JPWO2024242120A1 - - Google Patents
Info
- Publication number
- JPWO2024242120A1 JPWO2024242120A1 JP2025522421A JP2025522421A JPWO2024242120A1 JP WO2024242120 A1 JPWO2024242120 A1 JP WO2024242120A1 JP 2025522421 A JP2025522421 A JP 2025522421A JP 2025522421 A JP2025522421 A JP 2025522421A JP WO2024242120 A1 JPWO2024242120 A1 JP WO2024242120A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023085570 | 2023-05-24 | ||
| PCT/JP2024/018743 WO2024242120A1 (ja) | 2023-05-24 | 2024-05-21 | パターン形成方法及び金属化合物含有膜用処理液 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024242120A1 true JPWO2024242120A1 (https=) | 2024-11-28 |
Family
ID=93590002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025522421A Pending JPWO2024242120A1 (https=) | 2023-05-24 | 2024-05-21 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPWO2024242120A1 (https=) |
| TW (1) | TW202511276A (https=) |
| WO (1) | WO2024242120A1 (https=) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102004037949B4 (de) * | 2004-08-05 | 2009-04-02 | Forschungszentrum Karlsruhe Gmbh | Verfahren zur Herstellung von Photonischen Kristallen |
| JP6572899B2 (ja) * | 2014-09-17 | 2019-09-11 | Jsr株式会社 | パターン形成方法 |
| JPWO2017169440A1 (ja) * | 2016-03-28 | 2019-02-14 | Jsr株式会社 | 感放射線性組成物及びパターン形成方法 |
| WO2019111665A1 (ja) * | 2017-12-05 | 2019-06-13 | Jsr株式会社 | レジストパターン形成方法及びレジスト膜形成用組成物 |
| WO2021016229A1 (en) * | 2019-07-22 | 2021-01-28 | Inpria Corporation | Organometallic metal chalcogenide clusters and application to lithography |
| CN116134381A (zh) * | 2020-07-17 | 2023-05-16 | 朗姆研究公司 | 含钽光致抗蚀剂 |
| JP7737106B2 (ja) * | 2021-07-16 | 2025-09-10 | 三星電子株式会社 | イオン性塩および感放射線レジスト組成物 |
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2024
- 2024-05-21 JP JP2025522421A patent/JPWO2024242120A1/ja active Pending
- 2024-05-21 WO PCT/JP2024/018743 patent/WO2024242120A1/ja not_active Ceased
- 2024-05-24 TW TW113119351A patent/TW202511276A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2024242120A1 (ja) | 2024-11-28 |
| TW202511276A (zh) | 2025-03-16 |