JP2024009127A5 - - Google Patents

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Publication number
JP2024009127A5
JP2024009127A5 JP2023196579A JP2023196579A JP2024009127A5 JP 2024009127 A5 JP2024009127 A5 JP 2024009127A5 JP 2023196579 A JP2023196579 A JP 2023196579A JP 2023196579 A JP2023196579 A JP 2023196579A JP 2024009127 A5 JP2024009127 A5 JP 2024009127A5
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JP
Japan
Prior art keywords
electrode
discharge chamber
discharge
laser
width
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JP2023196579A
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English (en)
Japanese (ja)
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JP2024009127A (ja
JP7644203B2 (ja
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Priority claimed from JP2020521972A external-priority patent/JP7095084B2/ja
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Publication of JP2024009127A5 publication Critical patent/JP2024009127A5/ja
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JP2023196579A 2017-10-24 2023-11-20 レーザチャンバ内の電極の寿命を延ばす方法及び装置 Active JP7644203B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201762576371P 2017-10-24 2017-10-24
US62/576,371 2017-10-24
JP2020521972A JP7095084B2 (ja) 2017-10-24 2018-10-09 レーザチャンバ内の電極の寿命を延ばす方法及び装置
PCT/US2018/055078 WO2019083722A1 (en) 2017-10-24 2018-10-09 METHOD AND APPARATUS FOR LIFTING THE LIFE OF AN ELECTRODE IN A LASER CHAMBER
JP2022075638A JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Related Parent Applications (1)

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JP2022075638A Division JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Publications (3)

Publication Number Publication Date
JP2024009127A JP2024009127A (ja) 2024-01-19
JP2024009127A5 true JP2024009127A5 (https=) 2024-02-09
JP7644203B2 JP7644203B2 (ja) 2025-03-11

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ID=66247591

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2020521972A Active JP7095084B2 (ja) 2017-10-24 2018-10-09 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2022075638A Active JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2023196579A Active JP7644203B2 (ja) 2017-10-24 2023-11-20 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Family Applications Before (2)

Application Number Title Priority Date Filing Date
JP2020521972A Active JP7095084B2 (ja) 2017-10-24 2018-10-09 レーザチャンバ内の電極の寿命を延ばす方法及び装置
JP2022075638A Active JP7417654B2 (ja) 2017-10-24 2022-05-02 レーザチャンバ内の電極の寿命を延ばす方法及び装置

Country Status (6)

Country Link
US (1) US11777271B2 (https=)
JP (3) JP7095084B2 (https=)
KR (2) KR102408834B1 (https=)
CN (1) CN111279562A (https=)
TW (1) TWI713276B (https=)
WO (1) WO2019083722A1 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021071681A1 (en) * 2019-10-11 2021-04-15 Cymer, Llc Conductive member for discharge laser
WO2021138019A1 (en) * 2019-12-31 2021-07-08 Cymer, Llc Undercut electrodes for a gas discharge laser chamber
KR20210133084A (ko) 2020-04-28 2021-11-05 삼성전자주식회사 뉴럴 네트워크의 학습 방법 및 장치
JP2024500674A (ja) * 2020-12-22 2024-01-10 サイマー リミテッド ライアビリティ カンパニー ガス放電チャンバブロワのエネルギー消費量を低減すること
WO2025202806A1 (en) 2024-03-28 2025-10-02 Cymer, Llc Systems and methods for electrode position sensing and adjustment

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JPH0613690A (ja) * 1992-06-27 1994-01-21 Shimadzu Corp エキシマレーザ装置
JP3815578B2 (ja) * 1996-07-19 2006-08-30 忠弘 大見 エキシマレーザー発振装置
US5835520A (en) * 1997-04-23 1998-11-10 Cymer, Inc. Very narrow band KrF laser
US6757316B2 (en) 1999-12-27 2004-06-29 Cymer, Inc. Four KHz gas discharge laser
US6151346A (en) * 1997-12-15 2000-11-21 Cymer, Inc. High pulse rate pulse power system with fast rise time and low current
JP2000058944A (ja) 1998-05-20 2000-02-25 Cymer Inc 高信頼性・モジュラ製造高品質狭帯域高繰り返しレ―トｆ２レ―ザ
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US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
DE60001068T2 (de) * 2000-05-04 2004-06-03 Tuilaser Ag Elektrodenmaterial für einen Gasentladungslaser und Gaslaser
US7132123B2 (en) * 2000-06-09 2006-11-07 Cymer, Inc. High rep-rate laser with improved electrodes
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US6690706B2 (en) 2000-06-09 2004-02-10 Cymer, Inc. High rep-rate laser with improved electrodes
US6560263B1 (en) 2000-06-09 2003-05-06 Cymer, Inc. Discharge laser having electrodes with sputter cavities and discharge peaks
JP4104935B2 (ja) * 2001-08-27 2008-06-18 株式会社小松製作所 主放電電極及び主放電電極の製造方法
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JP2012023172A (ja) 2010-07-14 2012-02-02 Sumitomo Heavy Ind Ltd 電極及び電極材料の構成比率決定方法
CN102810810A (zh) 2012-03-02 2012-12-05 中国科学院光电研究院 单腔双电极放电腔及准分子激光器
US9246298B2 (en) 2012-06-07 2016-01-26 Cymer, Llc Corrosion resistant electrodes for laser chambers
WO2014046186A1 (ja) 2012-09-21 2014-03-27 ギガフォトン株式会社 レーザ装置
CN103199412A (zh) * 2013-03-26 2013-07-10 中国科学院光电研究院 具有微流道结构的单腔双电极放电腔
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