company Inc Composition of electroplating bath for the electrodeposition of bright nickel
CA1242809A (en) * 1985-12-20 1988-10-04 Mitel Corporation Data storage system
US4673472A (en) * 1986-02-28 1987-06-16 Technic Inc. Method and electroplating solution for deposition of palladium or alloys thereof
DD266814A1 (de) * 1987-10-13 1989-04-12 Leipzig Galvanotechnik Verfahren zur elektrolytischen abscheidung glaenzender nickelschichten
FR2630753B1 (fr) * 1988-05-02 1992-01-03 Piolat Ind Cadres perfores en nickel et leur procede de fabrication
DE3817722A1 (de) * 1988-05-25 1989-12-14 Raschig Ag Verwendung von 2-substituierten ethansulfon-verbindungen als galvanotechnische hilfsstoffe
GB2242200B (en) * 1990-02-20 1993-11-17 Omi International Plating compositions and processes
US5164069A (en) * 1990-11-05 1992-11-17 Shipley Company Inc. Nickel electroplating solution and acetylenic compounds therefor

Also Published As

Publication number Publication date
DE59104555D1 (de) 1995-03-23
EP0526497A1 (de) 1993-02-10
JPH05506695A (ja) 1993-09-30
WO1991016474A1 (de) 1991-10-31
HK3596A (en) 1996-01-12
DE4013349A1 (de) 1991-10-24
US5264112A (en) 1993-11-23
ES2068577T3 (es) 1995-04-16
EP0526497B1 (de) 1995-02-08
ATE118253T1 (de) 1995-02-15

Similar Documents

Publication Publication Date Title
CA2834109A1 (en) Electroplating bath and method for producing dark chromium layers
KR900005845B1 (ko) 아연-닉켈 합금 전착용 전해액 및 그의 전착방법
US4515663A (en) Acid zinc and zinc alloy electroplating solution and process
GB2062009A (en) Electroplacting Bath and Process
JP3199729B2 (ja) １―（２―スルホエチル）―ピリジニウムベタインを含有する酸性ニッケル浴
GB2179676A (en) Zinc alloy electroplating
JPH0237434B2 (xx)
US4207150A (en) Electroplating bath and process
JP2005504181A (ja) スズまたはスズ合金を高速メッキするための組成物並びに方法
JPS6141999B2 (xx)
Ward et al. The Electrodeposition of Chromium from Trivalent Salts
JPH0273990A (ja) 電気メッキ用助剤としての２―置換エタンスルホン化合物の使用
JP3359602B2 (ja) 電解浴
KR20100121399A (ko) 니켈플래쉬 도금용액, 전기아연도금강판 및 이의 제조방법
US3506548A (en) Electrodeposition of nickel
JPS5841357B2 (ja) エトキシル化／プロポキシル化多価アルコ−ルを使用した酸性亜鉛めっき溶液およびメッキ法
US3008883A (en) Electrodeposition of bright nickel
JP2667323B2 (ja) 酸化防止剤、めっき浴用助剤およびこれを用いためっき浴
NL8401842A (nl) Werkwijze voor het elektrolytisch neerslaan van koper.
US3682789A (en) Electrolytic solution for zinc plating
JPH0224918B2 (xx)
JPS5815553B2 (ja) 錫の光沢被覆を電着するための酸性の錫浴
JPH01247593A (ja) 金属物質のアルミニウムメッキ方法
US4764262A (en) High quality, bright nickel plating
US3256160A (en) Method of electroplating bismuth on steel and electrolyte therefor

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080615

Year of fee payment: 7

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090615

Year of fee payment: 8

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100615

Year of fee payment: 9

LAPS Cancellation because of no payment of annual fees