TW202511276A - 圖型形成方法及含金屬化合物之膜用處理液 - Google Patents

圖型形成方法及含金屬化合物之膜用處理液 Download PDF

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Publication number
TW202511276A
TW202511276A TW113119351A TW113119351A TW202511276A TW 202511276 A TW202511276 A TW 202511276A TW 113119351 A TW113119351 A TW 113119351A TW 113119351 A TW113119351 A TW 113119351A TW 202511276 A TW202511276 A TW 202511276A
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TW
Taiwan
Prior art keywords
group
ring
substituted
metal compound
hydrogen atoms
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TW113119351A
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English (en)
Chinese (zh)
Inventor
木村謙太
久保慧輔
弥
稲荷宇俊
Original Assignee
日商東京應化工業股份有限公司
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Publication of TW202511276A publication Critical patent/TW202511276A/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Chemically Coating (AREA)
TW113119351A 2023-05-24 2024-05-24 圖型形成方法及含金屬化合物之膜用處理液 TW202511276A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2023-085570 2023-05-24
JP2023085570 2023-05-24

Publications (1)

Publication Number Publication Date
TW202511276A true TW202511276A (zh) 2025-03-16

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ID=93590002

Family Applications (1)

Application Number Title Priority Date Filing Date
TW113119351A TW202511276A (zh) 2023-05-24 2024-05-24 圖型形成方法及含金屬化合物之膜用處理液

Country Status (3)

Country Link
JP (1) JPWO2024242120A1 (https=)
TW (1) TW202511276A (https=)
WO (1) WO2024242120A1 (https=)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004037949B4 (de) * 2004-08-05 2009-04-02 Forschungszentrum Karlsruhe Gmbh Verfahren zur Herstellung von Photonischen Kristallen
JP6572899B2 (ja) * 2014-09-17 2019-09-11 Jsr株式会社 パターン形成方法
JPWO2017169440A1 (ja) * 2016-03-28 2019-02-14 Jsr株式会社 感放射線性組成物及びパターン形成方法
WO2019111665A1 (ja) * 2017-12-05 2019-06-13 Jsr株式会社 レジストパターン形成方法及びレジスト膜形成用組成物
WO2021016229A1 (en) * 2019-07-22 2021-01-28 Inpria Corporation Organometallic metal chalcogenide clusters and application to lithography
CN116134381A (zh) * 2020-07-17 2023-05-16 朗姆研究公司 含钽光致抗蚀剂
JP7737106B2 (ja) * 2021-07-16 2025-09-10 三星電子株式会社 イオン性塩および感放射線レジスト組成物

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JPWO2024242120A1 (https=) 2024-11-28
WO2024242120A1 (ja) 2024-11-28

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