JP2022546849A5 - - Google Patents
Info
- Publication number
- JP2022546849A5 JP2022546849A5 JP2022515124A JP2022515124A JP2022546849A5 JP 2022546849 A5 JP2022546849 A5 JP 2022546849A5 JP 2022515124 A JP2022515124 A JP 2022515124A JP 2022515124 A JP2022515124 A JP 2022515124A JP 2022546849 A5 JP2022546849 A5 JP 2022546849A5
- Authority
- JP
- Japan
- Prior art keywords
- illumination
- symmetric
- weighing
- profile
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201962897548P | 2019-09-09 | 2019-09-09 | |
| US62/897,548 | 2019-09-09 | ||
| US202063036760P | 2020-06-09 | 2020-06-09 | |
| US63/036,760 | 2020-06-09 | ||
| US16/996,328 US11359916B2 (en) | 2019-09-09 | 2020-08-18 | Darkfield imaging of grating target structures for overlay measurement |
| US16/996,328 | 2020-08-18 | ||
| PCT/US2020/048668 WO2021050305A1 (en) | 2019-09-09 | 2020-08-31 | Darkfield imaging of grating target structures for overlay measurement |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2022546849A JP2022546849A (ja) | 2022-11-09 |
| JP2022546849A5 true JP2022546849A5 (https=) | 2023-08-15 |
| JP7451687B2 JP7451687B2 (ja) | 2024-03-18 |
Family
ID=74850983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022515124A Active JP7451687B2 (ja) | 2019-09-09 | 2020-08-31 | オーバレイ計測用格子ターゲット構造の暗視野イメージング |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US11359916B2 (https=) |
| EP (1) | EP4025901A4 (https=) |
| JP (1) | JP7451687B2 (https=) |
| KR (2) | KR20220054877A (https=) |
| CN (1) | CN114341594B (https=) |
| TW (1) | TWI845754B (https=) |
| WO (1) | WO2021050305A1 (https=) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11309202B2 (en) * | 2020-01-30 | 2022-04-19 | Kla Corporation | Overlay metrology on bonded wafers |
| US11526086B2 (en) | 2021-03-08 | 2022-12-13 | Kla Corporation | Multi-field scanning overlay metrology |
| DE102021205328B3 (de) | 2021-05-26 | 2022-09-29 | Carl Zeiss Smt Gmbh | Verfahren zur Bestimmung einer Abbildungsqualität eines optischen Systems bei Beleuchtung mit Beleuchtungslicht innerhalb einer zu vermessenden Pupille und Metrologiesystem dafür |
| US11688717B2 (en) * | 2021-08-26 | 2023-06-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanical wafer alignment detection for bonding process |
| US12032300B2 (en) * | 2022-02-14 | 2024-07-09 | Kla Corporation | Imaging overlay with mutually coherent oblique illumination |
| US12253805B2 (en) | 2022-08-11 | 2025-03-18 | Kla Corporation | Scatterometry overlay metrology with orthogonal fine-pitch segmentation |
| TW202530674A (zh) * | 2023-09-01 | 2025-08-01 | 美商應用材料股份有限公司 | 用於混合式接合缺陷偵測之多向照明 |
| US12506038B2 (en) * | 2024-01-11 | 2025-12-23 | Tokyo Electron Limited | Wafer bonding overlay measurement system |
| US12529878B2 (en) * | 2024-03-26 | 2026-01-20 | Kla Corporation | High contrast imaging in bonded sample metrology using oblique illumination |
| US20250306477A1 (en) * | 2024-03-27 | 2025-10-02 | Kla Corporation | Single grab pupil landscape via outside the objective lens broadband illumination |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7528953B2 (en) * | 2005-03-01 | 2009-05-05 | Kla-Tencor Technologies Corp. | Target acquisition and overlay metrology based on two diffracted orders imaging |
| NL1036245A1 (nl) * | 2007-12-17 | 2009-06-18 | Asml Netherlands Bv | Diffraction based overlay metrology tool and method of diffraction based overlay metrology. |
| US8681413B2 (en) * | 2011-06-27 | 2014-03-25 | Kla-Tencor Corporation | Illumination control |
| US8817273B2 (en) | 2012-04-24 | 2014-08-26 | Nanometrics Incorporated | Dark field diffraction based overlay |
| WO2015124397A1 (en) | 2014-02-21 | 2015-08-27 | Asml Netherlands B.V. | Optimization of target arrangement and associated target |
| WO2016005167A1 (en) * | 2014-07-09 | 2016-01-14 | Asml Netherlands B.V. | Inspection apparatus, inspection method and device manufacturing method |
| CN107111245B (zh) * | 2014-12-19 | 2019-10-18 | Asml荷兰有限公司 | 测量非对称性的方法、检查设备、光刻系统及器件制造方法 |
| CN106611756A (zh) * | 2015-10-26 | 2017-05-03 | 联华电子股份有限公司 | 晶片对晶片对接结构及其制作方法 |
| KR20180095932A (ko) | 2015-12-23 | 2018-08-28 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 장치 |
| WO2017114641A1 (en) * | 2015-12-31 | 2017-07-06 | Asml Holding N.V. | Method and device for focusing in an inspection system |
| JP6685821B2 (ja) * | 2016-04-25 | 2020-04-22 | キヤノン株式会社 | 計測装置、インプリント装置、物品の製造方法、光量決定方法、及び、光量調整方法 |
| US10048132B2 (en) * | 2016-07-28 | 2018-08-14 | Kla-Tencor Corporation | Simultaneous capturing of overlay signals from multiple targets |
| EP3422103A1 (en) | 2017-06-26 | 2019-01-02 | ASML Netherlands B.V. | Method of determining a performance parameter of a process |
| US10663633B2 (en) | 2017-06-29 | 2020-05-26 | Taiwan Semiconductor Manufacturing Co., Ltd. | Aperture design and methods thereof |
-
2020
- 2020-08-18 US US16/996,328 patent/US11359916B2/en active Active
- 2020-08-31 EP EP20863674.6A patent/EP4025901A4/en active Pending
- 2020-08-31 KR KR1020227011142A patent/KR20220054877A/ko not_active Ceased
- 2020-08-31 WO PCT/US2020/048668 patent/WO2021050305A1/en not_active Ceased
- 2020-08-31 KR KR1020247019865A patent/KR20240097962A/ko active Pending
- 2020-08-31 CN CN202080061806.5A patent/CN114341594B/zh active Active
- 2020-08-31 JP JP2022515124A patent/JP7451687B2/ja active Active
- 2020-09-07 TW TW109130575A patent/TWI845754B/zh active
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