JP2023513040A5 - - Google Patents

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Publication number
JP2023513040A5
JP2023513040A5 JP2022546445A JP2022546445A JP2023513040A5 JP 2023513040 A5 JP2023513040 A5 JP 2023513040A5 JP 2022546445 A JP2022546445 A JP 2022546445A JP 2022546445 A JP2022546445 A JP 2022546445A JP 2023513040 A5 JP2023513040 A5 JP 2023513040A5
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JP
Japan
Prior art keywords
measurement
pattern elements
measurement mode
overlay
mode includes
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JP2022546445A
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English (en)
Japanese (ja)
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JP2023513040A (ja
JP7446447B2 (ja
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Priority claimed from US16/996,254 external-priority patent/US11809090B2/en
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Publication of JP2023513040A publication Critical patent/JP2023513040A/ja
Publication of JP2023513040A5 publication Critical patent/JP2023513040A5/ja
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Publication of JP7446447B2 publication Critical patent/JP7446447B2/ja
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JP2022546445A 2020-01-30 2021-01-26 複合的オーバレイ計測ターゲット Active JP7446447B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US202062967951P 2020-01-30 2020-01-30
US62/967,951 2020-01-30
US202063032217P 2020-05-29 2020-05-29
US63/032,217 2020-05-29
US16/996,254 US11809090B2 (en) 2020-01-30 2020-08-18 Composite overlay metrology target
US16/996,254 2020-08-18
PCT/US2021/015144 WO2021154762A1 (en) 2020-01-30 2021-01-26 Composite overlay metrology target

Publications (3)

Publication Number Publication Date
JP2023513040A JP2023513040A (ja) 2023-03-30
JP2023513040A5 true JP2023513040A5 (https=) 2023-12-12
JP7446447B2 JP7446447B2 (ja) 2024-03-08

Family

ID=77061885

Family Applications (1)

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JP2022546445A Active JP7446447B2 (ja) 2020-01-30 2021-01-26 複合的オーバレイ計測ターゲット

Country Status (7)

Country Link
US (1) US11809090B2 (https=)
EP (1) EP4078159A4 (https=)
JP (1) JP7446447B2 (https=)
KR (1) KR102719209B1 (https=)
CN (1) CN114930161B (https=)
TW (1) TW202133292A (https=)
WO (1) WO2021154762A1 (https=)

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US11460783B2 (en) * 2021-01-07 2022-10-04 Kla Corporation System and method for focus control in extreme ultraviolet lithography systems using a focus-sensitive metrology target
US12536644B2 (en) * 2021-04-27 2026-01-27 Prosemi Co., Ltd. Detection pattern unit for detecting pattern on semiconductor device, and method and system for implementing the same
US11862524B2 (en) 2021-06-28 2024-01-02 Kla Corporation Overlay mark design for electron beam overlay
US11703767B2 (en) 2021-06-28 2023-07-18 Kla Corporation Overlay mark design for electron beam overlay
US11720031B2 (en) 2021-06-28 2023-08-08 Kla Corporation Overlay design for electron beam and scatterometry overlay measurements
KR102875946B1 (ko) * 2021-11-27 2025-10-23 케이엘에이 코포레이션 회절 기반 오버레이 오차 계측을 위한 개선된 타겟
US12416867B2 (en) * 2022-09-22 2025-09-16 United Microelectronics Corp. Overlay target and overlay method
TW202414771A (zh) * 2022-09-29 2024-04-01 聯華電子股份有限公司 疊對圖樣
US12585182B2 (en) * 2022-12-29 2026-03-24 Onto Innovation Inc. Overlay correction for advanced integrated-circuit devices

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US7068833B1 (en) 2000-08-30 2006-06-27 Kla-Tencor Corporation Overlay marks, methods of overlay mark design and methods of overlay measurements
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US10228320B1 (en) * 2014-08-08 2019-03-12 KLA—Tencor Corporation Achieving a small pattern placement error in metrology targets
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CN109075090B (zh) 2016-06-27 2020-11-06 科磊股份有限公司 用于测量图案放置及图案大小的设备及方法及其计算机程序
KR102713425B1 (ko) * 2016-08-31 2024-10-04 에스케이하이닉스 주식회사 노광 공정의 디스토션 제어방법
US10551749B2 (en) * 2017-01-04 2020-02-04 Kla-Tencor Corporation Metrology targets with supplementary structures in an intermediate layer
US10732516B2 (en) * 2017-03-01 2020-08-04 Kla Tencor Corporation Process robust overlay metrology based on optical scatterometry
KR20200004381A (ko) * 2017-05-08 2020-01-13 에이에스엠엘 네델란즈 비.브이. 구조체를 측정하는 방법, 검사 장치, 리소그래피 시스템 및 디바이스 제조 방법
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US10565697B2 (en) * 2017-10-22 2020-02-18 Kla-Tencor Corporation Utilizing overlay misregistration error estimations in imaging overlay metrology
US10473460B2 (en) * 2017-12-11 2019-11-12 Kla-Tencor Corporation Overlay measurements of overlapping target structures based on symmetry of scanning electron beam signals
US10533848B2 (en) * 2018-03-05 2020-01-14 Kla-Tencor Corporation Metrology and control of overlay and edge placement errors
US11067389B2 (en) * 2018-03-13 2021-07-20 Kla Corporation Overlay metrology system and method

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