JP2023553053A5 - - Google Patents
Info
- Publication number
- JP2023553053A5 JP2023553053A5 JP2023534382A JP2023534382A JP2023553053A5 JP 2023553053 A5 JP2023553053 A5 JP 2023553053A5 JP 2023534382 A JP2023534382 A JP 2023534382A JP 2023534382 A JP2023534382 A JP 2023534382A JP 2023553053 A5 JP2023553053 A5 JP 2023553053A5
- Authority
- JP
- Japan
- Prior art keywords
- pattern elements
- measurement
- sample
- diffraction order
- measurement direction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/119,536 US11378394B1 (en) | 2020-12-11 | 2020-12-11 | On-the-fly scatterometry overlay metrology target |
| US17/119,536 | 2020-12-11 | ||
| PCT/US2021/061296 WO2022125340A1 (en) | 2020-12-11 | 2021-11-30 | On-the-fly scatterometry overlay metrology target |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2023553053A JP2023553053A (ja) | 2023-12-20 |
| JP2023553053A5 true JP2023553053A5 (https=) | 2024-09-13 |
| JP7569938B2 JP7569938B2 (ja) | 2024-10-18 |
Family
ID=81942344
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023534382A Active JP7569938B2 (ja) | 2020-12-11 | 2021-11-30 | オンザフライ散乱計測オーバーレイ計測ターゲット |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11378394B1 (https=) |
| EP (1) | EP4251980A4 (https=) |
| JP (1) | JP7569938B2 (https=) |
| KR (1) | KR102812583B1 (https=) |
| CN (1) | CN116583742A (https=) |
| TW (1) | TWI884321B (https=) |
| WO (1) | WO2022125340A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12032300B2 (en) | 2022-02-14 | 2024-07-09 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
| US12422363B2 (en) | 2022-03-30 | 2025-09-23 | Kla Corporation | Scanning scatterometry overlay metrology |
| US12487190B2 (en) | 2022-03-30 | 2025-12-02 | Kla Corporation | System and method for isolation of specific fourier pupil frequency in overlay metrology |
| US12235588B2 (en) | 2023-02-16 | 2025-02-25 | Kla Corporation | Scanning overlay metrology with high signal to noise ratio |
| US12560548B2 (en) | 2023-09-06 | 2026-02-24 | Kla Corporation | Spectral angular metrology |
| US12373936B2 (en) | 2023-12-08 | 2025-07-29 | Kla Corporation | System and method for overlay metrology using a phase mask |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7068833B1 (en) | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| US7541201B2 (en) | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
| US20030002043A1 (en) | 2001-04-10 | 2003-01-02 | Kla-Tencor Corporation | Periodic patterns and technique to control misalignment |
| US7440105B2 (en) * | 2002-12-05 | 2008-10-21 | Kla-Tencor Technologies Corporation | Continuously varying offset mark and methods of determining overlay |
| WO2004053426A1 (en) * | 2002-12-05 | 2004-06-24 | Kla-Tencor Technologies Corporation | Apparatus and methods for detecting overlay errors using scatterometry |
| US7671990B1 (en) * | 2006-07-28 | 2010-03-02 | Kla-Tencor Technologies Corporation | Cross hatched metrology marks and associated method of use |
| KR101652133B1 (ko) * | 2008-09-29 | 2016-08-29 | 케이엘에이-텐코어 코오포레이션 | 계측 시스템의 조명 서브시스템들, 계측 시스템들 및 계측 측정들을 위한 표본을 조명하기 위한 방법들 |
| US9927718B2 (en) * | 2010-08-03 | 2018-03-27 | Kla-Tencor Corporation | Multi-layer overlay metrology target and complimentary overlay metrology measurement systems |
| KR101185992B1 (ko) | 2011-01-03 | 2012-09-26 | 에스케이하이닉스 주식회사 | 오버레이 모니터링 패턴 및 이를 이용한 반도체 소자의 정렬도 측정방법 |
| EP3779598B1 (en) | 2011-04-06 | 2022-12-21 | Kla-Tencor Corporation | Method for providing a set of process tool correctables |
| US9709903B2 (en) * | 2011-11-01 | 2017-07-18 | Kla-Tencor Corporation | Overlay target geometry for measuring multiple pitches |
| NL2011816A (en) * | 2012-11-30 | 2014-06-04 | Asml Netherlands Bv | Method of determining dose and focus, inspection apparatus, patterning device, substrate and device manufacturing method. |
| US9885961B1 (en) * | 2013-05-29 | 2018-02-06 | Kla-Tencor Corporation | Partly disappearing targets |
| WO2014194095A1 (en) | 2013-05-30 | 2014-12-04 | Kla-Tencor Corporation | Combined imaging and scatterometry metrology |
| US9214317B2 (en) | 2013-06-04 | 2015-12-15 | Kla-Tencor Corporation | System and method of SEM overlay metrology |
| TWI648515B (zh) | 2013-11-15 | 2019-01-21 | 美商克萊譚克公司 | 計量目標及其計量量測、目標設計檔案、計量方法及以電腦為基礎之設備 |
| US9784690B2 (en) * | 2014-05-12 | 2017-10-10 | Kla-Tencor Corporation | Apparatus, techniques, and target designs for measuring semiconductor parameters |
| WO2015196168A1 (en) | 2014-06-21 | 2015-12-23 | Kla-Tencor Corporation | Compound imaging metrology targets |
| CN105511238B (zh) | 2014-09-26 | 2017-11-03 | 中芯国际集成电路制造(上海)有限公司 | 光刻对准标记结构及形成方法、半导体结构的形成方法 |
| WO2016078862A1 (en) | 2014-11-21 | 2016-05-26 | Asml Netherlands B.V. | Metrology method and apparatus |
| WO2017176314A1 (en) * | 2016-04-04 | 2017-10-12 | Kla-Tencor Corporation | Process compatibility improvement by fill factor modulation |
| CN109075090B (zh) | 2016-06-27 | 2020-11-06 | 科磊股份有限公司 | 用于测量图案放置及图案大小的设备及方法及其计算机程序 |
| US11248905B2 (en) * | 2017-08-16 | 2022-02-15 | Kla-Tencor Corporation | Machine learning in metrology measurements |
| US10705435B2 (en) | 2018-01-12 | 2020-07-07 | Globalfoundries Inc. | Self-referencing and self-calibrating interference pattern overlay measurement |
| KR102637420B1 (ko) * | 2019-03-25 | 2024-02-15 | 케이엘에이 코포레이션 | 계측에 사용하기 위한 개선된 자체 모아레 격자 설계 |
-
2020
- 2020-12-11 US US17/119,536 patent/US11378394B1/en active Active
-
2021
- 2021-10-04 TW TW110136808A patent/TWI884321B/zh active
- 2021-11-30 WO PCT/US2021/061296 patent/WO2022125340A1/en not_active Ceased
- 2021-11-30 KR KR1020237021572A patent/KR102812583B1/ko active Active
- 2021-11-30 JP JP2023534382A patent/JP7569938B2/ja active Active
- 2021-11-30 CN CN202180081102.9A patent/CN116583742A/zh active Pending
- 2021-11-30 EP EP21904129.0A patent/EP4251980A4/en active Pending
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