JP2025094086A5 - - Google Patents
Info
- Publication number
- JP2025094086A5 JP2025094086A5 JP2025043467A JP2025043467A JP2025094086A5 JP 2025094086 A5 JP2025094086 A5 JP 2025094086A5 JP 2025043467 A JP2025043467 A JP 2025043467A JP 2025043467 A JP2025043467 A JP 2025043467A JP 2025094086 A5 JP2025094086 A5 JP 2025094086A5
- Authority
- JP
- Japan
- Prior art keywords
- radiation
- sensitive layer
- heating
- average thickness
- organotin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962876842P | 2019-07-22 | 2019-07-22 | |
| US62/876,842 | 2019-07-22 | ||
| JP2022504087A JP7715703B2 (ja) | 2019-07-22 | 2020-07-21 | 有機金属の金属カルコゲナイドクラスター及びリソグラフィへの応用 |
| PCT/US2020/042857 WO2021016229A1 (en) | 2019-07-22 | 2020-07-21 | Organometallic metal chalcogenide clusters and application to lithography |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022504087A Division JP7715703B2 (ja) | 2019-07-22 | 2020-07-21 | 有機金属の金属カルコゲナイドクラスター及びリソグラフィへの応用 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2025094086A JP2025094086A (ja) | 2025-06-24 |
| JP2025094086A5 true JP2025094086A5 (https=) | 2025-08-19 |
| JP7837448B2 JP7837448B2 (ja) | 2026-03-30 |
Family
ID=74189783
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022504087A Active JP7715703B2 (ja) | 2019-07-22 | 2020-07-21 | 有機金属の金属カルコゲナイドクラスター及びリソグラフィへの応用 |
| JP2025043467A Active JP7837448B2 (ja) | 2019-07-22 | 2025-03-18 | 有機金属の金属カルコゲナイドクラスター及びリソグラフィへの応用 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022504087A Active JP7715703B2 (ja) | 2019-07-22 | 2020-07-21 | 有機金属の金属カルコゲナイドクラスター及びリソグラフィへの応用 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US20210026241A1 (https=) |
| EP (2) | EP4004649B1 (https=) |
| JP (2) | JP7715703B2 (https=) |
| KR (2) | KR102841238B1 (https=) |
| TW (1) | TWI856141B (https=) |
| WO (1) | WO2021016229A1 (https=) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2020210660A1 (en) | 2019-04-12 | 2020-10-15 | Inpria Corporation | Organometallic photoresist developer compositions and processing methods |
| US11579531B2 (en) * | 2019-09-25 | 2023-02-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Organometallic cluster photoresists for EUV lithography |
| EP4115242A4 (en) * | 2020-03-02 | 2024-03-13 | Inpria Corporation | PROCESSING ENVIRONMENT FOR THE FORMATION OF INORGANIC RESERVE PATTERNS |
| US20220365428A1 (en) * | 2021-05-14 | 2022-11-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist materials and associated methods |
| US11906901B2 (en) | 2021-06-07 | 2024-02-20 | International Business Machines Corporation | Alternating copolymer chain scission photoresists |
| CN114736236B (zh) * | 2022-03-21 | 2023-09-29 | 中国科学院福建物质结构研究所 | 一种多核环状有机锡氧硫簇合物及其制备方法和应用 |
| CN117148669B (zh) * | 2022-05-24 | 2025-11-14 | 上海新阳半导体材料股份有限公司 | 一种euv光刻胶及其制备方法和应用 |
| CN117417371A (zh) * | 2022-07-11 | 2024-01-19 | 中国科学院福建物质结构研究所 | 一种p1型零维金属硫属簇合物以及制备方法和应用 |
| KR102904140B1 (ko) * | 2022-08-19 | 2025-12-23 | 삼성에스디아이 주식회사 | 반도체 포토레지스트용 조성물 및 이를 이용한 패턴 형성 방법 |
| CN117659420A (zh) | 2022-08-29 | 2024-03-08 | 清华大学 | 一种Zn基有机配位纳米颗粒、光刻胶组合物及其制备方法与应用 |
| US20240168373A1 (en) * | 2022-10-11 | 2024-05-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and formation method thereof |
| KR102839122B1 (ko) | 2023-01-23 | 2025-07-28 | 닛산 가가쿠 가부시키가이샤 | 금속 산화물 레지스트 패턴 형성용 유기 수지 조성물 |
| KR20250160464A (ko) | 2023-02-28 | 2025-11-13 | 닛산 가가쿠 가부시키가이샤 | 탄소-탄소 이중 결합을 가지는 실리콘 함유 레지스트 하층막 형성용 조성물 |
| CN116375762B (zh) * | 2023-04-06 | 2024-10-01 | 中国科学院福建物质结构研究所 | 一种镧锡异金属氧硫簇合物及其制备方法和应用 |
| CN116478205B (zh) * | 2023-04-25 | 2024-10-01 | 中国科学院福建物质结构研究所 | 一种亚硒酸根配位的有机锡氧簇合物及其制备方法和应用 |
| JPWO2024242121A1 (https=) | 2023-05-24 | 2024-11-28 | ||
| JPWO2024242120A1 (https=) * | 2023-05-24 | 2024-11-28 | ||
| JP2026000111A (ja) | 2024-06-17 | 2026-01-05 | 東京エレクトロン株式会社 | 基板処理方法及び基板処理装置 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2873288A (en) | 1956-09-18 | 1959-02-10 | Metal & Thermit Corp | Process for the preparation of vinyl tin compounds |
| US4255320A (en) * | 1978-06-08 | 1981-03-10 | Argus Chemical Corporation | Mixtures of alkyltin sulfides and alkyltin 2-acyloxyethlymecaptides as stabilizer compositons for polyvinyl chloride resin compositions |
| US4737425A (en) * | 1986-06-10 | 1988-04-12 | International Business Machines Corporation | Patterned resist and process |
| JPH07133391A (ja) * | 1993-11-11 | 1995-05-23 | Kyodo Yakuhin Kk | 熱安定性に優れる含ハロゲン樹脂組成物 |
| TWI299527B (en) * | 2006-04-11 | 2008-08-01 | Taiwan Tft Lcd Ass | A fabrication method of thin film for active layer by metal chalcogenide precursor solution |
| WO2012118847A2 (en) * | 2011-02-28 | 2012-09-07 | Inpria Corportion | Solution processible hardmarks for high resolusion lithography |
| US9310684B2 (en) * | 2013-08-22 | 2016-04-12 | Inpria Corporation | Organometallic solution based high resolution patterning compositions |
| KR102952227B1 (ko) * | 2014-10-23 | 2026-04-13 | 인프리아 코포레이션 | 유기 금속 용액 기반의 고해상도 패터닝 조성물 및 상응하는 방법 |
| KR102508142B1 (ko) * | 2015-10-13 | 2023-03-08 | 인프리아 코포레이션 | 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝 |
| CN108778458B (zh) * | 2016-03-29 | 2021-06-08 | 东丽株式会社 | 层合聚芳硫醚耐热过滤器 |
| WO2017211669A1 (en) * | 2016-06-10 | 2017-12-14 | Philipps-Universität Marburg | Molecular white-light emitter |
| KR102610448B1 (ko) | 2016-08-12 | 2023-12-07 | 인프리아 코포레이션 | 금속 함유 레지스트로부터의 에지 비드 영역의 금속 잔류물 저감방법 |
| KR102634520B1 (ko) * | 2017-11-20 | 2024-02-06 | 인프리아 코포레이션 | 유기주석 클러스터, 유기주석 클러스터의 용액, 및 고해상도 패턴화에 대한 적용 |
-
2020
- 2020-07-21 WO PCT/US2020/042857 patent/WO2021016229A1/en not_active Ceased
- 2020-07-21 JP JP2022504087A patent/JP7715703B2/ja active Active
- 2020-07-21 EP EP20843741.8A patent/EP4004649B1/en active Active
- 2020-07-21 TW TW109124622A patent/TWI856141B/zh active
- 2020-07-21 KR KR1020227004408A patent/KR102841238B1/ko active Active
- 2020-07-21 EP EP25204099.3A patent/EP4647842A3/en active Pending
- 2020-07-21 US US16/934,647 patent/US20210026241A1/en not_active Abandoned
- 2020-07-21 KR KR1020257025218A patent/KR20250117739A/ko active Pending
-
2024
- 2024-06-17 US US18/745,039 patent/US20240337925A1/en active Pending
-
2025
- 2025-03-18 JP JP2025043467A patent/JP7837448B2/ja active Active
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