JP2824817B2 - マスクの製造方法 - Google Patents

マスクの製造方法

Info

Publication number
JP2824817B2
JP2824817B2 JP2333292A JP2333292A JP2824817B2 JP 2824817 B2 JP2824817 B2 JP 2824817B2 JP 2333292 A JP2333292 A JP 2333292A JP 2333292 A JP2333292 A JP 2333292A JP 2824817 B2 JP2824817 B2 JP 2824817B2
Authority
JP
Japan
Prior art keywords
layer
mask
pattern
oxidized
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2333292A
Other languages
English (en)
Japanese (ja)
Other versions
JPH06138637A (ja
Inventor
ホン・ソク・キム
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ERU JII SEMIKON CO Ltd
Original Assignee
ERU JII SEMIKON CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ERU JII SEMIKON CO Ltd filed Critical ERU JII SEMIKON CO Ltd
Publication of JPH06138637A publication Critical patent/JPH06138637A/ja
Application granted granted Critical
Publication of JP2824817B2 publication Critical patent/JP2824817B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/29—Rim PSM or outrigger PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2333292A 1991-01-14 1992-01-14 マスクの製造方法 Expired - Fee Related JP2824817B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR461/1991 1991-01-14
KR1019910000461A KR0172816B1 (ko) 1991-01-14 1991-01-14 마스크 제조방법

Publications (2)

Publication Number Publication Date
JPH06138637A JPH06138637A (ja) 1994-05-20
JP2824817B2 true JP2824817B2 (ja) 1998-11-18

Family

ID=19309740

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2333292A Expired - Fee Related JP2824817B2 (ja) 1991-01-14 1992-01-14 マスクの製造方法

Country Status (5)

Country Link
US (1) US5597666A (enExample)
JP (1) JP2824817B2 (enExample)
KR (1) KR0172816B1 (enExample)
DE (1) DE4200647C2 (enExample)
TW (1) TW276352B (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR0152952B1 (ko) * 1995-05-13 1998-10-01 문정환 위상반전 마스크 및 그 제조방법
KR0166825B1 (ko) * 1996-06-26 1999-01-15 문정환 위상반전 마스크의 제조 방법
KR100328448B1 (ko) * 1999-12-29 2002-03-16 박종섭 반도체 소자의 위상반전 마스크 제조방법
KR100790751B1 (ko) * 2006-12-06 2008-01-02 삼성전기주식회사 수정판 제조방법
KR102323615B1 (ko) * 2020-01-23 2021-11-05 김용석 원 스텝 습식 에칭 기술을 이용한 oled 패널 제조용 파인 메탈 마스크 제조 방법
TWI707195B (zh) * 2020-02-14 2020-10-11 力晶積成電子製造股份有限公司 相位轉移光罩的製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4360586A (en) * 1979-05-29 1982-11-23 Massachusetts Institute Of Technology Spatial period division exposing
DE3168688D1 (en) * 1980-11-06 1985-03-14 Toshiba Kk Method for manufacturing a semiconductor device
JPS6195356A (ja) * 1984-10-16 1986-05-14 Mitsubishi Electric Corp フオトマスクブランク
US4890309A (en) * 1987-02-25 1989-12-26 Massachusetts Institute Of Technology Lithography mask with a π-phase shifting attenuator
JP2710967B2 (ja) * 1988-11-22 1998-02-10 株式会社日立製作所 集積回路装置の製造方法
JPH03211554A (ja) * 1990-01-17 1991-09-17 Fujitsu Ltd 位相シフトマスクの製造方法
JPH04127149A (ja) * 1990-09-19 1992-04-28 Hitachi Ltd ホトマスク及びその製造方法

Also Published As

Publication number Publication date
KR920015428A (ko) 1992-08-26
DE4200647A1 (de) 1992-07-23
DE4200647C2 (de) 1994-03-10
US5597666A (en) 1997-01-28
KR0172816B1 (ko) 1999-03-30
TW276352B (enExample) 1996-05-21
JPH06138637A (ja) 1994-05-20

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