JP2024519492A5 - - Google Patents

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Publication number
JP2024519492A5
JP2024519492A5 JP2023567953A JP2023567953A JP2024519492A5 JP 2024519492 A5 JP2024519492 A5 JP 2024519492A5 JP 2023567953 A JP2023567953 A JP 2023567953A JP 2023567953 A JP2023567953 A JP 2023567953A JP 2024519492 A5 JP2024519492 A5 JP 2024519492A5
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JP
Japan
Prior art keywords
layer
photoresist
pattern
relief pattern
wavelength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023567953A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024519492A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2022/026697 external-priority patent/WO2022235475A1/en
Publication of JP2024519492A publication Critical patent/JP2024519492A/ja
Publication of JP2024519492A5 publication Critical patent/JP2024519492A5/ja
Pending legal-status Critical Current

Links

JP2023567953A 2021-05-03 2022-04-28 ウェット－ドライ二層レジスト Pending JP2024519492A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US202163183130P 2021-05-03 2021-05-03
US202163183129P 2021-05-03 2021-05-03
US202163183128P 2021-05-03 2021-05-03
US63/183,130 2021-05-03
US63/183,128 2021-05-03
US63/183,129 2021-05-03
PCT/US2022/026697 WO2022235475A1 (en) 2021-05-03 2022-04-28 Wet-dry bilayer resist

Publications (2)

Publication Number Publication Date
JP2024519492A JP2024519492A (ja) 2024-05-14
JP2024519492A5 true JP2024519492A5 (enExample) 2025-04-17

Family

ID=83807790

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023567953A Pending JP2024519492A (ja) 2021-05-03 2022-04-28 ウェット－ドライ二層レジスト

Country Status (5)

Country Link
US (3) US12327726B2 (enExample)
JP (1) JP2024519492A (enExample)
KR (1) KR102972540B1 (enExample)
TW (1) TW202307957A (enExample)
WO (1) WO2022235475A1 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024519492A (ja) * 2021-05-03 2024-05-14 東京エレクトロン株式会社 ウェット－ドライ二層レジスト
US12538760B2 (en) * 2021-11-22 2026-01-27 Taiwan Semiconductor Manufacturing Company, Ltd. Method of manufacturing a semiconductor device
US20250149335A1 (en) * 2023-11-07 2025-05-08 Tokyo Electron Limited Method to pattern a semiconductor substrate using a multilayer photoresist film stack

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JP2024519492A (ja) * 2021-05-03 2024-05-14 東京エレクトロン株式会社 ウェット－ドライ二層レジスト

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