JP2024542426A5 - - Google Patents
Info
- Publication number
- JP2024542426A5 JP2024542426A5 JP2024527522A JP2024527522A JP2024542426A5 JP 2024542426 A5 JP2024542426 A5 JP 2024542426A5 JP 2024527522 A JP2024527522 A JP 2024527522A JP 2024527522 A JP2024527522 A JP 2024527522A JP 2024542426 A5 JP2024542426 A5 JP 2024542426A5
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- coating
- polymer
- mol
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163263973P | 2021-11-12 | 2021-11-12 | |
| US63/263,973 | 2021-11-12 | ||
| PCT/EP2022/081410 WO2023083933A1 (en) | 2021-11-12 | 2022-11-10 | Neutral brushes with tunable polarity for self-assembly of block copolymers with poly(styrene) and poly(methyl methacrylate) containing segments |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024542426A JP2024542426A (ja) | 2024-11-15 |
| JP2024542426A5 true JP2024542426A5 (https=) | 2026-01-13 |
Family
ID=84387605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024527522A Pending JP2024542426A (ja) | 2021-11-12 | 2022-11-10 | ポリ（スチレン）及びポリ（メチルメタクリレート）含有セグメントを有するブロックコポリマーの自己集合のための調節可能な極性を有する中性ブラシ |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20250244671A1 (https=) |
| EP (1) | EP4430097B1 (https=) |
| JP (1) | JP2024542426A (https=) |
| KR (1) | KR20240096879A (https=) |
| CN (1) | CN118302461A (https=) |
| TW (1) | TW202336055A (https=) |
| WO (1) | WO2023083933A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8691925B2 (en) * | 2011-09-23 | 2014-04-08 | Az Electronic Materials (Luxembourg) S.A.R.L. | Compositions of neutral layer for directed self assembly block copolymers and processes thereof |
| US10162265B2 (en) * | 2015-12-09 | 2018-12-25 | Rohm And Haas Electronic Materials Llc | Pattern treatment methods |
| EP3523823B1 (en) * | 2016-10-04 | 2022-03-23 | Brewer Science Inc. | Chemically patterned guide layers for use in chemoepitaxy directing of block co-polymers |
| EP3858872B1 (en) * | 2016-12-21 | 2022-05-11 | Merck Patent GmbH | Compositions and processes for self-assembly of block copolymers |
| JP7172171B2 (ja) * | 2018-06-22 | 2022-11-16 | Dic株式会社 | 顔料用分散剤、顔料分散体及びポリマーの製造方法 |
| JP7820296B2 (ja) * | 2019-11-26 | 2026-02-25 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 非チオールタイプ窒素系疎水性ポリマーブラシ材料及び基材表面の改質のためのそれの使用 |
-
2022
- 2022-11-10 CN CN202280074905.6A patent/CN118302461A/zh active Pending
- 2022-11-10 WO PCT/EP2022/081410 patent/WO2023083933A1/en not_active Ceased
- 2022-11-10 US US18/701,677 patent/US20250244671A1/en active Pending
- 2022-11-10 EP EP22817567.5A patent/EP4430097B1/en active Active
- 2022-11-10 KR KR1020247019515A patent/KR20240096879A/ko active Pending
- 2022-11-10 TW TW111142896A patent/TW202336055A/zh unknown
- 2022-11-10 JP JP2024527522A patent/JP2024542426A/ja active Pending
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